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公开(公告)号：EP2997422B1
公开(公告)日：2019-08-14
申请号：EP14724698.7
申请日：2014-05-09
发明人： KIM, Jihoon , WAN, Jingxiu , MIYAZAKI, Shinji , LIN, Guanyang , WU, Hengpeng
IPC分类号： G03F7/00
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公开(公告)号：EP3212714B1
公开(公告)日：2019-03-06
申请号：EP15794100.6
申请日：2015-10-28
发明人： WU, Hengpeng , YIN, Jian , LIN, Guanyang , KIM, Jihoon , PAUNESCU, Margareta
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公开(公告)号：EP3049449B1
公开(公告)日：2019-01-09
申请号：EP14772163.3
申请日：2014-09-24
发明人： WU, Hengpeng , YIN, Jian , LIN, Guanyang , KIM, Jihoon , SHAN, Jianhui
IPC分类号： H01L21/02 , G03F7/00 , C08F220/40 , C08F220/14
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4.发明公开
公开(公告)号：EP3212714A1
公开(公告)日：2017-09-06
申请号：EP15794100.6
申请日：2015-10-28
发明人： WU, Hengpeng , YIN, Jian , LIN, Guanyang , KIM, Jihoon , PAUNESCU, Margareta
IPC分类号： C08L53/00 , B82Y30/00 , C08F8/42 , G03F7/038 , C08F293/00 , C08F230/08
CPC分类号： C09D153/00 , B05D3/0209 , B05D3/145 , B82Y30/00 , C08F8/42 , C08F230/08 , C08F293/005 , C08F299/04 , C08L53/005 , G03F7/0002 , G03F7/038 , H01J37/32366 , C08F297/02
摘要： The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer.
摘要翻译： 本发明还涉及包含该新型聚合物和溶剂的新型组合物。 本发明还涉及利用该新型组合物影响嵌段共聚物的定向自组装的方法。
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5.发明授权LOW DIELECTRIC PHOTOIMAGEABLE COMPOSITIONS AND ELECTRONIC DEVICES MADE THEREFROM 有权具有低介电及由其制得的电子器件光成象组合物
公开(公告)号：EP2812399B1
公开(公告)日：2016-04-20
申请号：EP13711124.1
申请日：2013-02-08
IPC分类号： C08L83/04 , G03F7/075 , H01L21/02 , H01L21/312
CPC分类号： C08L83/04 , G03F7/038 , G03F7/0757 , G03F7/0758 , H01L21/02126 , H01L21/02282 , H01L23/5329 , H01L2924/0002 , Y10T428/24802 , H01L2924/00
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6.发明公开LOW DIELECTRIC PHOTOIMAGEABLE COMPOSITIONS AND ELECTRONIC DEVICES MADE THEREFROM 有权具有低介电及由其制得的电子器件光成象组合物
公开(公告)号：EP2812399A1
公开(公告)日：2014-12-17
申请号：EP13711124.1
申请日：2013-02-08
IPC分类号： C08L83/04 , G03F7/075 , H01L21/02 , H01L21/312
CPC分类号： C08L83/04 , G03F7/038 , G03F7/0757 , G03F7/0758 , H01L21/02126 , H01L21/02282 , H01L23/5329 , H01L2924/0002 , Y10T428/24802 , H01L2924/00
摘要： This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.
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公开(公告)号：EP3394185A1
公开(公告)日：2018-10-31
申请号：EP16828720.9
申请日：2016-12-20
发明人： LIN, Guanyang , WU, Hengpeng , KIM, Jihoon , YIN, Jian , BASKARAN, Durairaj , SHAN, Jianhui
IPC分类号： C09D133/08 , C09D135/06
CPC分类号： C09D151/003 , B05D3/02 , C09D133/08 , C09D135/06 , H01L21/02118 , H01L21/0271 , H01L21/324
摘要： The invention also relates to using this novel coating composition to form a grafted polymer film on a substrate.
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8.发明公开UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING 有权下层组成，以促进自组装方法制备方法和用途
公开(公告)号：EP3049449A1
公开(公告)日：2016-08-03
申请号：EP14772163.3
申请日：2014-09-24
发明人： WU, Hengpeng , YIN, Jian , LIN, Guanyang , KIM, Jihoon , SHAN, Jianhui
IPC分类号： C08F220/14
CPC分类号： H01L21/02118 , C08F220/14 , C08F220/40 , G03F7/0002 , H01L21/02282 , C08F212/08
摘要： Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.
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9.发明公开
公开(公告)号：EP2997422A1
公开(公告)日：2016-03-23
申请号：EP14724698.7
申请日：2014-05-09
发明人： KIM, Jihoon , WAN, Jingxiu , MIYAZAKI, Shinji , LIN, Guanyang , WU, Hengpeng
IPC分类号： G03F7/00
CPC分类号： B44C1/227 , G03F7/0002 , Y10T428/24802
摘要： Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern.
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