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1.发明公开SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PRODUCING THEM 审中-公开基材和EUV光刻的微小反射镜及其制造方法
公开(公告)号：EP2467756A1
公开(公告)日：2012-06-27
申请号：EP10732968.2
申请日：2010-07-14
申请人： Carl Zeiss SMT GmbH
发明人： CLAUSS, Wilfried , WEISER, Martin
CPC分类号： G03F7/70958 , G02B1/12 , G02B5/0891
摘要： The present invention relates to mirrors that comprise a reflecting coating for the EUV wavelength region and a substrate, a surface region of the substrate extending uniformly below the reflecting coating along this coating and, seen from the surface of the substrate, has a depth of down to 5 μm. Here, this surface region has a 2% higher density than the remaining substrate. Moreover, the invention relates to substrates that likewise have such surface regions. The invention further relates to methods for producing such mirrors and substrates having such surface regions by irradiation by means of ions or electrons.
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公开(公告)号：EP3286595B1
公开(公告)日：2019-06-26
申请号：EP16712251.4
申请日：2016-03-10
申请人： Carl Zeiss SMT GmbH
发明人： BANYAY, Matus , WEISER, Martin , BITTNER, Boris
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3.发明公开REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELENGTH RANGE, METHOD FOR PRODUCING AND FOR CORRECTING SUCH AN ELEMENT, PROJECTION LENS FOR MICROLITHOGRAPHY COMPRISING SUCH AN ELEMENT, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION LENS 审中-公开用于生产这样的元素的校正，投影透镜，用于与这样的元件和投射曝光APPARATUS FOR MICRO LITHOGRAPHY MICRO LITHOGRAPHY与这样的投影透镜FOR EUV波长范围的反射光学元件，AND METHOD
公开(公告)号：EP2764407A1
公开(公告)日：2014-08-13
申请号：EP12756669.3
申请日：2012-08-14
申请人： Carl Zeiss SMT GmbH
发明人： WEISS, Markus , KERWIEN, Norbert , WEISER, Martin , BITTNER, Boris , WABRA, Norbert , SCHLICHENMAIER, Christoph , CLAUSS, Wilfried
CPC分类号： G02B5/0891 , B29D11/00009 , B29D11/00865 , B82Y10/00 , G02B13/143 , G03F1/24 , G03F1/60 , G03F1/72 , G03F7/70316 , G03F7/70591 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： The invention relates to a reflective optical element 39 for the EUV wavelength range comprising a layer arrangement applied on the surface of a substrate, wherein the layer arrangement comprises at least one layer subsystem 37 consisting of a periodic sequence of at least one period of individual layers, wherein the period comprises two individual layers having different refractive indices in the EUV wavelength range, wherein the substrate has a variation of the density of more than 1% by volume at least along an imaginary surface 30 at a fixed distance of between 0 μm and 100 μm from the surface, and wherein the substrate is protected against long-term ageing or densification by EUV radiation either by means of a protective layer or by means of a protective layer subsystem of the layer arrangement or by means of a correspondingly densified surface region 35 of the substrate. Furthermore, the invention relates to a method for producing such a reflective optical element. Furthermore, the invention relates to a method for correcting such a reflective optical element, and to a projection lens comprising such an optical element, and to a projection exposure apparatus comprising such a projection lens.
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