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1.发明公开PROCESS FOR REMOVING A BULK MATERIAL LAYER FROM A SUBSTRATE AND A CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS 审中-公开除去方法基板和化学机械清洗机的材料，近地层这个过程
公开(公告)号：EP2507824A4
公开(公告)日：2013-09-25
申请号：EP10832736
申请日：2010-11-25
Applicant: BASF SE
Inventor： RAMAN VIJAY IMMANUEL , EBERT SOPHIA , BRANDS MARIO , LAN YONGQING , ZACHARIAS PHILIPP , GUBAYDULLIN ILSHAT , LI YUZHUO
IPC: H01L21/321 , C09G1/02
CPC classification number: C09G1/02 , C09K3/1463 , H01L21/3212
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