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1.发明公开COLORED CURABLE COMPOSITIONS, COLOR FILTERS AND PROCESS FOR PRODUCTION THEREOF 审中-公开彩色固化成分，彩色滤光片及其生产工艺
公开(公告)号：EP1780598A4
公开(公告)日：2012-11-28
申请号：EP05758193
申请日：2005-07-06
Applicant: FUJIFILM CORP
Inventor： SETO NOBUO , MIZUKAWA YUKI , FUJIMORI TORU
CPC classification number: G03F7/0007 , C09B47/063 , C09B47/065 , C09B47/0675 , C09B47/0678
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2.发明公开ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 审中-公开光化辐射敏感或 敏感性树脂组合物及散热结构，教育的过程，
公开(公告)号：EP2260352A4
公开(公告)日：2011-11-23
申请号：EP09727087
申请日：2009-03-31
Applicant: FUJIFILM CORP
Inventor： FUJII KANA , TOMIGA TAKAMITSU , TSUCHIHASHI TORU , MIZUTANI KAZUYOSHI , YOKOYAMA JIRO , SUGIYAMA SHINICHI , HIRANO SHUJI , FUJIMORI TORU
IPC: G03F7/039 , C08F212/14 , C08F220/10 , G03F7/004 , H01L21/027
CPC classification number: G03F7/0392 , C08F8/12 , C08F12/22 , C08F214/18 , C08F220/18 , C08F220/22 , C08F220/32 , C08F2220/282 , C08K5/375 , C08K5/42 , C08L33/068 , C08L51/04 , C08L67/02 , C09D125/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F2220/1825 , C08F2220/185 , C08F220/14
Abstract: According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
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3.发明公开ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD 审中-公开光化辐射敏感或 辐射敏感树脂组合物，抗蚀膜那和结构，教育的过程，
公开(公告)号：EP2411873A4
公开(公告)日：2013-12-04
申请号：EP10756267
申请日：2010-03-23
Applicant: FUJIFILM CORP
Inventor： FUJI KANA , HIRANO SHUJI , YAMADA SHINKI , FUJIMORI TORU
IPC: G03F7/039 , C08F8/12 , C08F212/14 , C08F220/12 , G03F7/004 , H01L21/027
CPC classification number: C08F212/14 , C08F8/12 , C08F220/20 , C08F2220/1825 , C08K5/375 , C08K5/41 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C08F2220/281 , C08F220/30
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Patent Agency Ranking4.发明公开ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权光化辐射敏感或 辐射敏感树脂组合物，由该组合物和结构所形成的成膜过程
公开(公告)号：EP2507669A4
公开(公告)日：2014-03-05
申请号：EP10833435
申请日：2010-11-30
Applicant: FUJIFILM CORP
Inventor： TSUCHIMURA TOMOTAKA , ITO TAKAYUKI , FUJIMORI TORU , FUJII KANA
IPC: G03F7/004 , G03F7/039 , G03F7/09 , H01L21/027
CPC classification number: G03F7/0045 , C09B69/101 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/091
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5.发明公开ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME 有权光化辐射敏感性树脂组合物和结构，教育的过程，
公开(公告)号：EP2478414A4
公开(公告)日：2013-07-03
申请号：EP10817323
申请日：2010-09-16
Applicant: FUJIFILM CORP
Inventor： FUJII KANA , TSUCHIMURA TOMOTAKA , FUJIMORI TORU , TAKAHASHI HIDENORI , ITO TAKAYUKI
IPC: G03F7/004 , G03F7/039 , H01L21/027
CPC classification number: G03F7/0392 , G03F7/0045 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/106 , Y10S430/111 , Y10S430/12
Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
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6.发明公开ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开对主动辐射敏感或BZW。 辐射敏感性树脂组合物，其电阻膜及其结构形成工艺
公开(公告)号：EP2545412A4
公开(公告)日：2013-11-13
申请号：EP11753463
申请日：2011-03-04
Applicant: FUJIFILM CORP
Inventor： FUJII KANA , TOMIGA TAKAMITSU , FUJIMORI TORU
IPC: G03F7/004 , G03F7/039 , G03F7/16 , H01L21/027
CPC classification number: G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/16 , G03F7/2041
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7.发明公开CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME 审中-公开化学增强的抗蚀剂组合物方法以及FORM抗蚀膜生产订单
公开(公告)号：EP2399168A4
公开(公告)日：2013-06-05
申请号：EP10792234
申请日：2010-06-23
Applicant: FUJIFILM CORP
Inventor： FUJIMORI TORU , SHIRAKAWA KOJI , USA TOSHIHIRO , SUGIYAMA KENJI , ITO TAKAYUKI , TSUBAKI HIDEAKI , NISHIMAKI KATSUHIRO , HIRANO SHUJI , TAKAHASHI HIDENORI
IPC: G03F7/039 , B29C33/38 , B29C59/02 , C08F12/00 , C08F20/00 , C08F20/50 , G03F7/00 , G03F7/004 , H01L21/027
CPC classification number: C08F20/50 , B29C33/38 , B29C2033/426 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0046 , G03F7/0392 , G03F7/0397
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8.发明公开POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE 审中-公开聚合的组合物，遮光当前颜色过滤器的固态图像传感器布置和固态图像传感器装置
公开(公告)号：EP2275867A4
公开(公告)日：2011-08-10
申请号：EP09728726
申请日：2009-02-17
Applicant: FUJIFILM CORP
Inventor： SHIMADA KAZUTO , TSUCHIMURA TOMOTAKA , MARUYAMA YOICHI , FUJIMORI TORU , KANEKO YUSHI , EINAGA HIROYUKI
CPC classification number: G02F1/133512 , G03F7/0007 , G03F7/032 , G03F7/035 , G03F7/0388 , G03F7/105
Abstract: A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.
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