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公开(公告)号：EP0391365B1
公开(公告)日：1995-01-18
申请号：EP90106392.5
申请日：1990-04-03
CPC分类号： C07F7/182 , B41N3/038 , C07F7/006 , C07F7/045 , Y10T428/31678
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公开(公告)号：EP0110417A2
公开(公告)日：1984-06-13
申请号：EP83112112.4
申请日：1983-12-01
发明人： Sekiya, Toshiyuki
摘要： A presensitized lithographic plate is comprised of a support base such as an aluminum support base with an anodized surface, having a subbing layer positioned thereon which is coated with a light-sensitive layer. The light-sensitive layer comprises a diazo compound and a binder or comprises a photopolymerizable composition. The subbing layer comprises a high molecular compound containing sulfonic acid group-containing monomer units as recurring units. The subbing layer provides a lithographic plate with greatly improved shelf life. Moreover, it increases the stability of the lithographic plate such that when the plate is stored it continues to be capable of producing copies which do not have stained background areas even when the plate is stored under adverse temperature and humidity conditions.
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公开(公告)号：EP0391365A1
公开(公告)日：1990-10-10
申请号：EP90106392.5
申请日：1990-04-03
CPC分类号： C07F7/182 , B41N3/038 , C07F7/006 , C07F7/045 , Y10T428/31678
摘要： The present invention relates to a process for treating a metal surface wherein a liquid composition comprising an inorganic polymer is applied to the metal surface. The inorganic polymer is produced by hydrolyzing and then polycondensing, in an organic solvent, an organometallic compound having an organic functional group and a group capable of being hydrolyzed and then polycondensed in an organic solvent.
According to the present invention, the metal surface per se is made chemically reactive by fixing functional groups on the metal surface and is very useful, for example, as a support for making a presensitized lithographic plate.摘要翻译： 本发明涉及一种处理金属表面的方法，其中将包含无机聚合物的液体组合物施加到金属表面。 无机聚合物通过在有机溶剂中水解然后使其缩聚成具有有机官能团的有机金属化合物和能够水解的基团，然后在有机溶剂中缩聚而制备。 根据本发明，金属表面本身通过将金属表面上的官能团固定而具有化学反应性，并且非常有用，例如作为制备预敏化平版印刷版的载体。
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公开(公告)号：EP0092794A3
公开(公告)日：1985-01-23
申请号：EP83103877
申请日：1983-04-20
发明人： Nagano, Teruo , Nakakita, Eiji , Sekiya, Toshiyuki
IPC分类号： G03F07/02
CPC分类号： G03F7/115 , Y10S430/151 , Y10S430/162
摘要： A light-sensitive printing plate is disclosed. The printing plate is comprised of a support base having a light-sensitive layer positioned thereon and a matting layer comprised of a micropattern of protuberances. The protuberances are present in a regular or randomly mixed manner on the light-sensitive layer and are comprised of a copolymer. The copolymer includes a monomer (unit a) with a sulfonic acid group, a monomer (unit b) selected from the group consisting of alkyl acrylates having 1 to 10 carbon atoms in the alkyl moiety thereof and alkyl methacrylates having 4to 10 carbon atoms in the alkyl moiety thereof and a monomer (unit c) copolymerizable with monomer (unit a) and a monomer (unit b), monomer (unit c) as a copolymer having a glass transition point of 60°C or above. The matting layer does not cause staining of a film original when superposed thereon and is resistant to rubbing or pressure and provides a surface which can be vacuum contacted with a film in a short period of time.
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公开(公告)号：EP0130488A2
公开(公告)日：1985-01-09
申请号：EP84107117.8
申请日：1984-06-20
IPC分类号： G03F7/023
CPC分类号： G03F7/0212 , G03F7/0166
摘要： A presensitized lithographic printing plate precursor is described, comprising an aluminum support that has been rendered hydrophilic having provided thereon a light-sensitive layer composed of a light-sensitive composition comprising (1) an organic solvent-soluble and substantially water-insoluble diazo resin, (2) a substantially water-insoluble, film-forming polymeric compound, and at least one of (3a) an organic solvent-soluble polymeric compound having a sulfonic acid group or a sulfonic acid salt group in its side chain and (3b) a substituted or unsubstituted dipicolinic acid or a salt thereof, the total amount of (3a) and (3b) components being about 1 to about 100% by weight, based on the weight of the diazo resin.
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公开(公告)号：EP0092794A2
公开(公告)日：1983-11-02
申请号：EP83103877.3
申请日：1983-04-20
发明人： Nagano, Teruo , Nakakita, Eiji , Sekiya, Toshiyuki
IPC分类号： G03F7/115
CPC分类号： G03F7/115 , Y10S430/151 , Y10S430/162
摘要： A light-sensitive printing plate is disclosed. The printing plate is comprised of a support base having a light-sensitive layer positioned thereon and a matting layer comprised of a micropattern of protuberances. The protuberances are present in a regular or randomly mixed manner on the light-sensitive layer and are comprised of a copolymer. The copolymer includes a monomer (unit a) with a sulfonic acid group, a monomer (unit b) selected from the group consisting of alkyl acrylates having 1 to 10 carbon atoms in the alkyl moiety thereof and alkyl methacrylates having 4to 10 carbon atoms in the alkyl moiety thereof and a monomer (unit c) copolymerizable with monomer (unit a) and a monomer (unit b), monomer (unit c) as a copolymer having a glass transition point of 60°C or above. The matting layer does not cause staining of a film original when superposed thereon and is resistant to rubbing or pressure and provides a surface which can be vacuum contacted with a film in a short period of time.
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公开(公告)号：EP0208145B1
公开(公告)日：1991-03-13
申请号：EP86107703.0
申请日：1986-06-06
CPC分类号： C08F8/00 , G03F7/0215
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公开(公告)号：EP0331171A2
公开(公告)日：1989-09-06
申请号：EP89103667.5
申请日：1989-03-02
发明人： Sekiya, Toshiyuki
IPC分类号： G03F7/027
CPC分类号： G03F7/0166
摘要： A light-sensitive composition comprises a diazo resin, a polymeric binder, and at least one compound having at least one structural unit selected from the group consisting of ureido bond, thioureido bond, urethane bond and thiourethane bond. The light-sensitive composition can suitably be used for preparing a presensitized plate for use in making lithographic printing plates and is excellent in developability with an aqueous alkaline developer.
摘要翻译： 光敏组合物包含重氮树脂，聚合物粘合剂和至少一种具有至少一个选自脲基键，硫脲基键，氨基甲酸酯键和硫代氨基甲酸酯键的结构单元的化合物。 感光性组合物适合用于制备用于制作平版印刷版的预制感光版，并且与水性碱性显影剂的显影性优异。
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公开(公告)号：EP0092794B1
公开(公告)日：1987-07-15
申请号：EP83103877.3
申请日：1983-04-20
发明人： Nagano, Teruo , Nakakita, Eiji , Sekiya, Toshiyuki
IPC分类号： G03F7/115
CPC分类号： G03F7/115 , Y10S430/151 , Y10S430/162
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