公开(公告)号：EP3394234B1

公开(公告)日：2019-10-09

申请号：EP16822665.2

申请日：2016-12-20

Applicant: BASF SE

Inventor： DÄSCHLEIN, Christian ,  SIEBERT, Max ,  LAUTER, Michael ,  PRZYBYLSKI, Peter ,  PROELSS, Julian ,  KLIPP, Andreas ,  GUEVENC, Haci Osman ,  LEUNISSEN, Leonardus ,  BAUMANN, Roelf-Peter ,  WEI, Te Yu

IPC: C11D3/37 ,  C11D11/00 ,  H01L21/02 ,  H01L21/321

公开(公告)号：EP3394879A2

公开(公告)日：2018-10-31

申请号：EP16819532.9

申请日：2016-12-20

Applicant: BASF SE

Inventor： DÄSCHLEIN, Christian ,  SIEBERT, Max ,  LAUTER, Michael ,  PRZYBYLSKI, Piotr ,  PROELSS, Julian ,  KLIPP, Andreas ,  GUEVENC, Haci Osman ,  LEUNISSEN, Leonardus ,  BAUMANN, Roelf-Peter ,  WEI, Te Yu

IPC: H01L21/321 ,  C11D3/00 ,  C11D3/37 ,  C11D11/00

CPC classification number: C11D11/0047 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/3707 ,  C11D3/3719 ,  C11D3/3753 ,  C11D3/3765 ,  C11D3/3776 ,  H01L21/02074 ,  H01L21/3212

Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more nonionic polymers selected from the group consisting of poly- acrylamides, polyhydroxyethyl(meth)acrylates (PHE(M)A), polyvinylpyrrolidone (PVP), polyvinyl alcohol (PVA), polymers of formula (I), and mixtures thereof, wherein R1 is hydrogen, methyl, ethyl, n-propyl, /so-propyl, n-butyl, iso-butyl, or sec-butyl, R2 is hydrogen or methyl, and n is an integer, (B) poly(acrylic acid) (PAA) or acrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.

公开(公告)号：EP3394234A1

公开(公告)日：2018-10-31

申请号：EP16822665.2

申请日：2016-12-20

Applicant: BASF SE

Inventor： DÄSCHLEIN, Christian ,  SIEBERT, Max ,  LAUTER, Michael ,  PRZYBYLSKI, Peter ,  PROELSS, Julian ,  KLIPP, Andreas ,  GUEVENC, Haci Osman ,  LEUNISSEN, Leonardus ,  BAUMANN, Roelf-Peter ,  WEI, Te Yu

IPC: C11D3/37 ,  C11D11/00 ,  H01L21/02 ,  H01L21/321

CPC classification number: C11D3/3707 ,  C11D3/0026 ,  C11D3/3719 ,  C11D3/3765 ,  C11D3/378 ,  C11D3/3784 ,  C11D11/0035 ,  C11D11/0047 ,  H01L21/02074

Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) polyethylene glycol (PEG) with a mass average molar mass (Mw) in the range of from 400 to 8,000 g/mol, (B) an anionic polymer selected from the group consisting of poly(acrylic acid) (PAA), acrylic acid-maleic acid copolymers, polyaspartic acid (PASA), polyglutamic acid (PGA), polyvinylphosphonic acid, polyvinylsulfonic acid, poly(styrenesulfonic acid), polycarboxylate ethers (PCE), PEG-phosphorous acids, and copolymers of said polymers, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.