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1.发明公开Projection optical system, exposure apparatus and device fabricating method 有权Optisches Projektionssystem，Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1513019A2
公开(公告)日：2005-03-09
申请号：EP04020761.5
申请日：2004-09-01
发明人： Sasaki, Takahiro
IPC分类号： G03F7/20
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275
摘要： There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces.
摘要翻译： 提供了一种用于将物体表面上的图案以减小的尺寸投影到图像表面上的投影光学系统。 投影光学系统包括六个反射表面，其以从物体表面反射光的顺序包括第一反射表面，第二凸反射表面，第三凸反射表面，第四反射表面，第五反射表面和第六反射表面 反射表面和沿着第一和第二反射表面之间的光路的孔径光阑。
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2.发明公开Projection optical system, exposure apparatus and device fabricating method 有权用于制造装置的投影光学系统，曝光装置及方法
公开(公告)号：EP1513019A3
公开(公告)日：2007-07-18
申请号：EP04020761.5
申请日：2004-09-01
发明人： Sasaki, Takahiro
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275
摘要： There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces.
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公开(公告)号：EP1471389A3
公开(公告)日：2006-06-07
申请号：EP04252392.8
申请日：2004-04-23
发明人： Sasaki, Takahiro , Suzuki, Masayuki
IPC分类号： G03F7/20 , G02B17/06 , H01L21/027
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： Disclosed is a projection optical system (100) for projecting a pattern of a mask placed on an object plane (MS), onto a substrate placed on an image plane (W). The projection optical system is arranged so that an intermediate image (MI) of the pattern formed on the mask, is formed between a third reflection surface (M3) and a fourth reflection surface (M4). In accordance with a particular shape of the third reflection surface or with particular disposition, high-precision projection is ensured without enlargement in size of the whole system.
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公开(公告)号：EP1471389A2
公开(公告)日：2004-10-27
申请号：EP04252392.8
申请日：2004-04-23
发明人： Sasaki, Takahiro , Suzuki, Masayuki
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： Disclosed is a projection optical system (100) for projecting a pattern of a mask placed on an object plane (MS), onto a substrate placed on an image plane (W). The projection optical system is arranged so that an intermediate image (MI) of the pattern formed on the mask, is formed between a third reflection surface (M3) and a fourth reflection surface (M4). In accordance with a particular shape of the third reflection surface or with particular disposition, high-precision projection is ensured without enlargement in size of the whole system.
摘要翻译： 公开了一种用于将放置在物平面（MS）上的掩模的图案投影到放置在图像平面（W）上的基板上的投影光学系统（100）。 投影光学系统被布置为使得在第三反射表面（M3）和第四反射表面（M4）之间形成在掩模上形成的图案的中间图像（MI）。 根据第三反射面的特定形状或特定布置，确保高精度投影而不会使整个系统的尺寸增大。
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公开(公告)号：EP1418468A3
公开(公告)日：2004-08-04
申请号：EP03025300.9
申请日：2003-11-06
CPC分类号： G03F7/70233 , G02B17/0657
摘要： A catoptric projection optical system for projecting a reduced size of a pattern on an object plane onto an image plane includes first, second, third and fourth mirrors from the image plane along an optical path, wherein the third and fourth mirrors are located between the first mirror and second mirror.
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6.发明授权Projection optical system, exposure apparatus and device fabricating method 有权用于制造装置的投影光学系统，曝光装置及方法
公开(公告)号：EP1513019B1
公开(公告)日：2012-07-25
申请号：EP04020761.5
申请日：2004-09-01
发明人： Sasaki, Takahiro
CPC分类号： G02B17/0657 , G03F7/70233 , G03F7/70275
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公开(公告)号：EP1471389B1
公开(公告)日：2008-07-09
申请号：EP04252392.8
申请日：2004-04-23
发明人： Sasaki, Takahiro , Suzuki, Masayuki
IPC分类号： G03F7/20 , G02B17/06 , H01L21/027
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
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公开(公告)号：EP1450209A1
公开(公告)日：2004-08-25
申请号：EP04250866.3
申请日：2004-02-18
CPC分类号： G03F7/70233 , G02B17/0657
摘要： A catoptric projection optical system for projecting a pattern on an object surface onto an image surface includes plural mirrors, wherein a second mirror from the image surface through the optical path receives convergent pencil of rays, and has a paraxial magnification of -0.14 or smaller.
摘要翻译： 用于将物体表面上的图案投影到图像表面上的反射投影光学系统包括多个反射镜，其中来自图像表面的通过光路的第二反射镜接收会聚的光线，并且具有-0.14或更小的近轴倍率。
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9.发明公开Projection optical system and exposure apparatus 审中-公开Optisches Projektionssystem und Belichtungsapparat
公开(公告)号：EP1418468A2
公开(公告)日：2004-05-12
申请号：EP03025300.9
申请日：2003-11-06
CPC分类号： G03F7/70233 , G02B17/0657
摘要： A catoptric projection optical system for projecting a reduced size of a pattern on an object plane onto an image plane includes first, second, third and fourth mirrors from the image plane along an optical path, wherein the third and fourth mirrors are located between the first mirror and second mirror.
摘要翻译： 用于将物体平面上的图案的尺寸减小到图像平面上的反射投影光学系统包括沿着光路从图像平面的第一，第二，第三和第四反射镜，其中第三和第四反射镜位于第一 镜子和第二个镜子。
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10.发明公开Catoptric projection optical system and exposure apparatus 审中-公开Katoptrisches Projektionssystem und Belichtungsvorrichtung
公开(公告)号：EP1450196A1
公开(公告)日：2004-08-25
申请号：EP04250867.1
申请日：2004-02-18
CPC分类号： G03F7/70233 , G02B17/0657 , G03F7/70275
摘要： A catoptric projection optical system that projects a reduced size of a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image between the object surface and image surface, and includes six or more mirrors, wherein a position of an exit pupil with respect to the intermediate image is located between the object surface and image surface, and wherein the largest angle between principal rays and an optical axis for angles of view at the position of the exit pupil is sin -1 NA or smaller, where NA is a numerical aperture at the side of the image surface.
摘要翻译： 一种投影光学系统，其将物体表面上的图案的尺寸减小到图像表面上，并且用作在物体表面和图像表面之间形成中间图像的成像系统，并且包括六个或更多个反射镜，其中 出射光瞳相对于中间图像的位置位于物体表面和图像表面之间，并且其中主光线和出射光瞳位置处的视角的光轴之间的最大角度为sin < NA或更小，其中NA是图像表面侧面的数值孔径。
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