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公开(公告)号：EP2795657B1
公开(公告)日：2018-12-12
申请号：EP12775662.5
申请日：2012-10-17
发明人： MORGNER, Henry , MATTAUSCH, Gösta , METZNER, Christoph , JUNGHÄHNEL, Michael , LABITZKE, Rainer , KLOSE, Lars , WERNER, Lars , KUBUSCH, Jörg
IPC分类号： H01J37/32
CPC分类号： H01J37/32568 , H01J37/32055 , H01J37/32064 , H01J37/32596 , H01J37/32669 , H01J37/32807 , H01J2237/0822 , H01J2237/152 , H01J2237/327 , H05H1/48
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公开(公告)号：EP2087503A1
公开(公告)日：2009-08-12
申请号：EP07819513.8
申请日：2007-10-31
发明人： HEINSS, Jens-Peter , KIRCHHOFF, Volker , KLOSE, Lars , METZNER, Christoph , MORGNER, Henry , SCHEFFEL, Bert
IPC分类号： H01J37/32
CPC分类号： C23F4/00 , H01J37/32055 , H01J37/32596 , H01J37/32706
摘要： The invention relates to a device for the pre-treatment of at least one substrate (21), comprising a low voltage arc discharge source (24; 25) disposed in a vacuum chamber (22) for generating a plasma (26), from which charge carriers can be extracted, which can be applied to the surface of the substrate (21), wherein the substrate (21) is connected to the electric vacuum chamber mass (28), and a BIAS voltage is switched to accelerate the charge carriers on the substrate surface between the substrate (21) and the vacuum chamber mass (28), on one hand, and an electrode (25) close to a plasma potential in terms of voltage is switched, on the other hand.
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公开(公告)号：EP2795657A1
公开(公告)日：2014-10-29
申请号：EP12775662.5
申请日：2012-10-17
发明人： MORGNER, Henry , MATTAUSCH, Gösta , METZNER, Christoph , JUNGHÄHNEL, Michael , LABITZKE, Rainer , KLOSE, Lars , WERNER, Lars , KUBUSCH, Jörg
IPC分类号： H01J37/32
CPC分类号： H01J37/32568 , H01J37/32055 , H01J37/32064 , H01J37/32596 , H01J37/32669 , H01J37/32807 , H01J2237/0822 , H01J2237/152 , H01J2237/327 , H05H1/48
摘要： The invention relates to a device for generating a hollow cathode arc discharge plasma, consisting of two plasma sources (11; 12), each comprising a hollow cathode (13; 14) and an electrode (15; 16) that is associated with the hollow cathode (13; 14) and has an opening extending through the electrode (15; 16), wherein the hollow cathodes (13; 14) of the two plasma sources (11; 12) are connected to a pulse generator (17) that generates a bipolar, medium frequency pulsed voltage between the two hollow cathodes (13; 14). In both plasma sources (11; 12), the hollow cathode (13; 14) is connected in an electrically conductive manner to the associated electrode (15; 16), either directly or with the intercalation of at least one component (38; 39) that delimits the current direction.
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公开(公告)号：EP2087503B1
公开(公告)日：2013-12-11
申请号：EP07819513.8
申请日：2007-10-31
发明人： HEINSS, Jens-Peter , KIRCHHOFF, Volker , KLOSE, Lars , METZNER, Christoph , MORGNER, Henry , SCHEFFEL, Bert
CPC分类号： C23F4/00 , H01J37/32055 , H01J37/32596 , H01J37/32706
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公开(公告)号：EP2038912A1
公开(公告)日：2009-03-25
申请号：EP07764905.1
申请日：2007-06-28
发明人： MATTAUSCH, Gösta , FLASKE, Henrik , LIEBIG, Jörn-Steffen , KIRCHHOFF, Volker , HEINSS, Jens-Peter , KLOSE, Lars
IPC分类号： H01J37/147 , H01J37/305
CPC分类号： H01J37/3053 , C23C14/243 , C23C14/30 , H01J37/147 , H01J2237/3137
摘要： The invention relates to an apparatus for electron beam evaporation, comprising a vacuum work chamber (2), a axial emitter (6) for generating an electron beam (7) by which a material (5) to be evaporated can be heated, and a diaphragm (9) disposed between the material (5) and a substrate (3) to be coated, the diaphragm being provided with at least one steam aperture (10) through which material vapor can flow to the substrate (3), wherein the diaphragm (9) comprises a magnetic system (14), by which the electron beam (7) can be deflected through the steam aperture (10) onto the material (5) to be evaporated.
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