公开(公告)号：EP2427523B1

公开(公告)日：2015-10-28

申请号：EP10715795.0

申请日：2010-04-19

Applicant: BASF SE

Inventor： RAMAN, Vijay Immanuel ,  GUBAYDULLIN, Ilshat ,  LI, Yuzhuo ,  BRANDS, Mario ,  LAN, Yongqing

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/321

CPC classification number: C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/3212

公开(公告)号：EP2158243B1

公开(公告)日：2010-09-22

申请号：EP08759656.5

申请日：2008-05-16

Applicant: BASF SE

Inventor： SCHÄDLER, Volker ,  RAMAN, Vijay Immanuel ,  FRICKE, Marc

IPC: C08G18/32 ,  C08G18/76 ,  C08G101/00

CPC classification number: C08G18/3212 ,  C08G12/32 ,  C08G14/10 ,  C08G18/3872 ,  C08G18/7621 ,  C08G18/8029 ,  C08G2101/0091

公开(公告)号：EP2794790A1

公开(公告)日：2014-10-29

申请号：EP11878201.0

申请日：2011-12-21

Applicant: BASF SE

Inventor： RAMAN, Vijay Immanuel ,  LI, Yuzhuo ,  SCHADE, Christian ,  VENKATARAMAN, Shyam Sundar ,  SU, Eason Yu-Shen ,  USMAN Ibrahim, Sheik Ansar ,  GAO, Ning

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/304

CPC classification number: C09G1/04 ,  C09G1/00 ,  C09G1/02 ,  C09K3/1463 ,  C09K13/00 ,  H01L21/302 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/461

Abstract: A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(=O)(OR1)(OR2) ) or phosphonic acid ( P(=O)(OH)2) moiety or their deprotonated forms as pendant groups, wherein R
1 is alkyl, aryl, alkylaryl, or arylalkyl, R
2 is H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium.

公开(公告)号：EP1960459B1

公开(公告)日：2011-02-02

申请号：EP06830236.3

申请日：2006-11-30

Applicant: BASF SE

Inventor： SCHÄDLER, Volker ,  RAMAN, Vijay Immanuel ,  DU FRESNE VON HOHENESCHE, Cedric

IPC: C08J9/28

CPC classification number: C08J9/28 ,  C08J2201/0502 ,  C08J2361/00 ,  C08J2361/28 ,  C08L61/24 ,  C08L61/28

Abstract: The invention relates to a nanoporous polymer foam with an average pore diameter ranging between 10 and 1000 nm, obtained according to a method that comprises the following steps: a) preparation of a solution of a reactive polycondensation resin in an organic solvent; b) mixing of the solution with a curing catalyst for the reactive polycondensation resin and curing of the reactive components to form a gel; and c) removal of the organic solvent. The invention also relates to the use of said foams for thermal insulation.

公开(公告)号：EP2158244B1

公开(公告)日：2010-10-13

申请号：EP08759662.3

申请日：2008-05-16

Applicant: BASF SE

Inventor： SCHÄDLER, Volker ,  FRICKE, Marc ,  WIEGMANN, Werner ,  EMGE, Andreas ,  RAMAN, Vijay Immanuel ,  SANCHEZ-FERRER, Antonio

IPC: C08G18/32 ,  C08G18/76 ,  C08G101/00

CPC classification number: C08J9/28 ,  C08G18/3243 ,  C08G18/7664 ,  C08G2101/0091 ,  C08G2330/50 ,  C08J2201/0502 ,  C08J2205/028 ,  C08J2375/02 ,  E06B3/6612 ,  E06B3/6775

公开(公告)号：EP2794790B1

公开(公告)日：2018-02-21

申请号：EP11878201.0

申请日：2011-12-21

Applicant: BASF SE

Inventor： RAMAN, Vijay Immanuel ,  LI, Yuzhuo ,  SCHADE, Christian ,  VENKATARAMAN, Shyam Sundar ,  SU, Eason Yu-Shen ,  USMAN Ibrahim, Sheik Ansar ,  GAO, Ning

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3105

CPC classification number: C09G1/04 ,  C09G1/00 ,  C09G1/02 ,  C09K3/1463 ,  C09K13/00 ,  H01L21/302 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/461

Abstract: A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(═O)(OR1)(OR2) or phosphonic acid (P(═O)(OH)2) moiety or their deprotonated forms as pendant groups, wherein R1 is alkyl, aryl, alkylaryl, or arylalkyl, R2 is H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium.

公开(公告)号：EP2776518A1

公开(公告)日：2014-09-17

申请号：EP12781111.5

申请日：2012-11-07

Applicant: BASF SE

Inventor： SEYFFER, Hermann ,  CIMPEANU, Carmen-Elena ,  SONG, Anja ,  STEINMACHER, Thomas ,  CLAUSSEN, Jörg ,  ZACHARIAS, Philipp ,  RAMAN, Vijay Immanuel ,  SCHÖCKER, Petra

IPC: C09D4/06

CPC classification number: C09D7/1216 ,  C08F20/28 ,  C09D4/06 ,  C09D7/61 ,  Y10T428/31906

Abstract: A paper coating slip additive obtainable by free-radical polymerization, its preparation and its use in paper coating compositions are described. The additive is formed from (a) acid monomers selected from ethylenically unsaturated C3 to C8 carboxylic acids, (b) associative monomers of the general formula H2C═CR1—COO-(EO)n—(PO)m—R2 where R1 is hydrogen or methyl, n is at least two, m is from zero to 50, EO is an ethylene oxide group, PO is a propylene oxide group and R2 is a C8-C30 alkyl group or a C8-C30 alkaryl group, and (c) nonionic copolymerizable monomers other than a) and b), wherein said additive has a weight average molecular weight of below 200 000 and wherein tert-dodecyl mercaptan is used as chain transfer agent.

公开(公告)号：EP2507332A1

公开(公告)日：2012-10-10

申请号：EP10832737.0

申请日：2010-11-25

Applicant: BASF SE

Inventor： RAMAN, Vijay Immanuel ,  LI, Yuzhuo ,  BRANDS, Mario ,  LAN, Yongqing ,  RUSHING, Kenneth ,  RAMJI, Karpagavalli

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  H01L21/3105 ,  H01L21/306

CPC classification number: H01L21/3212 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463

Abstract: An aqueous chemical mechanical polishing (CMP) agent (A) comprising solid particles (a1) containing (a11) a corrosion inhibitor for metals, and (a12) a solid material, the said solid particles (a1) being finely dispersed in the aqueous phase; and its use in a process for removing a bulk material layer from the surface of a substrate and planarizing the exposed surface by chemical mechanical polishing until all material residuals are removed from the exposed surface, wherein the CMP agent exhibits at the end of the chemical mechanical polishing, without the addition of supplementary materials, － the same or essentially the same static etch rate (SER) as at its start and a lower material removal rate (MRR) than at its start, － a lower SER than at its start and the same or essentially the same MRR as at its start or － a lower SER and a lower MRR than at its start; such that the CMP agent exhibits a soft landing behavior.

Abstract translation: 在wässrige化学机械抛光（CMP）剂（a）包含固体颗粒（a1）的含（A11）腐蚀抑制剂对金属，和（A12）的固体材料，所述固体粒子（A1）被精细地分散在wässrige相 ; 及其在一个过程中使用用于在化学机械的端部从基板的表面除去松散材料层，直到所有材料残差从暴露表面去除平坦化通过化学机械抛光的暴露表面，worin CMP试剂展品 抛光，不加入辅助材料，-the相同或本质上相同静态蚀刻速率（SER），其在它的开始和下材料去除速率（MRR）比在其开始，-A下SER比在其开始和 基本上相同或在其开始或-低级SER和比在其开始较低MRR相同MRR; 检查做了CMP试剂表现出软着陆的行为。

公开(公告)号：EP2158243A1

公开(公告)日：2010-03-03

申请号：EP08759656.5

申请日：2008-05-16

Applicant: BASF SE

Inventor： SCHÄDLER, Volker ,  RAMAN, Vijay Immanuel ,  FRICKE, Marc

IPC: C08G18/32 ,  C08G18/76 ,  C08G101/00

CPC classification number: C08G18/3212 ,  C08G12/32 ,  C08G14/10 ,  C08G18/3872 ,  C08G18/7621 ,  C08G18/8029 ,  C08G2101/0091

Abstract: The invention relates to a method for production of organic xerogels comprising: (a) preparation of a composition containing an organic gel precursor (A) and a solvent (C), (b) reaction of the gel precursor (A) in the presence of the solvent (C) to give a gel, (c) modifying the obtained gel by means of at least one organic compound (D), which is not added in step (a) nor in step (b), (d) drying the modified gel by transforming the solvent (C) into the gaseous phase at a temperature and a pressure below the critical temperature and critical pressure of the solvent (C). The invention further relates to the organic xerogels thus obtained and the use thereof as insulation.

Abstract translation: 本发明涉及一种制备有机干凝胶的方法，其包括：（a）制备含有有机凝胶前体（A）和溶剂（C）的组合物，（b）在有 （c）以得到凝胶，（c）借助至少一种在步骤（a）中和步骤（b）中未添加的有机化合物（D）对所获得的凝胶进行改性，（d）将 通过在低于溶剂（C）的临界温度和临界压力的温度和压力下将溶剂（C）转化成气相来改性凝胶。 本发明还涉及由此获得的有机干凝胶及其作为绝缘材料的用途。

公开(公告)号：EP1960459A1

公开(公告)日：2008-08-27

申请号：EP06830236.3

申请日：2006-11-30

Applicant: BASF SE

Inventor： SCHÄDLER, Volker ,  RAMAN, Vijay Immanuel ,  DU FRESNE VON HOHENESCHE, Cedric

IPC: C08J9/28

CPC classification number: C08J9/28 ,  C08J2201/0502 ,  C08J2361/00 ,  C08J2361/28 ,  C08L61/24 ,  C08L61/28

Abstract: The invention relates to a nanoporous polymer foam with an average pore diameter ranging between 10 and 1000 nm, obtained according to a method that comprises the following steps: a) preparation of a solution of a reactive polycondensation resin in an organic solvent; b) mixing of the solution with a curing catalyst for the reactive polycondensation resin and curing of the reactive components to form a gel; and c) removal of the organic solvent. The invention also relates to the use of said foams for thermal insulation.