公开(公告)号：EP1137606A4

公开(公告)日：2004-03-24

申请号：EP99937275

申请日：1999-07-16

Applicant: CORNING INC

Inventor： HARES GEORGE B ,  KOHLI JEFFREY T ,  WEBB JAMES E

IPC: C03C3/078 ,  C03C3/085 ,  C03C3/087 ,  C03C3/091 ,  C03C3/093 ,  C03C4/00 ,  C03C3/089

CPC classification number: C03C3/078 ,  C03C4/0028

Abstract: This invention relates to lead-free silicate glasses that find use in producing fine crystal glassware and in laminated ware applications. The glasses consist essentially, in weight percent, of: SiO2 52-66; Al2O3 0-4; Li2O 0-4; Na2O 3-16; K2O 0-12; ZnO 15-30; BaO 0-7; MgO+CaO+SrO 0-4; ZrO2 0-4; B2O3 0-4.

公开(公告)号：EP1910874A4

公开(公告)日：2009-08-05

申请号：EP06787798

申请日：2006-07-19

Applicant: CORNING INC

Inventor： WEBB JAMES E

IPC: G02B5/30 ,  G02B13/14 ,  G02B13/22 ,  G02B27/28

CPC classification number: G03F7/70966 ,  G02B5/3083 ,  G02B13/143 ,  G02B13/22 ,  G02B27/283

Abstract: Axisymmetric birefringent materials are incorporated into a deep UV imaging system by exploiting axial symmetries. A polar orthogonal polarization pattern is relayed conjugate to a pupil of a telecentric imaging system to avoid birefringence of axisymmetric birefringent optics located in telecentric object or image space.

公开(公告)号：EP1417530A4

公开(公告)日：2008-10-08

申请号：EP02750066

申请日：2002-07-16

Applicant: CORNING INC

Inventor： ALLAN DOUGLAS C ,  WEBB JAMES E ,  BRUNING JOHN H

IPC: G01L1/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G02F1/01 ,  G03F7/20 ,  H01L21/027 ,  G02B27/14 ,  G01J4/00 ,  G01R33/02 ,  G02F1/07 ,  G02F1/1333 ,  H01J40/14

CPC classification number: G02B17/0892 ,  G01L1/241 ,  G02B1/02 ,  G02B5/3091 ,  G02B17/0808 ,  G02B17/086 ,  G02F1/0131 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

Abstract: Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures (12) in deep ultraviolet (less than 200 nm) microlithographic imaging systems (10). Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.