摘要:
To provide tempered glass which is thin and can be produced by common air-quench tempering without requiring a special production facility, and untreated glass for such tempered glass. The tempered glass is obtainable via a heating step and a cooling step. The heating step is a step of applying heat treatment to glass to be treated, of which the glass transition point is from 500 to 600°C and the maximum value of the thermal expansion coefficient (αmax) between the glass transition point and the yield point is at least 430×10 -7 /°C. The cooling step is a step of applying air-quenching treatment to the glass to be treated.
摘要:
The present invention relates to a production method for a non-alkali glass, containing putting glass raw materials in a melting furnace, heating to a temperature of 1,350 to 1,750°C to prepare a molten glass, and forming the molten glass into a sheet shape by float method, in which the heating in the melting furnace concurrently utilizes heating by combustion flame of burners and electrical heating of the molten glass by heating electrodes arranged so as to be dipped in the molten glass in the melting furnace, and in which when electrical resistivity at 1,350°C of the molten glass is represented by Rg (Ωcm) and electrical resistivity at 1,350°C of a refractory constituting the melting furnace is represented by Rb (Ωcm), the glass raw materials and the refractory are selected so as to achieve Rb>Rg.
摘要:
A method of cutting a strengthened glass plate includes irradiating a laser beam 20 on a front surface 12 of a strengthened glass plate 10 and moving an irradiation area 22 of the laser beam 20 on the front surface 12 of the strengthened glass plate 10. The laser beam has a wavelength from 800 to 1100 nm and 70.00% to 99.8% of the laser beam 20 injected into the front surface 12 of the strengthened glass plate 10 is transmitted. Further, the strengthened glass plate 10 is cut by heating an intermediate layer 17 at the irradiation area 22 at a temperature less than or equal to an annealing point while moving the irradiation area 22 of the laser beam 20 at a speed greater than or equal to 1.0 mm / sec so that a crack that penetrates the strengthened glass plate 10 in the thickness direction follows the irradiation area 22.
摘要:
The present invention relates to a method of manufacturing a lithium ion conductive solid electrolyte that is used for a lithium-ion secondary battery or the like and a lithium-ion secondary battery including such a lithium ion conductive solid electrolyte. Although a method is proposed in which glass including monovalent ions whose ionic radii are larger than those of lithium ions is performed with an ion-exchange process in lithium ions contained in molten salt is proposed conventionally, the improved effect of the lithium ion conductivity was not enough. A method of manufacturing a lithium ion conductive solid electrolyte includes (a) a step of preparing an object to be processed including a crystalline material, that includes alkali metal other than lithium and whose ionic conductivity at room temperature is greater than or equal to 1 × 10 -13 S/cm; and (b) a step of performing an ion-exchange process on the object to be processed in molten salt including lithium ions.
摘要:
The present invention provides a TiO 2 -containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO 2 -containing silica glass for optical member for EUV lithography, having a TiO 2 concentration of from 3 to 14 % by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T 400-700 , of 97 % or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T 400-3000 , of 70 % or more.
摘要:
The present invention provides a TiO 2 -SiO 2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO 2 -containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100 °C or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100 °C of 30 ppb/°C or lower; a temperature width DT, in which a coefficient of linear thermal expansion is 0 ± 5 ppb/°C, of 5°C or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/°C, falling within the range of from 30 to 150 °C.