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    METHOD FOR MANUFACTURING SEMICONDUCTOR OPTICAL DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR OPTICAL LASER ELEMENT, AND SEMICONDUCTOR OPTICAL DEVICE
    1.
    发明公开
    METHOD FOR MANUFACTURING SEMICONDUCTOR OPTICAL DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR OPTICAL LASER ELEMENT, AND SEMICONDUCTOR OPTICAL DEVICE 审中-公开

    公开(公告)号：EP2453535A4

    公开(公告)日：2018-04-04

    申请号：EP10796985

    申请日：2010-06-09

    申请人： FURUKAWA ELECTRIC CO LTD

    发明人： TANIGUCHI HIDEHIRO

    IPC分类号： H01S5/16

    CPC分类号： H01S5/22 ,  H01S5/162 ,  H01S5/2072 ,  H01S5/2077 ,  H01S5/2205

    摘要： A method of manufacturing a semiconductor optical device including a semiconductor layer according to the invention includes: forming a first dielectric film on a first region of a surface of a semiconductor laminated structure (10); forming a second dielectric film on a second region of the surface of the semiconductor laminated structure (10), the second dielectric film having a density higher than that of the first dielectric film; and performing a thermal treatment in a temperature range in which bandgap variation due to the thermal treatment in the semiconductor layer below the second dielectric film is larger than bandgap variation due to the thermal treatment in the semiconductor layer below the first dielectric film to form a window region (23) in the semiconductor laminated structure (10) below the first dielectric film.