公开(公告)号：EP1686171A4

公开(公告)日：2007-08-29

申请号：EP04792798

申请日：2004-10-15

申请人： DAINIPPON PRINTING CO LTD

发明人： MORITA IKUO ,  NAKAMURA MAKOTO ,  MIYAKE HIDEYUKI ,  HATTORI HIDESHI ,  KOBAYASHI HIRONORI ,  KURIHARA MASAAKI

IPC分类号： C12N5/00 ,  A61L27/00 ,  A61L27/38 ,  C12M3/00 ,  G03F7/20

CPC分类号： C12N5/0068 ,  A61L27/38 ,  C12N2533/00

摘要： A cell culture method comprising: the step of adhering cells to the surface of a base material for cell alignment having an altered cell-adhesiveness pattern in which a zone showing favorable cell adhesiveness and a zone inhibiting cell adhesion are patterned on the base material; the step of transcribing the adhered cells in a patterned state onto the cell culture base material; and the step of culturing the cells thus transcribed.

公开(公告)号：EP1486819A4

公开(公告)日：2006-08-02

申请号：EP03705244

申请日：2003-02-17

申请人： DAINIPPON PRINTING CO LTD

发明人： TANAKA TOMIO ,  KOBAYASHI HIRONORI

IPC分类号： G02F1/1337

CPC分类号： G02F1/133753 ,  G02F2001/133761 ,  G02F2001/133765 ,  Y10T428/1005 ,  Y10T428/1014 ,  Y10T428/1018 ,  Y10T428/1023

摘要： An alignment layer capable of carrying out appropriate alignment of liquid crystals without forming structures such as protrusions and without performing rubbing. The alignment layer is characterized by having, over a surface on its side brought into contact with a liquid crystal layer, a pattern composed of water repellent zones and hydrophilic zones exhibiting an angle of contact with water that is smaller than that of the water repellent zones.

摘要翻译： 本发明具有的主要目的在于对电影提供取向确实允许适当地定向液晶而不形成检查作为突出部分等，或不进行摩擦处理的结构构件。 <？>为了达到上述目的，本发明的取向电影也有其上，其中所述液晶层与图案包括斥水区域和亲水区域有接触的侧表面上做提供的是一个区域，其中 与水的接触角比在疏水区小。

公开(公告)号：EP0932081A4

公开(公告)日：2001-09-05

申请号：EP98936714

申请日：1998-08-10

申请人： DAINIPPON PRINTING CO LTD

发明人： KOBAYASHI HIRONORI ,  YAMAMOTO MANABU ,  AOKI DAIGO ,  KAMIYAMA HIRONORI ,  HIKOSAKA SHINICHI ,  KASHIWABARA MITSUHIRO

IPC分类号： B41C1/10 ,  B41N1/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/075 ,  G02B3/00 ,  G02B5/20

CPC分类号： B41N1/006 ,  B29D11/00365 ,  B41C1/1041 ,  G02B3/0012 ,  G02B3/0056 ,  G02B5/201 ,  G03F7/0005 ,  G03F7/0007 ,  G03F7/001 ,  G03F7/0043 ,  G03F7/0757 ,  G03F7/095 ,  G03F7/11

摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.