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    PROCEDE DE PREPARATION D'UNE COMPOSITION PHOTORETICULABLE
    1.
    发明授权
    PROCEDE DE PREPARATION D'UNE COMPOSITION PHOTORETICULABLE 有权
    一种用于生产光交联组合物

    公开(公告)号：EP2262848B1

    公开(公告)日：2012-08-15

    申请号：EP09742291.9

    申请日：2009-04-09

    申请人： Essilor International (Compagnie Générale d'Optique) ,  Centre National de la Recherche Scientifique - CNRS

    发明人： BALLET, Jérôme ,  BIVER, Claudine ,  CANO, Jean-Paul ,  DELIANE, Florent ,  ETIENNE, Pascal ,  LLOSA, Marjorie

    IPC分类号： C08G77/04 ,  C08G77/10 ,  C09D183/06 ,  G03F7/075 ,  C08G77/14

    CPC分类号： C08G77/14 ,  C08L83/06 ,  C09D183/06 ,  G03F7/0757

    摘要： The invention relates to a photo-crosslinkable composition that can be obtained by a method including the following steps: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]-thalkoxysilane in solution in an organo-aqueous medium containing water in an initial water/monomer molar ratio of between 3 and 15, with at least one water-soluble solvent, at a pH of between 1.6 and 4.0, by heating the solution to a temperature of between 50 and 70°C for a duration of between 180 and 350 minutes in order to obtain a solution of an organo-mineral hybrid prepolymer, in which the totality or quasi-totality of the alkoxysilane groups has been hydrolysed, and which comprises in average at least 4 (epoxycycloalkyl)alkyl groups; (b) cooling the polyepoxide prepolymer composition thus obtained down to a temperature of between 15 and 25°C; (c) adding to said composition at least one cationic-polymerisation photo-primer and at least one photosensitiser having a maximum absorption at a wavelength of between 300 and 420 nm, and optionally adding a surfactant; (d) agitating the composition thus obtained for a duration of between 10 and 120 minutes at a temperature of between 15 and 25°C; (e) filtering the composition thus obtained with a filter comprising pores with an average size of between 1 and 5 μm; and (f) storing the liquid filtrate thus obtained at a temperature lower than 0°C, preferably between –20 and –10°C. The invention also relates to the use of such a photo-crosslinkable composition as a negative photosensitive resin in a photolithography process.

    REALISATION D'UN COMPOSANT OPTIQUE TRANSPARENT A STRUCTURE CELLULAIRE
    3.
    发明公开
    REALISATION D'UN COMPOSANT OPTIQUE TRANSPARENT A STRUCTURE CELLULAIRE 有权
    HELTELUNG EINER DURCHSICHTIGEN OPTISCHEN KOMPONENTE MITZELLULÄRERSTRUKTUR设计

    公开(公告)号：EP2572235A1

    公开(公告)日：2013-03-27

    申请号：EP11727211.2

    申请日：2011-05-16

    申请人： Essilor International (Compagnie Générale d'Optique) ,  Centre National de la Recherche Scientifique CNRS

    发明人： BALLET, Jérôme ,  BENOIT, Céline ,  BOVET, Christian ,  CANO, Jean-Paul ,  CHAVEL, Pierre ,  GOUDAIL, François

    IPC分类号： G02C7/08 ,  G02C7/10

    CPC分类号： B29D11/00798 ,  G02C7/083 ,  G02C7/10 ,  G02C2202/18

    摘要： The invention relates to a transparent optical component having a cellular structure, comprising a network of walls (106), that forms a set of cells (104) that are juxtaposed parallel to a component surface. In order to produce such a component, an irregular set of points (101, 105) in the surface of the component is determined, each point being used to form a centre of one of the cells. A position and an orientation of each wall are then determined such that the set of cells forms a Voronoï partition of the surface of the component. The component has a level of transparency that is compatible with an optical or ophthalmological use.

    摘要翻译： 本发明涉及具有多孔结构的透明光学部件，其包括壁（106）网络，其形成平行于部件表面并置的一组电池（104）。 为了制造这样的部件，确定部件表面中的不规则的点（101,105），每个点用于形成其中一个单元的中心。 然后确定每个壁的位置和取向，使得该组细胞形成组件表面的Voronoï分区。 该组件具有与光学或眼科学使用兼容的透明度水平。

    PROCEDE DE PREPARATION D'UNE COMPOSITION PHOTORETICULABLE
    5.
    发明公开
    PROCEDE DE PREPARATION D'UNE COMPOSITION PHOTORETICULABLE 有权
    一种用于生产光交联组合物

    公开(公告)号：EP2262848A1

    公开(公告)日：2010-12-22

    申请号：EP09742291.9

    申请日：2009-04-09

    申请人： Essilor International (Compagnie Générale D'Optique) ,  Centre National de la Recherche Scientifique - CNRS

    发明人： BALLET, Jérôme ,  BIVER, Claudine ,  CANO, Jean-Paul ,  DELIANE, Florent ,  ETIENNE, Pascal ,  LLOSA, Marjorie

    IPC分类号： C08G77/04 ,  C08G77/10 ,  C09D183/06 ,  G03F7/075 ,  C08G77/14

    CPC分类号： C08G77/14 ,  C08L83/06 ,  C09D183/06 ,  G03F7/0757

    摘要： The invention relates to a photo-crosslinkable composition that can be obtained by a method including the following steps: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]-thalkoxysilane in solution in an organo-aqueous medium containing water in an initial water/monomer molar ratio of between 3 and 15, with at least one water-soluble solvent, at a pH of between 1.6 and 4.0, by heating the solution to a temperature of between 50 and 70°C for a duration of between 180 and 350 minutes in order to obtain a solution of an organo-mineral hybrid prepolymer, in which the totality or quasi-totality of the alkoxysilane groups has been hydrolysed, and which comprises in average at least 4 (epoxycycloalkyl)alkyl groups; (b) cooling the polyepoxide prepolymer composition thus obtained down to a temperature of between 15 and 25°C; (c) adding to said composition at least one cationic-polymerisation photo-primer and at least one photosensitiser having a maximum absorption at a wavelength of between 300 and 420 nm, and optionally adding a surfactant; (d) agitating the composition thus obtained for a duration of between 10 and 120 minutes at a temperature of between 15 and 25°C; (e) filtering the composition thus obtained with a filter comprising pores with an average size of between 1 and 5 μm; and (f) storing the liquid filtrate thus obtained at a temperature lower than 0°C, preferably between –20 and –10°C. The invention also relates to the use of such a photo-crosslinkable composition as a negative photosensitive resin in a photolithography process.

    ARTICLE D'OPTIQUE COMPORTANT UN REVETEMENT ANTI-ABRASION ET ANTI-RAYURES BICOUCHE, ET PROCEDE DE FABRICATION
    7.
    发明授权
    ARTICLE D'OPTIQUE COMPORTANT UN REVETEMENT ANTI-ABRASION ET ANTI-RAYURES BICOUCHE, ET PROCEDE DE FABRICATION 有权
    用于生产具有双层划伤和擦伤固体分涂料和工艺光学制品

    公开(公告)号：EP2092377B1

    公开(公告)日：2012-02-08

    申请号：EP07866538.7

    申请日：2007-11-22

    申请人： ESSILOR INTERNATIONAL (Compagnie Générale d'Optique)

    发明人： BERIT-DEBAT, Fabien ,  BOVET, Christian ,  CANO, Jean-Paul ,  KUDLA, Amélie ,  LECLAIRE, Yves

    IPC分类号： G02B1/10 ,  G02B1/04

    CPC分类号： G02B1/14 ,  B05D3/0254 ,  B05D7/546 ,  C09D183/04 ,  G02B1/105 ,  G02C7/02 ,  Y10T428/2495 ,  Y10T428/265 ,  Y10T428/31511

    摘要： The invention relates to an optical article, comprising a substrate covered with an abrasion and scratch resistant coating with a lower layer and an upper layer stuck to each other, the upper layer and the lower layer being made of hardened layers of upper and lower layer compositions, the upper layer composition comprising at least one organosilane, or hydrolysate thereof, of formula RnYmSi(X)4-n-m and at least one compound or hydrolysate thereof of formula M(Z)x, the following ratio being less than 2.3 : Rs=mass of the theoretical dry extract of compounds I in the upper layer composition/mass of the theoretical dry extract of compounds II in the upper layer composition. The lower layer composition comprises at least one organosilane, or hydrolysate thereof of formula R'n'Y'm'Si(X')4-n-m' and, optionally at least one compound, or hydrolysate thereof of formula M'(Z')y, the following ratio being greater than 2.3 : Ri = mass of the theoretical dry extract of compounds III in the lower layer composition/mass of the theoretical dry extract of compounds IV in the lower layer composition. In the above formulae, M and M' are metals or metalloids of valence x and y, at least equal to 4, R and R' are monovalent organic groups bonded to silicon by a carbon atom and containing at least one epoxy function, groups X, X', Z and Z' are hydrolysable groups, Y and Y' are monovalent organic groups bonded to silicon by a carbon atom, n, m, n' and m' are whole numbers such that n and n' = 1 or 2 with n+m and n'+m' = 1 or 2.

    摘要翻译： 本发明涉及在光学制品，其包含在下层和上层组成的耐磨和耐划伤涂层涂覆有基材没有做坚持海誓山盟，上层和下层是固化的上部和下部的层 层组合物，所述上层组合物，包含至少一种有机硅烷，或它们的水解产物，式RnYmSi（X）4-nm和至少一种化合物，或其水解产物的物，式M（Z）x的，下面的比为 低于2.3：RS =理论干物质的我在的上层组合物理论干物质重量化合物重量 我我在的上层化合物的组合物所述下层组合物，包括至少一种有机硅烷，或其水解产物，式R'n'Y'm'Si的（ X '）4-N'-m' 和，任选地，至少一个C ompound，或其水解产物，式M“（Z”）y的，以下的比例为高于2.3中：R 1 =理论在化合物III干物质重量 下层组合物理论干物质的化合物提取我V在的下层在这里组合物上述各式中，M 和M“是金属或化合价，x和y中，准金属至少等于4，R和R”基团是一价的有机基团没有通过碳原子结合至硅，也含有至少一个环氧官能团，X，X' 中，Z和Z“基团是可水解基团，Y和Y”也被通过碳原子键合至硅的一价有机基团中，n，M，N“和m”是整数检查做n和n“= 1或2与 的n + m和n '+ M'= 1或第二

    ARTICLE D'OPTIQUE COMPORTANT UN REVETEMENT ANTI-ABRASION ET ANTI-RAYURES BICOUCHE, ET PROCEDE DE FABRICATION
    9.
    发明公开
    ARTICLE D'OPTIQUE COMPORTANT UN REVETEMENT ANTI-ABRASION ET ANTI-RAYURES BICOUCHE, ET PROCEDE DE FABRICATION 有权
    用于生产具有双层划伤和擦伤固体分涂料和工艺光学制品

    公开(公告)号：EP2092377A1

    公开(公告)日：2009-08-26

    申请号：EP07866538.7

    申请日：2007-11-22

    申请人： ESSILOR INTERNATIONAL (Compagnie Générale d'Optique)

    发明人： BERIT-DEBAT, Fabien ,  BOVET, Christian ,  CANO, Jean-Paul ,  KUDLA, Amélie ,  LECLAIRE, Yves

    IPC分类号： G02B1/10 ,  G02B1/04

    CPC分类号： G02B1/14 ,  B05D3/0254 ,  B05D7/546 ,  C09D183/04 ,  G02B1/105 ,  G02C7/02 ,  Y10T428/2495 ,  Y10T428/265 ,  Y10T428/31511

    摘要： The invention relates to an optical article, comprising a substrate covered with an abrasion and scratch resistant coating with a lower layer and an upper layer stuck to each other, the upper layer and the lower layer being made of hardened layers of upper and lower layer compositions, the upper layer composition comprising at least one organosilane, or hydrolysate thereof, of formula RnYmSi(X)4-n-m and at least one compound or hydrolysate thereof of formula M(Z)x, the following ratio being less than 2.3 : Rs=mass of the theoretical dry extract of compounds I in the upper layer composition/mass of the theoretical dry extract of compounds II in the upper layer composition. The lower layer composition comprises at least one organosilane, or hydrolysate thereof of formula R'n'Y'm'Si(X')4-n-m' and, optionally at least one compound, or hydrolysate thereof of formula M'(Z')y, the following ratio being greater than 2.3 : Ri = mass of the theoretical dry extract of compounds III in the lower layer composition/mass of the theoretical dry extract of compounds IV in the lower layer composition. In the above formulae, M and M' are metals or metalloids of valence x and y, at least equal to 4, R and R' are monovalent organic groups bonded to silicon by a carbon atom and containing at least one epoxy function, groups X, X', Z and Z' are hydrolysable groups, Y and Y' are monovalent organic groups bonded to silicon by a carbon atom, n, m, n' and m' are whole numbers such that n and n' = 1 or 2 with n+m and n'+m' = 1 or 2.