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    Positive resist composition and pattern forming method using the same
    2.
    发明公开
    Positive resist composition and pattern forming method using the same 审中-公开
    正光刻胶组合物及使用其的图案形成方法

    公开(公告)号：EP1835342A3

    公开(公告)日：2008-06-04

    申请号：EP07005158.6

    申请日：2007-03-13

    申请人： FUJIFILM Corporation

    发明人： Mizutani, Kazuyoshi ,  Iwato, Kaoru ,  Kodama, Kunihiko ,  Tsuchihashi, Toru

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

    wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern forming method using the same
    3.
    发明公开
    Positive resist composition and pattern forming method using the same 有权
    积极的抵抗力和威尔法罕zur Strukturformung damit

    公开(公告)号：EP1835341A1

    公开(公告)日：2007-09-19

    申请号：EP07005155.2

    申请日：2007-03-13

    申请人： FUJIFILM Corporation

    发明人： Mizutani, Kazuyoshi ,  Iwato, Kaoru ,  Kodama, Kunihiko ,  Makino, Masaomi

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

    wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern formation method using the positive resist composition
    7.
    发明公开
    Positive resist composition and pattern formation method using the positive resist composition 有权
    积极的抵抗力和威尔法罕zur Strukturformung damit

    公开(公告)号：EP1835343A1

    公开(公告)日：2007-09-19

    申请号：EP07005242.8

    申请日：2007-03-14

    申请人： FUJIFILM Corporation

    发明人： Iwato, Kaoru ,  Kodama, Kunihiko ,  Yoshida, Yuko ,  Yamamoto, Kei

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.

    摘要翻译： 一种正型抗蚀剂组合物，其包含：通过酸的作用增加在碱性显影液中的溶解度的树脂，其包含含有内酯结构和氰基的重复单元，含有选自下式 （pI）至（pV）和含有选自如本文定义的与第一组不同的由式（pI）至（pV）表示的基团的第二基团的重复单元; 在光化射线或辐射照射时产生酸的化合物; 和溶剂。

    Positive resist composition and pattern forming method using the same
    8.
    发明公开
    Positive resist composition and pattern forming method using the same 审中-公开
    积极的抵抗力和威尔法罕zur Strukturformung damit

    公开(公告)号：EP1835342A2

    公开(公告)日：2007-09-19

    申请号：EP07005158.6

    申请日：2007-03-13

    申请人： FUJIFILM Corporation

    发明人： Mizutani, Kazuyoshi ,  Iwato, Kaoru ,  Kodama, Kunihiro ,  Tsuchihashi, Toru

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

    wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。