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公开(公告)号：EP1024124B1
公开(公告)日：2004-07-28
申请号：EP98945624.9
申请日：1998-10-06
发明人： KONO, Satoru, c/o Yodogawa Seisakusho , SHIBANUMA, Takashi, c/o Yodogawa Seisakusho , KANEMURA, Takashi, c/o Yodogawa Seisakusho , YOSHIMURA, Toshikazu, c/o Yodogawa Seisakusho , TAKAHASHI, Kazuhiro, c/o Yodogawa Seisakusho
CPC分类号： B01J27/132 , C07C17/206 , Y02P20/582 , C07C19/08
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公开(公告)号：EP1536291A1
公开(公告)日：2005-06-01
申请号：EP03792757.1
申请日：2003-08-21
发明人： ITANO, Mitsushi, c/o Yodogawa Seisakusho , KANEMURA, Takashi, c/o Yodogawa Seisakusho , NAKAMURA, Shingo, c/o Yodogawa Seisakusho , KAMIYA, Fumihiro, c/o Yodogawa Seisakusho , KEZUKA, Takehiko, c/o Yodogawa Seisakusho
IPC分类号： G03F7/42 , H01L21/027 , H01L21/304 , H05K3/26
CPC分类号： H01L21/02063 , C11D7/08 , C11D7/24 , C11D7/263 , C11D7/264 , C11D7/265 , C11D7/28 , C11D7/32 , C11D7/3263 , C11D7/34 , C11D11/0047 , G03F7/42 , G03F7/422 , G03F7/423 , G03F7/425 , G03F7/426 , G03F7/428 , H01L21/02071 , H01L21/31133 , H01L21/31138 , H01L21/76802 , H01L21/76838 , H05K3/26
摘要： The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.
摘要翻译： 本发明提供了一种用于低k膜的抗蚀剂去除溶液和用于通孔或电容器的清洁溶液，所述溶液包含氟化氢（HF）和选自有机酸和有机溶剂中的至少一种。 本发明还提供了通过使用溶液去除抗蚀剂的方法和清洁通孔或电容器的方法。
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3.发明公开PROCESS FOR THE PREPARATION OF 1,1,1,2,2-PENTAFLUOROETHANE 有权VERFAHREN ZUR HERSTELLUNG VON 1,1,1,2,2-PENTAFLUOROETHAN
公开(公告)号：EP1024124A1
公开(公告)日：2000-08-02
申请号：EP98945624.9
申请日：1998-10-06
发明人： KONO, Satoru, c/o Yodogawa Seisakusho , SHIBANUMA, Takashi, c/o Yodogawa Saisakusho , KANEMURA, Takashi, c/o Yodogawa Seisakusho , YOSHIMURA, Toshikazu, c/o Yodogawa Seisakusho , TAKAHASHI, Kazuhiro, c/o Yodogawa Seisakusho
CPC分类号： B01J27/132 , C07C17/206 , Y02P20/582 , C07C19/08
摘要： The invention provides a process for the preparation of 1,1,1,2,2-pentafluoroethane by fluorinating in the gas phase a halogenated hydrocarbon feedstock containing 2-chloro-1,1,1,2-tetrafluoroethane with hydrogen fluoride, the process being characterized in that:
(i) a fluorinated chromium oxide obtained by fluorinating a chromium oxide represented by the formula: CrOm (1.5
(ii) the mixing ratio (by mole) of hydrogen fluoride to halogenated hydrocarbon feedstock ranges from 1.5 to 10, and
(iii) the fluorination is conducted at a temperature of 250 to 350°C.
The process makes it possible to prepare easily HFC-125 reduced in the contents of CFCs.摘要翻译： 本发明提供了一种通过在气相中氟化含有2-氯-1,1,1,2-四氟乙烷的卤代烃原料与氟化氢制备1,1,1,2,2-五氟乙烷的方法，该方法 其特征在于：（i）通过氟化由式CrOm（1.5
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