公开(公告)号：EP1510870A1

公开(公告)日：2005-03-02

申请号：EP04254910.5

申请日：2004-08-16

申请人： ASML Netherlands B.V.

发明人： Sengers, Timotheus Franciscus ,  van de Kerkhof, Marcus Adrianus ,  Kroon, Mark ,  van Weert, Kees

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7088 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/707 ,  G03F7/7085

摘要： A lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate (W), and a sensor (20) at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means, wherein said sensor at substrate level is arranged to avoid loss of radiation between said radiation-receiving element (18) and the final element (40) of said radiation-detecting means.

摘要翻译： 一种光刻设备，包括：配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束; 衬底台，构造成保持衬底; 被配置为将图案化的辐射束投影到衬底（W）的目标部分上的投影系统以及衬底级上的传感器（20），该传感器包括辐射接收元件，支撑所述辐射接收元件的透射板和辐射 - 检测装置，其中所述基底层上的传感器被设置为避免所述辐射接收元件（18）和所述辐射检测装置的最终元件（40）之间的辐射损失。

公开(公告)号：EP1426827A1

公开(公告)日：2004-06-09

申请号：EP03078854.1

申请日：2003-12-04

申请人： ASML Netherlands B.V.

发明人： van de Kerkhof, Marcus Adrianus ,  de Boeij, Wilhelmus Petrus ,  Hemerik, Marcel Maurice

IPC分类号： G03F7/20 ,  G01J1/58 ,  G01T1/20 ,  H01L31/00

CPC分类号： G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/70308 ,  G03F7/7085

摘要： A lithographic projection apparatus comprising: a radiation system for providing a projection beam of primary radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, said sensor comprising: a radiation-sensitive material which converts incident primary radiation into secondary radiation; sensing means capable of detecting said secondary radiation emerging from said material; and a filter material for preventing secondary radiation from traveling in a direction away from the sensing means.

摘要翻译： 一种光刻投影设备，包括：用于提供初级辐射的投影光束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案来图案化所述投影光束; 衬底台，用于保持衬底; 投影系统，用于将图案化的光束投影到衬底的目标部分上; 辐射传感器，所述辐射传感器可在由所述投影光束穿过的路径中移动，以接收从所述投影光束射出的初级辐射，所述传感器包括：将入射的初级辐射转换为次级辐射的辐射敏感材料; 感测装置，其能够检测从所述材料发出的所述二次辐射; 以及用于防止二次辐射沿远离传感装置的方向行进的过滤材料。