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1.发明授权
公开(公告)号：EP3257069B1
公开(公告)日：2018-11-21
申请号：EP16702558.4
申请日：2016-02-02
IPC分类号： H01L21/02
CPC分类号： C09D5/006 , C23C18/1212 , C23C18/1216 , C23C18/1245 , C23C18/1295 , G03F7/11 , H01L21/02142 , H01L21/02172 , H01L21/02175 , H01L21/02282 , H01L21/3081 , H01L21/3086 , H01L21/31133 , H01L21/31138
摘要： The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.
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2.发明授权PROCEDE ET DISPOSITIF DE PREPARATION D'UN REVETEMENT MULTICOUCHE SUR UN SUBSTRAT 有权在衬底上制备多层涂层的方法和装置
公开(公告)号：EP2155923B1
公开(公告)日：2018-04-25
申请号：EP08736616.7
申请日：2008-04-29
CPC分类号： C23C16/06 , C23C18/1216 , C23C18/1225 , C23C18/1245 , C23C18/1287 , C23C18/1295
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公开(公告)号：EP2684222B1
公开(公告)日：2018-03-28
申请号：EP12704232.3
申请日：2012-02-09
申请人： Merck Patent GmbH
发明人： KOEHLER, Ingo , DOLL, Oliver , STOCKUM, Werner , BARTH, Sebastian
CPC分类号： C09D7/61 , C09D1/00 , C09D5/006 , C09D7/63 , C23C18/1216 , C23C18/1245 , C23C18/1254 , H01L21/2225
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4.发明公开METHOD FOR FORMING A SCRATCH RESISTANT CRYSTALLIZED LAYER ON A SUBSTRATE AND ARTICLE FORMED THEREFROM 审中-公开在基材上形成抗划伤结晶层的方法和由其形成的制品
公开(公告)号：EP3194347A1
公开(公告)日：2017-07-26
申请号：EP15771417.1
申请日：2015-09-17
申请人： Corning Incorporated
CPC分类号： C30B13/00 , C03C17/25 , C03C2217/214 , C03C2218/113 , C03C2218/116 , C03C2218/32 , C23C18/1216 , C23C18/1241 , C23C18/1245 , C23C18/1254 , C23C18/1295 , C30B29/20
摘要： A crystallized layer can be formed on a substrate from a precursor layer deposited on a surface of the substrate. The precursor layer can be an oxide, a nitride, a carbide, or an oxynitride. The process for forming the crystallized layer includes melting the precursor layer formed on the surface of the substrate by localized topical heating of the precursor layer and then cooling the melted precursor layer so that it crystallized to form a scratch resistant crystallized layer. The scratch resistant crystallized layer can have a hardness of 15 GPa or greater.
摘要翻译： 结晶层可以由沉积在基底表面上的前体层形成在基底上。 前体层可以是氧化物，氮化物，碳化物或氮氧化物。 形成结晶层的过程包括通过局部局部加热前体层熔化在基体表面上形成的前体层，然后冷却熔化的前体层以使其结晶以形成耐刮擦结晶层。 耐刮擦结晶层可具有15GPa或更高的硬度。
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5.发明授权Manufacturing method of thin film solar cell buffer layer and reaction solution therefor 有权一个薄膜太阳能电池和反应溶液的缓冲层的制造方法
公开(公告)号：EP2309555B1
公开(公告)日：2016-11-23
申请号：EP10186412.2
申请日：2010-10-04
申请人： Fujifilm Corporation
发明人： Kawano, Tetsuo
IPC分类号： H01L31/18 , C23C18/12 , H01L31/0749
CPC分类号： C23C18/1204 , C23C18/1208 , C23C18/1245 , C23C18/1266 , C23C18/127 , C25D11/04 , C25D11/08 , C25D11/10 , H01L21/02422 , H01L21/02485 , H01L21/02491 , H01L21/02502 , H01L21/02554 , H01L21/02557 , H01L21/02601 , H01L21/02628 , H01L31/03928 , H01L31/0749 , H01L31/1836 , Y02E10/541 , Y02P70/521
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6.发明授权Method of manufacturing ferroelectric thin film and an electrostatic spray solution 有权一种生产铁电薄膜和静电喷雾溶液过程
公开(公告)号：EP2645438B1
公开(公告)日：2015-03-04
申请号：EP13160993.5
申请日：2013-03-26
发明人： Iida, Shintaro , Sakurai, Hideaki
IPC分类号： H01L41/314 , C23C24/00
CPC分类号： H01L21/02104 , B05B5/1608 , B05B5/1675 , B05D1/06 , B05D3/007 , C23C18/1216 , C23C18/1245 , C23C18/1254 , C23C18/127 , C23C18/1279 , C23C18/1283 , H01L41/314 , H01L41/318
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公开(公告)号：EP2191496A4
公开(公告)日：2015-01-14
申请号：EP08828879
申请日：2008-09-02
IPC分类号： H01L21/208 , B05B15/04 , B05C11/02 , C23C18/04 , C23C18/06 , C23C18/12 , H01L21/02 , H01L31/032 , H01L31/04 , H01L31/18
CPC分类号： H01L31/1828 , C23C18/04 , C23C18/06 , C23C18/1204 , C23C18/1233 , C23C18/1241 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , H01L21/02557 , H01L21/02562 , H01L21/02568 , H01L21/02628 , H01L31/0322 , Y02E10/541 , Y02E10/543 , Y02P70/521
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8.发明授权
公开(公告)号：EP2591138B1
公开(公告)日：2014-11-19
申请号：EP11743096.7
申请日：2011-07-05
申请人： Snecma
发明人： MENUEY, Justine , HAMADI, Sarah , HUGOT, Juliette , MALIE, André, Hubert, Louis , CRABOS, Fabrice
CPC分类号： F01D5/288 , C23C4/02 , C23C14/042 , C23C14/30 , C23C14/58 , C23C18/06 , C23C18/1208 , C23C18/1225 , C23C18/1245 , C23C18/1254 , F01D5/284 , F05D2230/90 , F05D2300/21 , Y02T50/67 , Y10T428/24174
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公开(公告)号：EP2474005B1
公开(公告)日：2014-05-07
申请号：EP10754966.9
申请日：2010-09-02
CPC分类号： H01B1/08 , B05D3/10 , B05D5/12 , C23C18/08 , C23C18/1208 , C23C18/1216 , C23C18/1233 , C23C18/1245 , C23C18/1254 , C23C18/1258 , C23C18/1291 , C23C18/1295 , Y10T428/24479 , Y10T428/24628 , Y10T428/24802
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10.发明公开SOLUTION DERIVED NANOCOMPOSITE PRECURSOR SOLUTIONS, METHODS FOR MAKING THIN FILMS AND THIN FILMS MADE BY SUCH METHODS 有权OFFNANOKOMPOSITVORLÄUFERLÖSUNGENWON解决方案，用于生产薄膜和在该法律程序生产的薄膜
公开(公告)号：EP2670885A2
公开(公告)日：2013-12-11
申请号：EP12708182.6
申请日：2012-02-02
发明人： RYABOVA, Elmira
IPC分类号： C23C18/12
CPC分类号： C23C18/1216 , C09D5/24 , C23C18/1233 , C23C18/1245 , C23C18/1254 , C23C18/127 , C23C18/1295 , H01J1/70 , H05B33/26
摘要： Solution derived nanocomposite (SDN) precursor solutions are disclosed that comprise one or more metal precursors that are dissolved in a liquid comprising polar protic and polar aprotic solvents. The precursor solutions are characterized by the formation of a gel after a shear force is applied to the precursor solution or to a thin layer of precursor solution. Also disclosed are methods using such precursor solutions to make thin films, thin films made using the precursor solutions, thin films having a minimum surface area and devices containing thin films as disclosed herein.
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