摘要:
An optical element having a variable index of refraction. The optical element utilizes a layer of a transparent dielectric material having an index of refraction determined by the concentration of hydrogen in the dielectric material. A layer of a hydrogen reservoir medium that includes a material that acts as a source or a sink for hydrogen is placed adjacent to the transparent dielectric layer. The reservoir medium accepts hydrogen from the transparent layer in response to a first electric field being applied across the transparent layer and reservoir layer and donates hydrogen to the transparent layer in response to a second electric field being applied across the transparent layer and the reservoir layer. The electric fields are generated by applying appropriate potentials across first and second electrodes that sandwich the dielectric and reservoir layers. The preferred reservoir material is KOH. The transparent dielectric material preferably includes a material chosen from the group consisting of hydrides of an alkali, alkaline-earth, rare-earth metals, and alloys thereof.
摘要:
An optical cross-connect switch[10] for routing light signals between N input optical fibers[12] and M output optical fibers[14]. The switch utilizes an NxM array of optical switching elements[15,16], each optical switching element[15,16] routing a light signal from one of the input optical fibers[12] to one of the output optical fibers[14]. Each optical switching element[15,16] includes a layer of a switching material, first and second transparent electrodes[32,35] overlying the layer of switching material[34], and a layer of hydrogen reservoir material[33] adjacent to the layer of switching material[34]. The switching material has first and second states. The switching material is transparent to the light signals in the first state, and the switching material reflects the light signals in the second state. The state of the switching material is determined by the concentration of hydrogen in the material. The hydrogen reservoir material supplies hydrogen to the switching material when a first potential difference is applied between the first and second electrodes[32,35] and absorbs hydrogen from the switching material when a second potential difference is applied between the first and second electrodes[32,35]. The switching material preferably includes a material chosen from the group consisting of alkali, alkaline-earth, rare-earth metals, and the alloys and hydrides thereof.
摘要:
An epitaxial material (55) grown laterally from a surface (56a, 56b) formed in a first epitaxial material (52) having a different lattice parameter allows for the formation of epitaxial material (55) that includes a region (60) that is substantially free of cracks (17). Growing a second epitaxial material (55) from a side wall (56a, 56b) of a trench (57) formed in a first epitaxial material (52) having a different lattice parameter rotates the growth direction of the second epitaxial material (55) through approximately 90° with respect to the major surface (63) of the first epitaxial material (52). In this manner, cracks (17) that occur in the second epitaxial material (55) tend to occur in the direction perpendicular to the side wall (56a, 56b) from which the second epitaxial growth initiates, which direction is also parallel to the major surface (63) of the first epitaxial material (52). This results in a substantially crack-free epitaxial material (60) growing out of the trench (57). The substantially crack-free epitaxial material (60) may by used as a platform from which to grow successive epitaxial layers.
摘要:
An optical cross-connect switch[10] for routing light signals between N input optical fibers[12] and M output optical fibers[14]. The switch utilizes an NxM array of optical switching elements[15,16], each optical switching element[15,16] routing a light signal from one of the input optical fibers[12] to one of the output optical fibers[14]. Each optical switching element[15,16] includes a layer of a switching material, first and second transparent electrodes[32,35] overlying the layer of switching material[34], and a layer of hydrogen reservoir material[33] adjacent to the layer of switching material[34]. The switching material has first and second states. The switching material is transparent to the light signals in the first state, and the switching material reflects the light signals in the second state. The state of the switching material is determined by the concentration of hydrogen in the material. The hydrogen reservoir material supplies hydrogen to the switching material when a first potential difference is applied between the first and second electrodes[32,35] and absorbs hydrogen from the switching material when a second potential difference is applied between the first and second electrodes[32,35]. The switching material preferably includes a material chosen from the group consisting of alkali, alkaline-earth, rare-earth metals, and the alloys and hydrides thereof.
摘要:
A current confinement region (15, 55) located proximate to a pair of Bragg reflectors (12, 22; 52, 62) in a semiconductor laser (10, 50) and an epitaxial lateral overgrowth layer (16, 58) grown through an aperture (20, 60) in the current confinement region (15, 55) allows a desirable current flow (24, 66) in the laser (10, 50). The placement of the current confinement region (15, 55) having an aperture (20, 60) formed therein allows the desired current flow (24, 66) through an active layer 17, 56) of the laser (10, 50). This current flow (24, 66) allows the laser (10, 50) to achieve a single spatial mode output. Furthermore, the ability to place a pair of Bragg reflectors (12, 22; 52, 62) in close proximity to each other achieves a short optical cavity (23, 65) resulting in a single longitudinal mode output. Together, the single spatial mode and single longitudinal mode result in a desired single frequency output. The single frequency output is particularly useful for high speed, high rate optical and telecommunications.
摘要:
A method for detaching an epitaxial layer (17, 37) from one substrate (11) and transferring it to another substrate (18) allows an epitaxially grown material layer to be easily detached from a first substrate (11) that has good epitaxial growth properties and transferred to another substrate (18) having better cleaving, electrical or other properties than the first substrate (11). A mask (14) is applied to a portion of a surface of the first epitaxial layer (12) and a second epitaxial layer (17, 37) is grown over the first epitaxial layer (12) and the mask (14). A trench (20) is formed in the second epitaxial layer (17, 37) to expose the mask (14) and a second substrate (18) is bonded to the second epitaxial layer (17, 37). An etchant is introduced through the trench (20) and etches away the mask (14), thus releasing the second epitaxial layer (17, 37) from the first substrate (11) and the first epitaxial layer (12). Thus, the second epitaxial layer (17, 37) has been released from the first substrate (11) and transferred to the second substrate (18) without performing operations that would impair the optical properties of the epitaxial material.
摘要:
A current confinement region (15, 55) located proximate to a pair of Bragg reflectors (12, 22; 52, 62) in a semiconductor laser (10, 50) and an epitaxial lateral overgrowth layer (16, 58) grown through an aperture (20, 60) in the current confinement region (15, 55) allows a desirable current flow (24, 66) in the laser (10, 50). The placement of the current confinement region (15, 55) having an aperture (20, 60) formed therein allows the desired current flow (24, 66) through an active layer 17, 56) of the laser (10, 50). This current flow (24, 66) allows the laser (10, 50) to achieve a single spatial mode output. Furthermore, the ability to place a pair of Bragg reflectors (12, 22; 52, 62) in close proximity to each other achieves a short optical cavity (23, 65) resulting in a single longitudinal mode output. Together, the single spatial mode and single longitudinal mode result in a desired single frequency output. The single frequency output is particularly useful for high speed, high rate optical and telecommunications.
摘要:
An optical element having a variable index of refraction. The optical element utilizes a layer of a transparent dielectric material having an index of refraction determined by the concentration of hydrogen in the dielectric material. A layer of a hydrogen reservoir medium that includes a material that acts as a source or a sink for hydrogen is placed adjacent to the transparent dielectric layer. The reservoir medium accepts hydrogen from the transparent layer in response to a first electric field being applied across the transparent layer and reservoir layer and donates hydrogen to the transparent layer in response to a second electric field being applied across the transparent layer and the reservoir layer. The electric fields are generated by applying appropriate potentials across first and second electrodes that sandwich the dielectric and reservoir layers. The preferred reservoir material is KOH. The transparent dielectric material preferably includes a material chosen from the group consisting of hydrides of an alkali, alkaline-earth, rare-earth metals, and alloys thereof.
摘要:
A laser diode[200] that is constructed in a trench[216] in a manner such that the material in the trench[216] acts as a waveguide. The laser diode[200] includes a first contact layer[214] constructed from a first semiconducting material of a first carrier type, the first semiconducting material having a first index of refraction. The first contact layer[214] has a trench[216] therein. The trench[216] has a layer of a second semiconducting material of the first carrier type on the bottom surface. The index of refraction of the second semiconducting material is at least one percent greater than the index of refraction of the first semiconducting material. The laser also includes a first dielectric layer[215] covering the first layer in those regions outside of the trench[216] and a first cladding layer[221] constructed from a third semiconducting material of the first carrier type. The first cladding layer[221] overlies the dielectric layer. An active layer[222] overlies the first cladding layer[221]. A second cladding layer[223] constructed from a fourth semiconducting material of the opposite carrier type from the first carrier type overlies the active layer[222]. A second contact layer[224] of a fifth semiconducting material of the opposite carrier type from the first carrier type overlies the second cladding layer[223]. The invention is particularly well suited for constructing laser diodes based on group III-V material systems such as GaN.