Transistors with fluorine treatment
    1.
    发明公开
    Transistors with fluorine treatment 审中-公开
    具有氟处理的晶体管

    公开(公告)号:EP2312634A2

    公开(公告)日:2011-04-20

    申请号:EP11153385.7

    申请日:2006-07-07

    申请人: Cree, Inc.

    摘要: A high electron mobility transistor (HEMT), comprises a buffer layer; a barrier layer on said buffer layer; a two dimensional electron gas (2DEG) at the interface between said buffer layer and said barrier layer; and a negative ion region in said barrier layer.

    摘要翻译: 高电子迁移率晶体管(HEMT)包括缓冲层; 在所述缓冲层上的阻挡层; 在所述缓冲层和所述阻挡层之间的界面处的二维电子气(2DEG) 和在所述阻挡层中的负离子区域。

    Transistors with fluorine treatment
    4.
    发明公开
    Transistors with fluorine treatment 审中-公开
    具有氟处理的晶体管

    公开(公告)号:EP2312635A2

    公开(公告)日:2011-04-20

    申请号:EP11153386.5

    申请日:2006-07-07

    申请人: Cree, Inc.

    摘要: A semiconductor based device, comprises a plurality of active semiconductor layers experiencing an operating electric (E) field; and a negative ion region within at least one of said plurality of semiconductor layers to counter said operating (E) field.

    摘要翻译: 一种基于半导体的器件,包括多个经历工作电场(E)的有源半导体层; 以及在所述多个半导体层中的至少一个内的负离子区域以对抗所述操作(E)场。