公开(公告)号：EP3677585A1

公开(公告)日：2020-07-08

申请号：EP18850439.3

申请日：2018-08-09

申请人： Adeka Corporation

发明人： OKADA, Nana ,  HATASE, Masako ,  NISHIDA, Akihiro ,  SAKURAI, Atsushi

IPC分类号： C07F5/00 ,  C23C16/18 ,  H01L21/31

摘要： The present invention provides a metal alkoxide compound represented by the following general formula (1), a thin-film-forming raw material containing the same, and a thin film production method of forming a metal-containing thin film using the raw material:

wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 2 represents an isopropyl group, a sec-butyl group, a tert-butyl group, a sec-pentyl group, a 1-ethylpropyl group or a tert-pentyl group, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R 4 represents an alkyl group having 1 to 4 carbon atoms, M represents a scandium atom, an yttrium atom, a lanthanum atom, a cerium atom, a praseodymium atom, a neodymium atom, a promethium atom, a samarium atom, a europium atom, a gadolinium atom, a terbium atom, a dysprosium atom, a holmium atom, an erbium atom, a thulium atom, an ytterbium atom or a lutetium atom, and n represents the valence of the atom represented by M; here, when M is a lanthanum atom, R 2 is a sec-butyl group, a tert-butyl group, a sec-pentyl group, a 1-ethylpropyl group or a tert-pentyl group.

公开(公告)号：EP3178808A1

公开(公告)日：2017-06-14

申请号：EP15829762.2

申请日：2015-07-16

申请人： Adeka Corporation

发明人： SAKURAI, Atsushi ,  HATASE, Masako ,  YOSHINO, Tomoharu ,  ENZU, Masaki

IPC分类号： C07C251/08 ,  C23C16/18 ,  H01L21/285 ,  C07F1/08 ,  C07F15/06

CPC分类号： C07F15/065 ,  C07C251/08 ,  C07C251/76 ,  C07F7/0818 ,  C07F7/10 ,  C07F15/04 ,  C07F15/045 ,  C07F15/06 ,  C23C16/18 ,  C23C16/45525 ,  H01L21/285

摘要： The alkoxide compound of the present invention is characteristically represented by the following general formula (I) :

摘要翻译： 本发明的醇盐化合物的特征在于以下通式（I）：

公开(公告)号：EP4180417A1

公开(公告)日：2023-05-17

申请号：EP21837909.7

申请日：2021-06-25

申请人： ADEKA CORPORATION

发明人： SAKURAI, Atsushi ,  HATASE, Masako ,  OKADA, Nana ,  FUKUSHIMA, Ryota

IPC分类号： C07C215/08 ,  C07F1/08 ,  C07F15/04 ,  C07F15/06 ,  C07F7/22 ,  C23C16/18 ,  C23C16/40

摘要： The present invention provides an alkoxide compound represented by the following general formula (1), a thin-film forming raw material containing the compound, and a method of producing a thin-film:

where R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, R 3 and R 4 each independently represent an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, R 5 represents a hydrogen atom, a fluorine atom-containing group, or an alkyl group having 1 to 5 carbon atoms, R 6 represents a fluorine atom-containing group, M represents a metal atom or a semimetal atom, and "n" represents the valence of the atom represented by M, provided that when M represents a copper atom, R 3 and R 4 each independently represent an alkyl group having 1 or 2 carbon atoms, and R 5 represents a hydrogen atom.

公开(公告)号：EP3144293B1

公开(公告)日：2018-09-19

申请号：EP15793276.5

申请日：2015-04-08

申请人： Adeka Corporation

发明人： YOSHINO, Tomoharu ,  ENZU, Masaki ,  SAKURAI, Atsushi ,  NISHIDA, Akihiro ,  OKABE, Makoto

IPC分类号： C07C215/08 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  C07F1/08 ,  C23C16/455

CPC分类号： C07F1/08 ,  C07C215/08 ,  C09D1/00 ,  C09D5/24 ,  C23C16/06 ,  C23C16/18 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45553 ,  H01L21/28 ,  H01L21/285

摘要： This invention provides a copper compound represented by General Formula (I) below. In General Formula (I), R 1 to R 3 independently represent a linear or branched alkyl group with a carbon number of 1 to 5; provided that R 1 and R 2 are a methyl group, R 3 represents a linear or branched alkyl group with a carbon number of 2 to 5; and provided that R 1 is a methyl group and R 2 is an ethyl group, R 3 represents a methyl group or a linear or branched alkyl group with a carbon number of 3 to 5. A starting material for forming a thin film of the present invention includes the copper compound represented by General Formula (I). The present invention can provide a copper compound which has a low melting point, can be conveyed in a liquid state, has a high vapor pressure, and is easily vaporizable, and also a starting material for forming a thin film which uses such a copper compound.

公开(公告)号：EP3144293A1

公开(公告)日：2017-03-22

申请号：EP15793276.5

申请日：2015-04-08

申请人： Adeka Corporation

发明人： YOSHINO, Tomoharu ,  ENZU, Masaki ,  SAKURAI, Atsushi ,  NISHIDA, Akihiro ,  OKABE, Makoto

IPC分类号： C07C215/08 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285 ,  C07F1/08

CPC分类号： C07F1/08 ,  C07C215/08 ,  C09D1/00 ,  C09D5/24 ,  C23C16/06 ,  C23C16/18 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45553 ,  H01L21/28 ,  H01L21/285

摘要： This invention provides a copper compound represented by General Formula (I) below. In General Formula (I), R 1 to R 3 independently represent a linear or branched alkyl group with a carbon number of 1 to 5; provided that R 1 and R 2 are a methyl group, R 3 represents a linear or branched alkyl group with a carbon number of 2 to 5; and provided that R 1 is a methyl group and R 2 is an ethyl group, R 3 represents a methyl group or a linear or branched alkyl group with a carbon number of 3 to 5. A starting material for forming a thin film of the present invention includes the copper compound represented by General Formula (I). The present invention can provide a copper compound which has a low melting point, can be conveyed in a liquid state, has a high vapor pressure, and is easily vaporizable, and also a starting material for forming a thin film which uses such a copper compound.

摘要翻译： 本发明提供由以下通式（I）表示的铜化合物。 在通式（I）中，R 1至R 3独立地表示具有1至5个碳原子数的直链或支链烷基; 这提供R 1和R 2为甲基，R 3表示直链或支链烷基具有2至5个碳原子数; 并且提供没有R.sup.1是甲基和R 2是乙基，R 3 darstellt甲基或一个直链或支链的烷基具有3至5，一种起始原料的碳原子数为形成本的薄膜 本发明包括通式（I）表示的铜化合物。 本发明可以提供具有低的熔点的铜化合物，可以以液体状态进行输送时，具有高的蒸气压，并且是容易蒸发，因此形成薄膜，该薄膜使用寻求铜化合物的起始原料 ，

公开(公告)号：EP3266763A1

公开(公告)日：2018-01-10

申请号：EP16761428.8

申请日：2016-02-12

申请人： Adeka Corporation

发明人： YOSHINO, Tomoharu ,  ENZU, Masaki ,  NISHIDA, Akihiro ,  SUGIURA, Nana ,  SAKURAI, Atsushi ,  OKABE, Makoto

IPC分类号： C07C251/08 ,  C23C16/18 ,  C07F15/06

摘要： A diazadienyl compound represented by General Formula (I) below:

wherein R 1 and R 2 each independently represent a C 1-6 linear or branched alkyl group, R 3 represents hydrogen, or a C 1-6 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents a valence of the metal atom or silicon atom represented by M.

摘要翻译： 由以下通式（I）表示的二氮杂二烯基化合物：其中R 1和R 2各自独立地表示C 1-6直链或支链烷基，R 3表示氢或C 1-6直链或支链烷基，M表示金属原子或 硅原子，并且n表示由M表示的金属原子或硅原子的化合价。

公开(公告)号：EP2921472A1

公开(公告)日：2015-09-23

申请号：EP13854668.4

申请日：2013-10-21

申请人： Adeka Corporation

发明人： SAKURAI, Atsushi ,  HATASE, Masako ,  YAMADA, Naoki ,  SHIRATORI, Tsubasa ,  SAITO, Akio ,  YOSHINO, Tomoharu

IPC分类号： C07C251/08 ,  C23C16/16 ,  C23C16/40 ,  H01L21/28 ,  H01L21/285 ,  C07F1/08 ,  C07F15/04 ,  C07F15/06

CPC分类号： C07F15/065 ,  C07C251/04 ,  C07C251/08 ,  C07F1/08 ,  C07F7/28 ,  C07F15/045 ,  C23C16/18 ,  C23C16/406 ,  C23C16/408

摘要： The present invention provides a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. Specifically, the present invention provides a metal alkoxide compound represented by general formula (I), and a thin-film-forming material including the metal alkoxide compound. (In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

公开(公告)号：EP3266763B1

公开(公告)日：2020-01-01

申请号：EP16761428.8

申请日：2016-02-12

申请人： Adeka Corporation

发明人： YOSHINO, Tomoharu ,  ENZU, Masaki ,  NISHIDA, Akihiro ,  SUGIURA, Nana ,  SAKURAI, Atsushi ,  OKABE, Makoto

IPC分类号： C07C251/08 ,  C23C16/18 ,  C07F15/06 ,  C23C16/455

公开(公告)号：EP2940025B1

公开(公告)日：2017-02-01

申请号：EP13869190.2

申请日：2013-11-26

申请人： Adeka Corporation

发明人： YOSHINO, Tomoharu ,  SAKURAI, Atsushi ,  SHIRATORI, Tsubasa ,  HATASE, Masako ,  UCHIUZOU, Hiroyuki ,  NISHIDA, Akihiro

IPC分类号： C07F5/06 ,  C23C16/40 ,  H01L21/316

CPC分类号： C23C16/45553 ,  C07F5/069 ,  C23C16/06 ,  C23C16/403 ,  C23C16/44

公开(公告)号：EP2921472B1

公开(公告)日：2017-01-04

申请号：EP13854668.4

申请日：2013-10-21

申请人： Adeka Corporation

发明人： SAKURAI, Atsushi ,  HATASE, Masako ,  YAMADA, Naoki ,  SHIRATORI, Tsubasa ,  SAITO, Akio ,  YOSHINO, Tomoharu

IPC分类号： C07C251/08 ,  C23C16/16 ,  C23C16/40 ,  H01L21/28 ,  H01L21/285 ,  C07F1/08 ,  C07F15/04 ,  C07F15/06

CPC分类号： C07F15/065 ,  C07C251/04 ,  C07C251/08 ,  C07F1/08 ,  C07F7/28 ,  C07F15/045 ,  C23C16/18 ,  C23C16/406 ,  C23C16/408

摘要： The present invention provides a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. Specifically, the present invention provides a metal alkoxide compound represented by general formula (I), and a thin-film-forming material including the metal alkoxide compound. (In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

摘要翻译： 本发明提供具有适合于形成薄膜通过CVD的材料物理性质的金属醇盐化合物，并且特别地，具有适合于用于形成金属铜的薄膜的材料的物理性质的金属醇盐化合物。 具体而言，本发明提供了由通式（I）表示的金属醇盐化合物，以及包括该金属醇盐化合物的薄膜形成材料。 （式中，R 1表示在一个甲基或乙基，R 2表示darstellt为C 1-3直链或支链烷基的氢原子或甲基，R 3，M表示金属原子或硅原子 和n darstellt金属原子或硅原子的价数。