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    Planar optical waveguide apparatus
    2.
    发明公开
    Planar optical waveguide apparatus 审中-公开
    Planare optische Wellenleitervorrichtung

    公开(公告)号：EP1291692A1

    公开(公告)日：2003-03-12

    申请号：EP02010067.3

    申请日：2002-05-06

    Applicant: Agilent Technologies Inc

    Inventor： Lemoff, Brian Elliot ,  Gong, William ,  Tella, Richard P. ,  Ranganath, Tirumala R.

    IPC: G02B6/42 ,  G02B6/30 ,  G02B6/12

    CPC classification number: G02B6/4224 ,  G02B6/13 ,  G02B6/136 ,  G02B6/30

    Abstract: Planar optical waveguide apparatus and methods for fabricating planar optical waveguide apparatus. The apparatus has a core layer and a cladding layer, the core layer having at least one optical waveguide, and an alignment structure or marker spaced from and positioned with respect to the at least one optical waveguide to facilitate measuring a position of the at least one optical waveguide. The alignment structure has a first alignment structure, such as a reflecting member, to facilitate measuring a height of the at least one optical waveguide; and a second alignment structure, such as alignment marks, to facilitate measuring positions of the at least one optical waveguide in a plane of the at least one optical waveguide. The method includes forming both the optical waveguide and at least a portion of the alignment structure simultaneously in a single processing step, preferably by etching, to ensure that the optical waveguide and the alignment structure are in perfect registration.

    Abstract translation: 平面光波导装置及其制造方法。 所述装置具有芯层和包覆层，所述芯层具有至少一个光波导，以及与所述至少一个光波导隔开并相对于所述至少一个光波导定位的对准结构或标记，以便于测量所述至少一个光波导的位置 光波导。 对准结构具有第一对准结构，例如反射构件，以便于测量至少一个光波导的高度; 以及诸如对准标记的第二对准结构，以便于在至少一个光波导的平面中测量至少一个光波导的位置。 该方法包括在单个处理步骤中优选通过蚀刻同时形成光波导和对准结构的至少一部分，以确保光波导和对准结构完全配准。

    LIGHT SOURCE WITH CONTROLLABLE LINEAR POLARISATION
    3.
    发明公开
    LIGHT SOURCE WITH CONTROLLABLE LINEAR POLARISATION 审中-公开
    LICHTQULELE MIT STEBERBARER线性偏振

    公开(公告)号：EP3125019A1

    公开(公告)日：2017-02-01

    申请号：EP16181685.5

    申请日：2016-07-28

    Applicant: Agilent Technologies, Inc.

    Inventor： Tella, Richard P. ,  Bricker, Dower Cameron ,  Han, Yang ,  Klenczewski, Adam

    IPC: G02B27/28 ,  G02F1/01 ,  G02B26/00 ,  F21V9/14 ,  H01S3/10 ,  G01N21/21

    CPC classification number: G01J4/02 ,  G01N2021/217 ,  G01N2021/556 ,  G02B5/3058 ,  G02B26/00 ,  G02B27/286 ,  G02F1/0136 ,  H01S5/005 ,  H01S5/0071 ,  H01S5/3401 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4075

    Abstract: A light source (11, 30, 40) having first and second wire-grid polarizers (63, 64) and a laser (31, 71) that emits a beam of linearly polarized light that is characterized by a propagation direction is disclosed. The first wire-grid polarization filter (63) is characterized by a first linear polarization pass direction and a first actuator (65) for causing the first linear polarization pass direction to rotate relative to the beam of linearly polarized light. The second wire-grid polarization filter (64) is characterized by a second linear polarization pass direction and a second actuator for causing the second linear polarization pass direction to rotate relative to the beam of linearly polarized light. A controller (29) sets the first and second linear polarization pass directions to provide linearly polarized light having a specified polarization direction.

    Abstract translation: 公开了具有第一和第二线栅偏振器（63,64）的光源（11,30,40）和发射以传播方向为特征的线偏振光束的激光器（31,71）。 第一线栅偏振滤光器（63）的特征在于第一线偏振光通过方向和第一致动器（65），用于使第一线偏振光通过方向相对于线偏振光束旋转。 第二线栅偏振滤光器（64）的特征在于第二线偏振光通过方向和第二致动器，用于使第二线偏振光通过方向相对于线偏振光束旋转。 控制器（29）设置第一和第二线性偏振通过方向以提供具有指定偏振方向的线偏振光。

    Non-contact fluid deposition device
    5.
    发明公开
    Non-contact fluid deposition device 审中-公开
    KontaktfreiesFluidabscheidungsgerät

    公开(公告)号：EP1321190A2

    公开(公告)日：2003-06-25

    申请号：EP02258742.2

    申请日：2002-12-18

    Applicant: Agilent Technologies Inc. a Delaware Corporation

    Inventor： Daquino, Lawrence J. ,  Tella, Richard P.

    IPC: B01L3/02 ,  B01J19/00 ,  B41J2/01 ,  C12Q1/68

    CPC classification number: B82Y30/00 ,  B01J19/0046 ,  B01J2219/00378 ,  B01J2219/00527 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00677 ,  B01J2219/00686 ,  B01J2219/00693 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01J2219/00731 ,  B01L3/0241 ,  B01L9/54 ,  B41J2/1752 ,  B41J2/2135 ,  B41J2002/14403 ,  C40B40/06 ,  C40B40/10 ,  C40B40/12 ,  C40B60/14 ,  G01N35/1002 ,  G01N35/1072 ,  G01N35/1074 ,  G01N2035/1041

    Abstract: Non-contact fluid deposition devices having multiple axis printhead adjusters are made up of a single rigid frame (100) that holds at least one printhead housing (200a), where in certain embodiments multiple printhead housings, e.g., two, are held in side-by-side configuration in the single rigid frame of the adjuster. Each housing (200a) is adjusted in said adjuster by its own set of axis adjustment elements (400), where the set includes a rotational axis adjustment element for each horizontal and/or vertical axis adjustment element that is present. In using the devices, a printhead present in the adjuster is loaded with a volume of fluid, which in many embodiments is a fluid that includes a biopolymer or precursor thereof. The loaded printhead is then placed in opposing relation to a surface of a substrate and actuated to deposit a volume of fluid on the substrate. Prior to fluid loading and/or deposition, the printhead is typically adjusted with the set of axis adjustment elements.

    Abstract translation: 具有多轴打印头调节器的非接触式流体沉积装置由保持至少一个打印头外壳（200a）的单个刚性框架（100）组成，其中在某些实施例中，多个打印头外壳（例如两个） 并排配置在调节器的单个刚性框架中。 每个壳体（200a）通过其自身的一组轴线调节元件（400）在所述调节器中调节，其中该组件包括用于存在的每个水平和/或垂直轴线调节元件的旋转轴调节元件。 在使用这些装置时，存在于调节器中的打印头装载有一定体积的流体，在许多实施例中，其是包含生物聚合物或其前体的流体。 然后，将加载的打印头以与基板的表面相对的关系放置，并致动以将一定体积的流体沉积在基板上。 在流体加载和/或沉积之前，打印头通常用该组轴调节元件进行调整。

    INFRARED IMAGING SYSTEM WITH AUTOMATIC REFERENCING
    7.
    发明公开
    INFRARED IMAGING SYSTEM WITH AUTOMATIC REFERENCING 审中-公开
    智能手机自动化系统

    公开(公告)号：EP3112844A1

    公开(公告)日：2017-01-04

    申请号：EP16176083.0

    申请日：2016-06-24

    Applicant: Agilent Technologies, Inc.

    Inventor： Ghetler, Andrew ,  Kleczewski, Adam ,  Tella, Richard P.

    IPC: G01N21/27 ,  G01J3/42 ,  G01N21/3563 ,  G01N21/47 ,  G01N21/55

    CPC classification number: G01J3/0297 ,  G01J3/10 ,  G01J3/108 ,  G01J3/2823 ,  G01J3/42 ,  G01N21/274 ,  G01N21/276 ,  G01N21/3563 ,  G01N21/4785 ,  G01N21/55 ,  G01N2201/101 ,  G01N2201/1042 ,  G01N2201/127

    Abstract: A method and apparatus for obtaining reference samples, i.e. measuring reference targets (62) on a reference stage (61) during the generation of a mid-infrared (MIR) image without requiring that a sample specimen (16), being placed on a specimen stage (57) and imaged, be removed is disclosed. A tunable MIR laser (11) generates a light beam (18) that is focused onto the sample specimen on the specimen stage that moves the specimen in a first direction (33). An optical assembly includes a scanning assembly (31) having a focusing lens (55) and a mirror (56) that moves in a second direction (32), different from the first direction, relative to the specimen stage. A light detector (13) measures an intensity of light leaving the point on the specimen. A controller (39) forms an image from the measured intensity. The reference stage (61) is positioned such that the scanning assembly moves over the reference stage in response to a command so that the controller can also make a reference measurement.

    Abstract translation: 一种用于获得参考样本的方法和装置，即在产生中红外（MIR）图像期间在参考台（61）上测量参考目标（62），而不需要将样本（16）放置在样本 公开了阶段（57）并被成像。 可调谐MIR激光器（11）产生聚焦在样品台上的样品样本上的光束（18），样品台沿第一方向（33）移动样本。 光学组件包括具有聚焦透镜（55）的扫描组件（31）和相对于样品台沿与第一方向不同的第二方向（32）移动的反射镜（56）。 光检测器（13）测量离开样品点的光的强度。 控制器（39）根据测量的强度形成图像。 基准台（61）被定位成使得扫描组件响应于命令移动到参考台上，使得控制器也可进行参考测量。

    MALDI sample plate imaging workstation
    9.
    发明公开
    MALDI sample plate imaging workstation 有权
    MALDI Probenhalter Bildgebungsarbeitsstation

    公开(公告)号：EP1763061A2

    公开(公告)日：2007-03-14

    申请号：EP06254631.2

    申请日：2006-09-06

    Applicant: Agilent Technologies, Inc.

    Inventor： Truche, Jean-Luc ,  Overney, Gregor T. ,  Fisher, William D. ,  Tella, Richard P.

    IPC: H01J49/16

    CPC classification number: H01J49/0418 ,  G03B15/07

    Abstract: The invention provide an apparatus for producing an image of a global surface of an ion source sample plate (4) that is exterior to an ion source. In general terms, the apparatus contains a sample plate for an ion source, an imaging device (8) (e.g., a CCD or CMOS camera) and an illumination device (6) that is configured to produce a light beam (10) that contacts the sample plate surface to define a grazing angle (12) between the light beam and the sample plate surface. The light beam (10) may be reflected, diffracted or scattered as a light beam (14), at an angle (16) to the surface of the sample plate (4). The imaging device 8 may be at an angle (16) to the surface of the sample plate. The apparatus may be present at a location that is remote to the ion source.

    Abstract translation: 本发明提供了一种用于制造离子源样品板（4）的全局表面的图像的装置，其在离子源外部。 一般来说，该装置包括用于离子源的样品板，成像装置（8）（例如，CCD或CMOS照相机）和照明装置（6），其被配置为产生接触的光束（10） 样品板表面以限定光束和样品板表面之间的掠射角（12）。 光束（10）可以作为光束（14）以与样品板（4）的表面成角度（16）被反射，衍射或散射。 成像装置8可以与样品板的表面成角度（16）。 该装置可以存在于远离离子源的位置处。

    MALDI sample plate imaging workstation
    10.
    发明公开
    MALDI sample plate imaging workstation 有权
    MALDI样品架成像工作站

    公开(公告)号：EP1763061A3

    公开(公告)日：2008-09-10

    申请号：EP06254631.2

    申请日：2006-09-06

    Applicant: Agilent Technologies, Inc.

    Inventor： Truche, Jean-Luc ,  Overney, Gregor T. ,  Fisher, William D. ,  Tella, Richard P.

    IPC: H01J49/16

    CPC classification number: H01J49/0418 ,  G03B15/07

    Abstract: The invention provide an apparatus for producing an image of a global surface of an ion source sample plate (4) that is exterior to an ion source. In general terms, the apparatus contains a sample plate for an ion source, an imaging device (8) (e.g., a CCD or CMOS camera) and an illumination device (6) that is configured to produce a light beam (10) that contacts the sample plate surface to define a grazing angle (12) between the light beam and the sample plate surface. The light beam (10) may be reflected, diffracted or scattered as a light beam (14), at an angle (16) to the surface of the sample plate (4). The imaging device 8 may be at an angle (16) to the surface of the sample plate. The apparatus may be present at a location that is remote to the ion source.

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