CRYSTALLINE CHROMIUM DEPOSIT
    1.
    发明授权
    CRYSTALLINE CHROMIUM DEPOSIT 有权
    结晶铬矿床

    公开(公告)号:EP2010697B1

    公开(公告)日:2018-03-07

    申请号:EP07759561.9

    申请日:2007-03-28

    摘要: A crystalline chromium deposit having a lattice parameter of 2.8895+/−0.0025 Å, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.

    SURFACE TREATMENT COMPOSITION
    4.
    发明公开

    公开(公告)号:EP3303486A1

    公开(公告)日:2018-04-11

    申请号:EP16727440.6

    申请日:2016-06-01

    摘要: The present invention relates to an acidic aqueous composition for treating of zirconium-pretreated metal-based substrate surfaces such as steel metals or aluminium surfaces, a process for treating the substrate surfaces with the composition and the use of the composition as post-treatment of zirconium-pretreated metal-based substrate surfaces for subsequent electrocoating of the surfaces to increase corrosion resistance of said metal-based surfaces prior to electro-coating (e-coat) applications and increases detergent and chemical resistance of treated surfaces used in the white goods industry. The acidic aqueous composition comprises trivalent chromium ions; and hexafluorozirconate ions; characterized in that the source of trivalent chromium ions is a trivalent chromium nitrate salt.

    CRYSTALLINE CHROMIUM ALLOY DEPOSIT
    5.
    发明公开
    CRYSTALLINE CHROMIUM ALLOY DEPOSIT 有权
    涂布结晶铬合金

    公开(公告)号:EP2217745A1

    公开(公告)日:2010-08-18

    申请号:EP08835384.2

    申请日:2008-10-02

    IPC分类号: C25D3/06 C25D3/10

    CPC分类号: C25D3/06 C25D3/10

    摘要: An electrodeposited crystalline functional chromium deposit which is nanogranular as deposited, and the deposit may be both TEM and XRD crystalline or may be TEM crystalline and XRD amorphous. In various embodiments, the deposit includes one or any combination of two or more of an alloy of chromium, carbon, nitrogen, oxygen and sulfur; a {111} preferred orientation; an average crystal grain cross-sectional area of less than about 500 nm2; and a lattice parameter of 2.8895+/−0.0025 A. A process and an electrodeposition bath for electrodepositing the nanogranular crystalline functional chromium deposit on a substrate, including providing the electrodeposition bath including trivalent chromium, a source of divalent sulfur, a carboxylic acid, a source of nitrogen and being substantially free of hexavalent chromium; immersing a substrate in the bath; and applying an electrical current to electrodeposit the deposit on the substrate.

    CRYSTALLINE CHROMIUM DEPOSIT
    6.
    发明公开
    CRYSTALLINE CHROMIUM DEPOSIT 有权
    ABSCHEIDUNG VON KRISTALLINEM CHROM

    公开(公告)号:EP2010697A1

    公开(公告)日:2009-01-07

    申请号:EP07759561.9

    申请日:2007-03-28

    IPC分类号: C25D3/06 C25D3/10

    摘要: A crystalline chromium deposit having a lattice parameter of 2.8895+/−0.0025 Å, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.

    摘要翻译: 具有2.8895 +/- 0.0025的晶格参数的结晶铬沉积物和包含结晶铬沉积物的制品。 包括结晶铬沉积物的物品,其中结晶铬沉积物具有{111}优选的取向。 一种用于在基底上电沉积结晶铬沉积物的方法,包括提供包含三价铬和二价硫源的电镀浴,并且基本上不含六价铬; 将基板浸入电镀槽中; 以及施加电流以沉积在所述基底上的结晶铬沉积物,其中所述铬沉积物是结晶沉积的。