公开(公告)号：EP4017221A1

公开(公告)日：2022-06-22

申请号：EP20216083.4

申请日：2020-12-21

申请人： ASML Netherlands B.V.

发明人： SMORENBURG, Petrus Wilhelmus ,  LUITEN, Otger Jan ,  SCHAAP, Brian Herman ,  FRANSSEN, Jim Gerardus Hubertus

IPC分类号： H05G2/00 ,  H01J31/00 ,  H05H15/00

摘要： A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.