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公开(公告)号：EP1297594B1
公开(公告)日：2012-08-15
申请号：EP01937186.3
申请日：2001-04-24
申请人： Cymer, Inc.
发明人： FLEUROV Vladimir, B. , CATES, Michael, C. , DU'LYEA, Michael , FOMENKOV, Igor, V. , GAIDARENKO, Dmitri V. , HUEBER, Jean-Marc , MORTON, Richard, G. , ONKELS, Eckehard, D. , SHANNON, Robert, A. , WINNICK, Ross, H.
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0385 , H01S3/0387 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225
摘要： A gas discharge laser having a laser chamber with two elongated erodable electrode elements (83 and 84), each having an erodable section and an electrode support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower (4A) circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger (6A) is provided to remove heat produced by the blower and the discharges.
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公开(公告)号：EP1297594A1
公开(公告)日：2003-04-02
申请号：EP01937186.3
申请日：2001-04-24
申请人： Cymer, Inc.
发明人： FLEUROV Vladimir, B. , CATES, Michael, C. , DU'LYEA, Michael , FOMENKOV, Igor, V. , GAIDARENKO, Dmitri V. , HUEBER, Jean-Marc , MORTON, Richard, G. , ONKELS, Eckehard, D. , SHANNON, Robert, A. , WINNICK, Ross, H.
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0385 , H01S3/0387 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225
摘要： A gas discharge laser having a laser chamber with two elongated erodable electrode elements (83 and 84), each having an erodable section and an electrode support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower (4A) circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger (6A) is provided to remove heat produced by the blower and the discharges.
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公开(公告)号：EP1218985A1
公开(公告)日：2002-07-03
申请号：EP00959882.2
申请日：2000-08-31
申请人： Cymer, Inc.
发明人： CYBULSKI, Raymond, F. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , DAS, Palash, P. , RICHARDSON, Danilo, D. , BUCK, Jesse, D.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0401 , H01S3/08009 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要： A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas. One of the preferred embodiments includes a barrier plate (60) and a barrier cover (62) to force the purge flow across the face of the grating. In further embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译： 一种用于生产高能量激光束的线变窄激光器的基于光栅的线变窄装置。 提供了用于最小化光栅面上存在的热气层的不利影响的技术。 在优选的实施方式中，通过使用氦气作为吹扫气体来降低热气层的影响。 其中一个优选实施例包括挡板（60）和挡板盖（62），以迫使清扫流横过格栅的表面。 在进一步的实施例中，净化气体压力降低以减少热气层的光学效应。
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4.发明授权
公开(公告)号：EP1438774B1
公开(公告)日：2010-02-24
申请号：EP02797839.4
申请日：2002-08-28
申请人： Cymer, Inc.
发明人： KNOWLES, David, S. , BROWN, Daniel, J. W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
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公开(公告)号：EP1438772A2
公开(公告)日：2004-07-21
申请号：EP02773221.3
申请日：2002-08-19
申请人： Cymer, Inc.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
IPC分类号： H01S3/11
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.
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公开(公告)号：EP1378035A1
公开(公告)日：2004-01-07
申请号：EP02721677.9
申请日：2002-04-04
申请人： Cymer, Inc.
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0078 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A narrow band F2 laser system useful for integrated circuit lithography. An output beam from a first F2 laser gain medium (master oscillator) is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor that permits feedback control over the centreline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
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7.发明公开VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开具有两室和高重复率非常狭窄的气体喷出激光系统
公开(公告)号：EP1323216A1
公开(公告)日：2003-07-02
申请号：EP01977198.9
申请日：2001-09-25
申请人： Cymer, Inc.
发明人： MYERS, David, W. , BESAUCELE, Herve, A. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Palash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , PAN, Xiaojiang, J. , ONKELS, Eckehard, D. , NESS, Richard, M. , BROWN, Daniel, J. W.
IPC分类号： H01S3/10
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers (10A, 12A) are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam which is amplified in the second discharge chamber (12). The chambers (10A, 12A) can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator (10) and optimization of pulse energy parameters in the amplifying chamber (12A). A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber (10A, 12A) comprises a single tangential fan (10A, 10) providing sufficient gas flow (11) to permit operation at pulse rates of 4,000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator (10) is equipped with a line narrowing package (16, 16A) having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4,000 Hz or greater to a precision of less than 0.2 pm.
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公开(公告)号：EP1226634A1
公开(公告)日：2002-07-31
申请号：EP00990902.9
申请日：2000-10-10
IPC分类号： H01S3/03
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/073 , H01S3/225 , H01S3/2333
摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge, along with laser optics, create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes (18A) and discharges are arranged so that debris from one of the gain medium is not circulated to the other gain medium during discharges until the debris has made a loop around at least 90 % of the chamber circulation path.
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公开(公告)号：EP1218980A1
公开(公告)日：2002-07-03
申请号：EP00968374.9
申请日：2000-09-19
申请人： Cymer, Inc.
发明人： ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , DAS, Palash, P. , PARTLO, William, N. , HOFMANN, Thomas
IPC分类号： H01S3/10
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/0385 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A turnable injection seeded very narrow band F2 lithography laser. The laser (60) combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam (LNP15) operated in a first gain medium which beam (102) is used to stimulate narrow bnd lasing in a second gain medium to produce a very narrow band laser useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers (164A, 164B) are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.
摘要翻译： 可转动的注射接种非常窄的F2光刻激光器。 激光器（60）将现有技术的长寿命可靠光刻激光器的模块化设计特征与特殊技术结合以产生在第一增益介质中操作的种子光束（LNP15），该光束（102）用于以第二增益刺激窄带激光 介质来产生用于集成电路光刻的非常窄带的激光器。 在一个优选实施例中，使用两个可调校准器输出耦合器（164A，164B）来使F2激光器的频带变窄，并且在F2放大器中放大种子激光器的输出。
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10.发明公开
公开(公告)号：EP1438774A2
公开(公告)日：2004-07-21
申请号：EP02797839.4
申请日：2002-08-28
申请人： Cymer, Inc.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
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