公开(公告)号：EP2467756A1

公开(公告)日：2012-06-27

申请号：EP10732968.2

申请日：2010-07-14

申请人： Carl Zeiss SMT GmbH

发明人： CLAUSS, Wilfried ,  WEISER, Martin

IPC分类号： G03F7/20 ,  G02B1/12

CPC分类号： G03F7/70958 ,  G02B1/12 ,  G02B5/0891

摘要： The present invention relates to mirrors that comprise a reflecting coating for the EUV wavelength region and a substrate, a surface region of the substrate extending uniformly below the reflecting coating along this coating and, seen from the surface of the substrate, has a depth of down to 5 μm. Here, this surface region has a 2% higher density than the remaining substrate. Moreover, the invention relates to substrates that likewise have such surface regions. The invention further relates to methods for producing such mirrors and substrates having such surface regions by irradiation by means of ions or electrons.

公开(公告)号：EP2764407A1

公开(公告)日：2014-08-13

申请号：EP12756669.3

申请日：2012-08-14

申请人： Carl Zeiss SMT GmbH

发明人： WEISS, Markus ,  KERWIEN, Norbert ,  WEISER, Martin ,  BITTNER, Boris ,  WABRA, Norbert ,  SCHLICHENMAIER, Christoph ,  CLAUSS, Wilfried

IPC分类号： G03F1/60 ,  G03F1/00 ,  G21K1/06 ,  G06F1/24 ,  G03F1/72 ,  G03F7/20

CPC分类号： G02B5/0891 ,  B29D11/00009 ,  B29D11/00865 ,  B82Y10/00 ,  G02B13/143 ,  G03F1/24 ,  G03F1/60 ,  G03F1/72 ,  G03F7/70316 ,  G03F7/70591 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： The invention relates to a reflective optical element 39 for the EUV wavelength range comprising a layer arrangement applied on the surface of a substrate, wherein the layer arrangement comprises at least one layer subsystem 37 consisting of a periodic sequence of at least one period of individual layers, wherein the period comprises two individual layers having different refractive indices in the EUV wavelength range, wherein the substrate has a variation of the density of more than 1% by volume at least along an imaginary surface 30 at a fixed distance of between 0 μm and 100 μm from the surface, and wherein the substrate is protected against long-term ageing or densification by EUV radiation either by means of a protective layer or by means of a protective layer subsystem of the layer arrangement or by means of a correspondingly densified surface region 35 of the substrate. Furthermore, the invention relates to a method for producing such a reflective optical element. Furthermore, the invention relates to a method for correcting such a reflective optical element, and to a projection lens comprising such an optical element, and to a projection exposure apparatus comprising such a projection lens.

公开(公告)号：EP2513685B1

公开(公告)日：2018-02-28

申请号：EP10778991.9

申请日：2010-11-08

申请人： Carl Zeiss SMT GmbH

发明人： MUELLENDER, Stephan ,  WEBER, Joern ,  CLAUSS, Wilfried ,  PAUL, Hans-Jochen ,  BRAUN, Gerhard ,  MIGURA, Sascha ,  DODOC, Aurelian ,  ZACZEK, Christoph ,  BLANCKENHAGEN, Gisela von ,  LOERCHER, Roland

IPC分类号： G02B5/08 ,  G03F7/20 ,  G02B1/10 ,  G02B1/14

CPC分类号： G02B5/0891 ,  B82Y30/00 ,  G02B1/10 ,  G02B1/105 ,  G02B1/14 ,  G02B5/0816 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958

摘要： A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating materials (41, 42) having different real parts of the refractive index at the working wavelength on a substrate (2), which exerts a layer stress on the substrate (2), and comprising a second multilayer system (6) of at least two alternating materials (61, 62) on a substrate (2), which exerts an opposed layer stress on the substrate (2) and is arranged between the first multilayer system (4) and the substrate (2), wherein a first (61) of the at least two materials of the second multilayer system (6) is interrupted by layers (62) having a thickness of up to 1 nm of the at least one further material of the second multilayer system (6) at such distances that the first material is present in an amorphous state.

公开(公告)号：EP2513685A1

公开(公告)日：2012-10-24

申请号：EP10778991.9

申请日：2010-11-08

申请人： Carl Zeiss SMT GmbH

发明人： MUELLENDER, Stephan ,  WEBER, Joern ,  CLAUSS, Wilfried ,  PAUL, Hans-Jochen ,  BRAUN, Gerhard ,  MIGURA, Sascha ,  DODOC, Aurelian ,  ZACZEK, Christoph ,  BLANCKENHAGEN, Gisela von ,  LOERCHER, Roland

IPC分类号： G02B5/08 ,  G03F7/20

CPC分类号： G02B5/0891 ,  B82Y30/00 ,  G02B1/10 ,  G02B1/105 ,  G02B1/14 ,  G02B5/0816 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958

摘要： A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating materials (41, 42) having different real parts of the refractive index at the working wavelength on a substrate (2), which exerts a layer stress on the substrate (2), and comprising a second multilayer system (6) of at least two alternating materials (61, 62) on a substrate (2), which exerts an opposed layer stress on the substrate (2) and is arranged between the first multilayer system (4) and the substrate (2), wherein a first (61) of the at least two materials of the second multilayer system (6) is interrupted by layers (62) having a thickness of up to 1 nm of the at least one further material of the second multilayer system (6) at such distances that the first material is present in an amorphous state.

摘要翻译： 在软X射线和极紫外波长范围内的工作波长的应力降低反射光学元件包括具有折射率不同的实部在第一多层系统（4）中的至少两种交替材料（41，42） 上的基板（2）的工作波长，其中在基板（2）上施加层应力，并且包括第二多层系统（6）的至少两种交替材料（61，62）上的基板（2），其中 施加在对置层的应力在基板（2）和在所述第一多层系统（4）和所述基板（2）之间布置，第一所述第二多层系统的至少两种材料的（61）worin（6）是 通过具有厚度的所述第二多层系统的所述至少一种其他材料的至多1nm的层（62），在检测距离（6）中断所做的第一材料存在于在无定形状态。