公开(公告)号：EP1828431B1

公开(公告)日：2020-08-05

申请号：EP05850603.1

申请日：2005-12-23

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives ,  Centre National de la Recherche Scientifique ,  UNIVERSITE DE POITIERS

发明人： THOLLON, Stéphanie ,  LUC, Fabien ,  BARRAULT, Joël ,  VALANGE, Sabine ,  GUELOU, Erwan ,  DATURI, Marco ,  CAN, Fabien

IPC分类号： C23C16/18 ,  C23C16/40

公开(公告)号：EP1828431A2

公开(公告)日：2007-09-05

申请号：EP05850603.1

申请日：2005-12-23

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ,  Centre National de la Recherche Scientifique ,  UNIVERSITE DE POITIERS

发明人： THOLLON, Stéphanie ,  LUC, Fabien, Résidence Les Charmettes ,  BARRAULT, Joël ,  VALANGE, Sabine ,  GUELOU, Erwan, Résidence Anthinéa III ,  DATURI, Marco ,  CAN, Fabien

IPC分类号： C23C16/18 ,  C23C16/40

摘要： The invention concerns a method for depositing nanoparticles of a metal or of an alloy of said metal, the metal being selected among the metals of columns VIIIB and IB of the periodic table, dispersed on a substrate, by chemical vapour deposition (CVD), from one or more precursors, wherein the deposition is carried out in the presence of a gas comprising over 50 vol. % of an oxidizing reactive gas. The invention also concerns a substrate comprising at least one surface whereon are dispersed nanoparticles of metal or metal alloy, for example, of silver or a silver alloy. The invention further concerns the use of the substrate for catalyzing a chemical reaction, for example a reaction for eliminating NOx.

公开(公告)号：EP2350341B1

公开(公告)日：2012-08-08

申请号：EP09740169.9

申请日：2009-09-10

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： FILHOL, Lionel ,  THOLLON, Stéphanie ,  DONNET ,Sébastien

IPC分类号： C23C16/442 ,  B01J37/02 ,  C23C16/455

CPC分类号： C23C16/442 ,  B01J23/42 ,  B01J35/006 ,  B01J37/0221 ,  B01J37/0238 ,  B22F2998/00 ,  C01B3/0026 ,  C23C16/4417 ,  C23C16/45502 ,  C23C16/45591 ,  Y02E60/327 ,  Y10S118/05 ,  B22F9/24 ,  B22F1/0018

摘要： The present invention proposes a device for the vapour-phase deposition of chemical species onto support grains of spherical or similar shapes placed in a fluidized bed, comprising: • a first fluidized-bed chamber (1), housed in which is a fluidization component (8), formed into a funnel, to receive support grains (2) of spherical or similar shapes, • a second chamber (3) in fluid connection with the first chamber (1), intended both to provide precursors, in vapour phase, of the chemical species to be deposited on the support grains (2) and to transport a fluidizing gas in the direction of the first chamber (1), • a flute (9), positioned at the inlet of the fluidization component (8), in order to control the distribution of the vapour-phase precursors and of the fluidizing gas within the fluidization component (8), characterized in that the distribution flute (9) comprises one or more external grooves or recesses (92), the or each groove (92) comprising a first portion oriented along the longitudinal axis of the flute (9) and a second portion that winds helically around this axis in order to generate a fluidizing gas vortex within the first chamber (1).

公开(公告)号：EP2155923B1

公开(公告)日：2018-04-25

申请号：EP08736616.7

申请日：2008-04-29

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： RUIZ, Jean-Christophe ,  FOURNEL, Bruno ,  THOLLON, Stéphanie ,  DONET, Sébastien

IPC分类号： C23C16/06 ,  C23C18/12 ,  C30B7/10 ,  C30B25/00 ,  C30B29/60

CPC分类号： C23C16/06 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1245 ,  C23C18/1287 ,  C23C18/1295

公开(公告)号：EP2350341A1

公开(公告)日：2011-08-03

申请号：EP09740169.9

申请日：2009-09-10

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： FILHOL, Lionel ,  THOLLON, Stéphanie ,  DONNET ,Sébastien

IPC分类号： C23C16/442 ,  B01J37/02 ,  C23C16/455

CPC分类号： C23C16/442 ,  B01J23/42 ,  B01J35/006 ,  B01J37/0221 ,  B01J37/0238 ,  B22F2998/00 ,  C01B3/0026 ,  C23C16/4417 ,  C23C16/45502 ,  C23C16/45591 ,  Y02E60/327 ,  Y10S118/05 ,  B22F9/24 ,  B22F1/0018

摘要： The present invention proposes a device for the vapour-phase deposition of chemical species onto support grains of spherical or similar shapes placed in a fluidized bed, comprising: • a first fluidized-bed chamber (1), housed in which is a fluidization component (8), formed into a funnel, to receive support grains (2) of spherical or similar shapes, • a second chamber (3) in fluid connection with the first chamber (1), intended both to provide precursors, in vapour phase, of the chemical species to be deposited on the support grains (2) and to transport a fluidizing gas in the direction of the first chamber (1), • a flute (9), positioned at the inlet of the fluidization component (8), in order to control the distribution of the vapour-phase precursors and of the fluidizing gas within the fluidization component (8), characterized in that the distribution flute (9) comprises one or more external grooves or recesses (92), the or each groove (92) comprising a first portion oriented along the longitudinal axis of the flute (9) and a second portion that winds helically around this axis in order to generate a fluidizing gas vortex within the first chamber (1).

公开(公告)号：EP1636399B1

公开(公告)日：2011-03-02

申请号：EP04767349.6

申请日：2004-06-15

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： PLISSONNIER, Marc ,  GAILLARD, Frédéric ,  THOLLON, Stéphanie

IPC分类号： C23C16/26 ,  C23C16/02 ,  C23C16/32 ,  C23C16/50

CPC分类号： C23C16/0272 ,  C23C16/26 ,  Y10T428/30

摘要： The invention relates to a coating (1) for a mechanical part. The inventive coating comprises: a first layer (3) of hydrogenated amorphous silicon carbide, which is intended to come into contact with the mechanical part (2); a stack (4) of layers; and an outer layer (5) of hydrogenated amorphous carbon. The aforementioned stack (4) comprises alternating layers (4a, 4b) of hydrogenated amorphous carbon and hydrogenated amorphous silicon carbide respectively. The total thickness of the coating is preferably between 10 and 20 micrometers.

公开(公告)号：EP2176445B1

公开(公告)日：2010-12-01

申请号：EP08775285.3

申请日：2008-07-22

申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives

发明人： DONET, Sébastien ,  EMIEUX, Fabrice ,  FILHOL, Lionel ,  THOLLON, Stéphanie

IPC分类号： C23C16/458 ,  C23C16/04

CPC分类号： C23C16/045 ,  C23C16/458

摘要： The invention relates to a method and a device for the infiltration of a structure made of a porous material by chemical vapour deposition. According to the method, a first face of the porous material structure is exposed to a gaseous flow, and the second face is maintained at least partially free from any contact.

摘要翻译： 本发明涉及通过化学气相沉积渗透由多孔材料制成的结构的方法和装置。 根据该方法，多孔材料结构的第一面暴露于气流，并且第二面至少部分地保持无任何接触。