-
公开(公告)号:EP2453310A3
公开(公告)日:2014-09-17
申请号:EP12000081.5
申请日:2007-06-19
申请人: Entegris, Inc.
IPC分类号: G03F7/20 , H01L21/673 , H01L21/687 , H01L21/67 , H01L21/677 , G03F1/66
CPC分类号: H01L21/67769 , G03F1/66 , G03F7/70741 , G03F7/70866 , G03F7/70916 , G03F7/70925 , G03F7/70933 , H01L21/67017 , H01L21/67253 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要: The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing (54.1) having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter (54.8) when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be "recharged" during the substantially continual purging of the reticle, a reduced desireable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system (50,52). For example, the ionizer can be associated with at least one of the plurality of purge lines (54.9) of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves (80) that each include a plurality of reticle storage receptacles (58).
-
公开(公告)号:EP2453310B1
公开(公告)日:2015-12-09
申请号:EP12000081.5
申请日:2007-06-19
申请人: Entegris, Inc.
IPC分类号: G03F7/20 , H01L21/673 , H01L21/687 , H01L21/67 , H01L21/677 , G03F1/66
CPC分类号: H01L21/67769 , G03F1/66 , G03F7/70741 , G03F7/70866 , G03F7/70916 , G03F7/70925 , G03F7/70933 , H01L21/67017 , H01L21/67253 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
-
公开(公告)号:EP2453310A2
公开(公告)日:2012-05-16
申请号:EP12000081.5
申请日:2007-06-19
申请人: Entegris, Inc.
IPC分类号: G03F7/20 , H01L21/673
CPC分类号: H01L21/67769 , G03F1/66 , G03F7/70741 , G03F7/70866 , G03F7/70916 , G03F7/70925 , G03F7/70933 , H01L21/67017 , H01L21/67253 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要: The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be "recharged" during the substantially continual purging of the reticle, a reduced desireable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.
摘要翻译: 本发明提供了一种用于保护掩模版的方法,系统和组件,并且特别地用于最小化在保存和使用期间掩模版上的雾化形成。 通过基本上连续地将清洁保持在具有降低的刻度上的湿度水平的储存壳体(54.1)中,或者当不被清除时将掩模版临时存储在接近干燥剂或吸气剂(54.8)的容器中时,可以消除雾度形成, 最小化或充分控制。 此外,容器中的过滤介质可以被定位成在基本连续清洗标线板期间被“再充电”,当容器当前没有被清除时,可以容易地保持在掩模版容器中减少的所需湿度水平。 另外,本发明的系统可以包括与清洗系统(50,52)相关联的离子发生器。 例如,离子发生器可以与清洗系统的多个清除管线(54.9)中的至少一个相关联。 本发明的系统还可以包括连接到吹扫系统的吹扫气体源,其包括CDA或额外的CDA源。 存储壳体可以包括多个搁架(80),每个搁架(80)包括多个掩模版存储容器(58)。
-
-