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公开(公告)号：EP3714012A1
公开(公告)日：2020-09-30
申请号：EP18799774.7
申请日：2018-11-12
Applicant: BASF SE
Inventor： DAESCHLEIN, Christian , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza , WEI, Te Yu , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02 , H01L21/306 , H01L21/321
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2.发明公开
公开(公告)号：EP3334794A1
公开(公告)日：2018-06-20
申请号：EP16748132.4
申请日：2016-08-09
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza M. , WEI, Te Yu , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02
Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer≥1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.
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3.发明公开USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND/OR COBALT ALLOY COMPRISING SUBSTRATES 审中-公开化学机械抛光（CMP）组合物用于抛光包含基材的钴和/或钴合金的用途
公开(公告)号：EP3237562A1
公开(公告)日：2017-11-01
申请号：EP15820852.0
申请日：2015-12-22
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/00
CPC classification number: C09G1/02 , B24B37/20 , C09K3/1409 , C23F3/06 , H01L21/3212 , H01L21/7684
Abstract: A chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) containing (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) contains: (A) Inorganic particles, (B) a substituted aromatic compound with at least one carboxylic acid function as corrosion inhibitor, (C) at least one amino acid, (D) at least one oxidizer, (E) an aqueous medium, wherein the CMP composition (Q) has a pH of from 7 to 10.
Abstract translation: 使用包含（i）钴和/或（ii）钴合金的基材（S）的化学机械抛光（CMP）组合物（Q），其中CMP组合物（Q）包含（A）无机 （B）具有至少一个羧酸功能的取代的芳族化合物作为腐蚀抑制剂，（C）至少一种氨基酸，（D）至少一种氧化剂，（E）水性介质，其中所述CMP组合物（Q ）具有7至10的pH。
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公开(公告)号：EP3237563B1
公开(公告)日：2019-02-20
申请号：EP15817796.4
申请日：2015-12-16
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/02 , H01L21/304 , H01L21/321 , B24B37/04
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5.发明公开
公开(公告)号：EP3433327A1
公开(公告)日：2019-01-30
申请号：EP17710271.2
申请日：2017-03-13
Applicant: BASF SE
Inventor： LAUTER, Michael , GUEVENC, Haci Osman , SIEBERT, Max , LAN, Yongqing , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza M. , WEI, Te Yu
IPC: C09G1/04
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Patent Agency Ranking
公开(公告)号：EP3110761A1
公开(公告)日：2017-01-04
申请号：EP15701319.4
申请日：2015-01-16
Applicant: BASF SE
Inventor： SIEBERT, Max , KEMPTER, Andreas , HESSE, Christoph , LOGES, Niklas , SCHMITT, Rebecca
CPC classification number: C04B22/143 , C01F11/46 , C04B24/2694 , C04B28/146 , C04B28/16 , C04B28/165 , C04B40/0042 , C04B2103/14 , C04B2111/0062 , C04B2111/62 , C04B2111/72 , C04B24/163 , C04B24/246 , C04B24/2647 , C04B24/267 , C04B24/2658 , C04B22/0086
Abstract: The invention concerns a method for producing pulverulent hardening accelerators by reactive spray drying, where an aqueous phase I comprising calcium ions, and an aqueous phase II comprising sulphate ions, the molar ratio of the calcium ions to the sulphate ions being from 1/5 to 5/1, are contacted at a spray nozzle, and the phases I and II contacted with one another at the spray nozzle are sprayed in a streaming environment of drying gas. Likewise concerned are the pulverulent hardening accelerators producible by the method of the invention, and their use for accelerating the hardening of bassanite and/or anhydrite with formation of gypsum.
Abstract translation: 本发明涉及通过反应性喷雾干燥制备粉末硬化促进剂的方法，其中包含钙离子的水相I和包含硫酸根离子的水相II，钙离子与硫酸根离子的摩尔比为1/5至 5/1在喷嘴处接触，并且在喷雾喷嘴处彼此接触的相I和II在干燥气体的流动环境中喷雾。 同样关心的是通过本发明的方法可生产的粉末硬化促进剂及其用于加速形成石膏的巴生石和/或无水石膏的硬化的用途。
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公开(公告)号：EP3469049A1
公开(公告)日：2019-04-17
申请号：EP17726645.9
申请日：2017-05-31
Applicant: BASF SE
Inventor： DAESCHLEIN, Christian , SIEBERT, Max , LAUTER, Michael , LEUNISSEN, Leonardus , GARCIA ROMERO, Ivan , GUEVENC, Haci Osman , PRZYBYLSKI, Peter , PROELSS, Julian , KLIPP, Andreas
Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general formula (I) and mixtures thereof, formula (I) wherein R1 and R3 are idependently from each other hydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl, iso-Butyl, or sec-butyl, R2 is methyl and x and y are an integer,1 (B)poly(acrylic acid) (PAA) oracrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C)water, wherein the pH of the composition is in the range of from 7.0 to 10.5.
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公开(公告)号：EP3237561B1
公开(公告)日：2019-01-23
申请号：EP15808390.7
申请日：2015-12-11
Applicant: BASF SE
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公开(公告)号：EP3169737B1
公开(公告)日：2018-10-10
申请号：EP15736840.8
申请日：2015-07-14
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , GUEVENC, Haci Osman , PRÖLSS, Julian , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza
IPC: C09G1/00
Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Colloidal or fumed inorganic particles (A) or a mixture thereof in a total amount of from 0.0001 to 2.5 wt.-% based on the total weight of the respective CMP composition (B) at least one amino acid in a total amount of from 0.2 to 1 wt.-% based on the total weight of the respective CMP composition (C) at least one corrosion inhibitor in a total amount of from 0.001 to 0.02 wt.-% based on the total weight of the respective CMP composition (D) hydrogen peroxide as oxidizing agent in a total amount of from 0.0001 to 2 wt.-% based on the total amount of the respective CMP composition (E) aqueous medium wherein the CMP composition (Q) has a pH in the range of from 6 to 9.5.
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公开(公告)号：EP3237562B1
公开(公告)日：2018-09-26
申请号：EP15820852.0
申请日：2015-12-22
Applicant: BASF SE
Inventor： REICHARDT, Robert , SIEBERT, Max , LAN, Yongqing , LAUTER, Michael , USMAN IBRAHIM, Sheik Ansar , GOLZARIAN, Reza , GUEVENC, Haci Osman , PROELSS, Julian , LEUNISSEN, Leonardus
IPC: C09G1/00
CPC classification number: C09G1/02 , B24B37/20 , C09K3/1409 , C23F3/06 , H01L21/3212 , H01L21/7684
Abstract: A chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) containing (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) contains: (A) Inorganic particles, (B) a substituted aromatic compound with at least one carboxylic acid function as corrosion inhibitor, (C) at least one amino acid, (D) at least one oxidizer, (E) an aqueous medium, wherein the CMP composition (Q) has a pH of from 7 to 10.
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