公开(公告)号：EP1095315A1

公开(公告)日：2001-05-02

申请号：EP99929261.8

申请日：1999-06-17

申请人： Carl Zeiss ,  CARL ZEISS-STIFTUNG HANDELND ALS CARL ZEISS

发明人： GERHARD, Michael ,  ZEHETBAUER, Marcus ,  DIECKMANN, Nils ,  SCHRIEVER, Martin ,  SIELER, Christine ,  REISINGER, Gerd

IPC分类号： G03F7/20 ,  B08B7/00

CPC分类号： G03F7/70883 ,  B08B7/0057 ,  G03F7/7005 ,  G03F7/70925

摘要： The invention relates to a method for decontaminating microlithography projection lighting devices with optical elements (2) or parts thereof, especially the surfaces of optical elements, wherein a UV-light and a fluid are used. A second UV-light source (5) is directed towards at least one part of the optical element (2) during exposure pauses for decontamination.

公开(公告)号：EP1828845A2

公开(公告)日：2007-09-05

申请号：EP05815264.6

申请日：2005-12-01

申请人： Carl Zeiss SMT AG

发明人： KUSS, Matthias ,  FIOLKA, Damian ,  REISINGER, Gerd ,  MAUL, Manfred ,  DAVYDENKO, Vladimir

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70583

摘要： A beam delivery system (21) of a projection exposure system (1) comprises a laser (23) generating a beam (25) of laser light from a comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm

公开(公告)号：EP2188673A1

公开(公告)日：2010-05-26

申请号：EP08784878.4

申请日：2008-07-18

申请人： Carl Zeiss SMT AG

发明人： LÖRING, Ulrich ,  REISINGER, Gerd ,  STICKEL, Franz-Josef ,  SCHNEIDER, Sonja ,  TRENKLER, Johann ,  KRAUS, Stefan ,  DÖRING, Gordon ,  GÖHNERMEIER, Aksel

IPC分类号： G03F7/20 ,  G03F1/14

CPC分类号： G03F7/70983 ,  G03F1/62 ,  G03F7/70308 ,  Y10T428/24612

摘要： A projection objective comprising a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ includes an optical correction plate. The optical correction plate has a body made from a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surface, and a thickness profile. The first surface profile and the second surface profile are similar in that the first optical surface has a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ; the second optical surface has a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ; and the plate thickness varies by less than 0.1 * (PV1+PV2V2 across the optica! correction piate. The first and second optical surface in combination may induce or correct for a dominant field aberration if the optical correction plate is installed at a position far from the object plane of the projection objective.