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公开(公告)号：EP3894496A1
公开(公告)日：2021-10-20
申请号：EP19816739.7
申请日：2019-12-12
Applicant: BASF SE
Inventor： GUEVENC, Haci Osman , LAUTER, Michael , WEI, Te Yu , CHIU, Wei Lan , GOLZARIAN, Reza , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02 , C09K3/14 , H01L21/30 , H01L21/321 , H01L21/02
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2.发明公开
公开(公告)号：EP3433327A1
公开(公告)日：2019-01-30
申请号：EP17710271.2
申请日：2017-03-13
Applicant: BASF SE
Inventor： LAUTER, Michael , GUEVENC, Haci Osman , SIEBERT, Max , LAN, Yongqing , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza M. , WEI, Te Yu
IPC: C09G1/04
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公开(公告)号：EP4010442A1
公开(公告)日：2022-06-15
申请号：EP20750666.8
申请日：2020-08-04
Applicant: BASF SE
Inventor： LAUTER, Michael , GUEVENC, Haci Osman , WEI, Te Yu , CHAO, Ching Hsun
IPC: C09G1/02 , H01L21/304 , H01L21/321
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公开(公告)号：EP3334794B1
公开(公告)日：2020-02-19
申请号：EP16748132.4
申请日：2016-08-09
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza M. , WEI, Te Yu , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02
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公开(公告)号：EP3394234B1
公开(公告)日：2019-10-09
申请号：EP16822665.2
申请日：2016-12-20
Applicant: BASF SE
Inventor： DÄSCHLEIN, Christian , SIEBERT, Max , LAUTER, Michael , PRZYBYLSKI, Peter , PROELSS, Julian , KLIPP, Andreas , GUEVENC, Haci Osman , LEUNISSEN, Leonardus , BAUMANN, Roelf-Peter , WEI, Te Yu
IPC: C11D3/37 , C11D11/00 , H01L21/02 , H01L21/321
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Patent Agency Ranking
公开(公告)号：EP4499765A1
公开(公告)日：2025-02-05
申请号：EP23715096.6
申请日：2023-03-27
Applicant: BASF SE
Inventor： CHAO, Ching Hsun , TSAI, Tsung Yu , CHEN, Yong Yu , LAUTER, Michael , WEI, Te Yu
IPC: C09G1/02 , C09K3/14 , H01L21/3105
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公开(公告)号：EP3894494A1
公开(公告)日：2021-10-20
申请号：EP19816722.3
申请日：2019-12-11
Applicant: BASF SE
Inventor： GUEVENC, Haci Osman , LEUNISSEN, Leonardus , LAUTER, Michael , GOLZARIAN, Reza M , DAESCHLEIN, Christian , PROELSS, Julian , WEI, Te Yu
IPC: C09G1/02 , H01L21/30 , C09K3/14 , H01L21/321 , H01L21/02
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公开(公告)号：EP3714012A1
公开(公告)日：2020-09-30
申请号：EP18799774.7
申请日：2018-11-12
Applicant: BASF SE
Inventor： DAESCHLEIN, Christian , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza , WEI, Te Yu , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02 , H01L21/306 , H01L21/321
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9.发明公开
公开(公告)号：EP3334794A1
公开(公告)日：2018-06-20
申请号：EP16748132.4
申请日：2016-08-09
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza M. , WEI, Te Yu , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02
Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer≥1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.
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公开(公告)号：EP4010443A1
公开(公告)日：2022-06-15
申请号：EP20751141.1
申请日：2020-08-04
Applicant: BASF SE
Inventor： LAUTER, Michael , GUEVENC, Haci Osman , CHIU, Wei Lan , WEI, Te Yu
IPC: C09G1/02 , H01L21/304 , H01L21/321
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