公开(公告)号：EP1483616A1

公开(公告)日：2004-12-08

申请号：EP02779537.6

申请日：2002-11-07

申请人： Carl Zeiss SMT AG

发明人： FIOLKA, Damian ,  DITTMAN, Olaf ,  TOTZECK, Michael ,  DIECKMANN, Nils ,  KÖHLER, Jess ,  GRUNER, Toralf ,  KRÄHMER, Daniel

IPC分类号： G02B27/28 ,  G02B5/30 ,  G02B13/14 ,  G03F7/20

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/286 ,  G02B27/288 ,  G03F7/70075 ,  G03F7/70191 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70966

摘要： Optical system (1) : with a first optical subsystem (3) comprising at least a first birefringent optical element (7), with a second optical subsystem (5) comprising at least a second birefringent optical element (9), wherein between the first optical subsystem and the second optical subsystem an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a ratardation of one-half of a wavelength between two mutually orthogonal states of polarization.

公开(公告)号：EP1668421A2

公开(公告)日：2006-06-14

申请号：EP04765110.4

申请日：2004-09-13

申请人： Carl Zeiss SMT AG

发明人： KÖHLER, Jess ,  WANGLER, Johannes ,  BROTSACK, Markus ,  SINGER, Wolfgang ,  FIOLKA, Damian ,  MAUL, Manfred

IPC分类号： G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.