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1.发明公开DEVELOPER-SOLUBLE METAL ALKOXIDE COATINGS FOR MICROELECTRONIC APPLICATIONS 有权开发商可拆卸METALLALKOXIDBESCHICHTUNGEN微型电子应用
公开(公告)号：EP1516226A1
公开(公告)日：2005-03-23
申请号：EP03739224.8
申请日：2003-06-18
申请人： Brewer Science, Inc.
CPC分类号： C08G79/10 , C08G79/00 , C08L85/00 , G03F7/091 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/151
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula (I), where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
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2.发明公开BOTTOM ANTI-REFLECTIVE COATINGS DERIVED FROM SMALL CORE MOLECULES WITH MULTIPLE EPOXY MOIETIES 审中-公开衍生自具有多个环氧基的小核心分子的底部抗反射涂层
公开(公告)号：EP1573785A3
公开(公告)日：2005-09-21
申请号：EP03774743.3
申请日：2003-10-07
申请人： Brewer Science, Inc.
IPC分类号： H01L21/00
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3.发明公开BOTTOM ANTI-REFLECTIVE COATINGS DERIVED FROM SMALL CORE MOLECULES WITH MULTIPLE EPOXY MOIETIES 有权土反REFLEX涂料为主的小分子具有多个环氧UNITS
公开(公告)号：EP1573785A2
公开(公告)日：2005-09-14
申请号：EP03774743.3
申请日：2003-10-07
申请人： Brewer Science, Inc.
IPC分类号： H01L21/00
CPC分类号： G03F7/091 , C09B69/00 , Y10S430/111 , Y10T428/31511 , Y10T428/31515
摘要： Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.
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公开(公告)号：EP1546803B1
公开(公告)日：2014-07-23
申请号：EP03761298.3
申请日：2003-06-24
申请人： Brewer Science, Inc.
CPC分类号： C08G79/00 , C08L85/00 , G02B1/111 , Y10S430/106 , C08L2666/02
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5.发明公开SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYMER BINDERS FOR ANTI-REFLECTIVE COATINGS 有权ANTI REFLEX涂层尼龙ACIDS /酰亚胺ALS NASSENTWICKELBARE聚合物粘合剂的，含
公开(公告)号：EP1540420A2
公开(公告)日：2005-06-15
申请号：EP03761169.6
申请日：2003-06-18
申请人： Brewer Science, Inc.
CPC分类号： C09D179/08 , C08G73/10 , C08G73/1025 , C08G73/1039 , C08G73/1064 , G02B1/111 , G03F7/038 , G03F7/091 , Y10S430/106 , Y10S430/151
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring monomers having the formulas (1) and (2) where: (1) each R is individually selected from the group consisting of hydrogen, -OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of -SO2- and -CR'2-, where each R' is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and -CX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
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6.发明授权BOTTOM ANTI-REFLECTIVE COATINGS DERIVED FROM SMALL CORE MOLECULES WITH MULTIPLE EPOXY MOIETIES 有权土反REFLEX涂料为主的小分子具有多个环氧UNITS
公开(公告)号：EP1573785B1
公开(公告)日：2013-02-13
申请号：EP03774743.3
申请日：2003-10-07
申请人： Brewer Science, Inc.
CPC分类号： G03F7/091 , C09B69/00 , Y10S430/111 , Y10T428/31511 , Y10T428/31515
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公开(公告)号：EP1546803A2
公开(公告)日：2005-06-29
申请号：EP03761298.3
申请日：2003-06-24
申请人： Brewer Science, Inc.
CPC分类号： C08G79/00 , C08L85/00 , G02B1/111 , Y10S430/106 , C08L2666/02
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of Formula (I) and (II), where each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
摘要翻译： 提供了抗反射组合物和使用这些组合物形成电路的方法。 该组合物包含溶解或分散在溶剂体系中的聚合物。 在优选的实施方案中，聚合物包括具有选自式（I）和（II）的结构的光衰减部分，其中X 1和Y各自独立地选自吸电子基团; R2选自烷基和芳基; 并且R3选自氢和烷基。 所得组合物与旋转筒相容（即，它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联），湿润可显影并且具有优异的光学性质。
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8.发明授权DEVELOPER-SOLUBLE METAL ALKOXIDE COATINGS FOR MICROELECTRONIC APPLICATIONS 有权开发商可拆卸METALLALKOXIDBESCHICHTUNGEN微型电子应用
公开(公告)号：EP1516226B1
公开(公告)日：2016-03-16
申请号：EP03739224.8
申请日：2003-06-18
申请人： Brewer Science, Inc.
CPC分类号： C08G79/10 , C08G79/00 , C08L85/00 , G03F7/091 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/151
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9.发明授权ANTI-REFLECTIVE COATINGS COMPRISING POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYMER BINDERS 有权ANTI REFLEX涂层尼龙ACIDS /酰亚胺ALS NASSENTWICKELBARE聚合物粘合剂的，含
公开(公告)号：EP1540420B1
公开(公告)日：2013-09-04
申请号：EP03761169.6
申请日：2003-06-18
申请人： Brewer Science, Inc.
CPC分类号： C09D179/08 , C08G73/10 , C08G73/1025 , C08G73/1039 , C08G73/1064 , G02B1/111 , G03F7/038 , G03F7/091 , Y10S430/106 , Y10S430/151
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公开(公告)号：EP2174189A2
公开(公告)日：2010-04-14
申请号：EP08796726.1
申请日：2008-07-28
申请人： Brewer Science, Inc.
IPC分类号： G03F7/11 , G03F7/16 , C08F212/04 , C08F236/06 , C08F220/10
CPC分类号： G03F7/091 , C08F212/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/34 , C08F220/56 , C08F226/06 , G03F7/11 , Y10T428/31678 , Y10T428/31855 , Y10T428/31935
摘要： This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalcntly crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
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