公开(公告)号：EP0789160A3

公开(公告)日：1998-07-08

申请号：EP96112788

申请日：1996-08-08

申请人： EBARA CORP ,  KAJIMA CORP

发明人： WATANABE KATSUHIDE ,  KANEMITSU YOICHI ,  HAGA TAKAHIDE ,  YANO KENICHI ,  MIZUNO TAKAYUKI ,  KATAMURA RYUTA

IPC分类号： F16F15/02 ,  F16F15/03 ,  F16F15/00

CPC分类号： F16F15/02 ,  F16F15/03

摘要： A magnetically levitated vibration damping apparatus includes a table (11) having a flat board of a magnetic material, an electromagnetic actuator (12) for applying magnetic attractive forces to the flat board to levitate the table (11), a displacement sensor (14) for detecting relative displacement between the flat board and the electromagnetic actuator (12), an acceleration sensor (13) for detecting absolute acceleration of the table (11), and a control system (15) for controlling a current supplied to the electromagnetic actuator (12) based on signals from the displacement sensor (14) and the acceleration sensor (13) according to a first control rule for controlling a gap (Z) between the flat board and the electromagnetic actuator (12) based on the signal from the acceleration sensor (13) and a second control rule for controlling vibrations of the table (11) based on the signal from the acceleration sensor (13), the second control rule including stability control (15) of relative displacement of the table (11).

公开(公告)号：EP1304499A4

公开(公告)日：2005-02-02

申请号：EP01949958

申请日：2001-07-12

申请人： EBARA CORP

发明人： WATANABE KATSUHIDE ,  HAGA TAKAHIDE ,  KANEMITSU YOICHI

IPC分类号： F16F15/02 ,  F16F15/03 ,  G03F7/20 ,  G05D19/02 ,  H01L21/027

CPC分类号： G03F7/709 ,  F16F15/03 ,  G05D19/02

摘要： A vibration isolating device capable of stably supporting a vibration isolating table to surely insulate a vibration-protected device from an external vibration, comprising a the vibration isolating table (10), magnetic levitating devices (31) to (34) supporting the vibration isolating table (10) in the state of non-contact with the table and applying a control force to the table, displacement sensors (41) to (44) detecting the relative displacement amount of the vibration isolating table (10) relative to a foundation and outputting displacement signals, acceleration sensors (61) to (63) outputting acceleration signals when detecting the vibration of the foundation, and a controller (5), the controller further comprising a first control loop for positioning the vibration isolating table (10) relative to the foundation by providing a feedback of the displacement signals to the magnetic levitating devices (31) to (34) and a second control loop for suppressing the transmission of vibration from the foundation to the vibration isolating table (10) by providing a feed-forward of the acceleration signals to the magnetic levitating devices (31) to (34) after compensation.

摘要翻译： 为了稳定地支撑防振台将隔振装置与外部振动隔离，防振装置包括防振台10; 磁悬浮装置31-34，用于不接触地支撑隔振台10并向其施加控制力; 位移传感器41-44，用于检测隔振台10相对于基座的相对位移量，以输出位移信号; 以及用于在检测到基础的振动时输出加速度信号的加速度传感器61-63。 控制器5包括用于将位移信号反馈回磁悬浮装置31-34的第一控制回路，以确定隔振台10相对于地基的相对位置; 以及用于补偿加速度信号并将补偿的加速度信号向前馈送到磁悬浮装置31-34的第二控制回路，以抑制从地基传播到隔振台10的振动。

公开(公告)号：EP0810064A3

公开(公告)日：1998-12-23

申请号：EP97108597

申请日：1997-05-28

申请人： EBARA CORP

发明人： WATANABE KATSUHIDE

IPC分类号： B24B37/04 ,  B24B49/16 ,  G05B19/4063 ,  G05B19/416 ,  B24B1/00

CPC分类号： B24B37/005 ,  B24B49/16 ,  G05B19/4063 ,  G05B19/416 ,  G05B2219/37434 ,  G05B2219/45199 ,  G05B2219/50113 ,  G05B2219/50205 ,  G05B2219/50276

摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus having interlock function comprises a turntable having a polishing surface thereon, a top ring for holding a workpiece to be polished and pressing the workpiece against the polishing surface on the turntable, a first motor for rotating the turntable, and a second motor for rotating the top ring. The polishing apparatus further comprises a first actuator for lifting and lowering the top ring, a second actuator for moving the top ring in a horizontal direction, and a control unit for controlling the motors and the actuators. The control unit controls the motors and the actuators in such a manner that when an abnormality is detected in at least one of the motors and the actuators, at least one of the motors and the actuators other than that of abnormality performs a predetermined operation.

摘要翻译： 抛光装置用于将半导体晶片等工件研磨成平面镜面。 具有互锁功能的抛光装置包括：具有抛光面的转台，用于保持要抛光的工件的顶环，并将工件压靠在转台上的抛光表面上;旋转转台的第一电动机;以及用于 旋转顶环。 抛光装置还包括用于提升和降低顶环的第一致动器，用于沿水平方向移动顶环的第二致动器，以及用于控制电动机和致动器的控制单元。 控制单元以这样的方式控制电动机和致动器，即当在至少一个电动机和致动器中检测到异常时，除了异常之外的至少一个电动机和致动器执行预定的操作。

公开(公告)号：EP1071097A4

公开(公告)日：2007-07-25

申请号：EP98954803

申请日：1998-11-24

申请人： EBARA CORP

发明人： WATANABE KATSUHIDE ,  SATOH ICHIJU ,  HAGA TAKAHIDE ,  JOUNO YOSHINORI

IPC分类号： G12B5/00 ,  G01B11/00 ,  G03B27/42 ,  G03F7/20 ,  H02K7/09

CPC分类号： G03F7/70758 ,  G03F7/70716 ,  G03F7/70816 ,  Y10S977/839

摘要： A stage positioning device enabling a fine and stable positioning operation, comprising a stage (11) on which a sample (W) to which a beam (B) is applied, is placed, actuators (12a, 12b, 12c and 12d) which support the stage (11) in a noncontact and levitated state and control its movement, a first sensor (13) which measures relative displacement between the stage (11) and actuators (12a, 12b, 12c and 12d), a second sensor (36) which measures a relative displacement between an actual beam (B) application position and a target beam application position on the sample and a controller (15) which controls the movement of the stage so as to reduce the relative displacement detected by the sensor (36), wherein the stage is a magnetically levitated stage consisting of a levitation unit which has a table part on which the sample is placed and side plates hanging down from the outer circumference of the table part and a fixed unit which has the actuators which supports the levitation unit with the magnetic forces of magnets and, at the same time, controls the position of the levitation unit, and the fixed unit is covered with the table part and side plates of the levitation unit.

公开(公告)号：EP0814279A2

公开(公告)日：1997-12-29

申请号：EP97110230

申请日：1997-06-23

申请人： EBARA CORP

发明人： HAGA TAKAHIDE ,  WATANABE KATSUHIDE

IPC分类号： F16F15/02 ,  F16F15/027

CPC分类号： F16F15/02 ,  F16F15/0275

摘要： The object of the present invention is to provide a compact vibration cancellation apparatus based on a combination of air springs (11) and electromagnetic actuators (12) with smaller power capacity to enable the anti-vibration table (10) to be maintained in a level position even when the gravity of the anti-vibration table (10) moves over a large distance caused by a movement of the objective equipment (A) on the table. A vibration cancellation apparatus for isolating floor vibration or canceling vibration of the objective equipment (A) on a anti-vibration table (10) comprises: at least three displacement sensors (12), acceleration sensors (13), levitation position control means, vibration canceling control means, and air spring actuators (11) for supporting four corners of said anti-vibration table (10) by air pressure; wherein said air pressure in each of said air spring actuator (11) is controlled in response to a change of load weight which corresponds to a movement of gravity caused by movement of said objective equipment (A) on said anti-vibration table (10).

摘要翻译： 本发明的目的是提供一种紧凑型振动消除装置，其基于具有较小功率容量的空气弹簧（11）和电磁致动器（12）的组合，以使防振台（10）能够保持在一个水平 即使当防震台（10）的重力由于物镜（A）在桌子上的移动而移动一段较大的距离时也是如此。 一种用于将抗震台（10）上的物体设备（A）的地板振动或抵消振动隔离的振动消除装置包括：至少三个位移传感器（12），加速度传感器（13），悬浮位置控制装置，振动 取消控制装置，以及用于通过空气压力支撑所述防振台（10）的四个角的空气弹簧致动器（11） 其中每个所述空气弹簧致动器（11）中的所述空气压力响应于对应于由所述物镜设备（A）在所述防振台（10）上的移动引起的重力运动的负载重量的变化而被控制， 。