公开(公告)号：EP3331978A1

公开(公告)日：2018-06-13

申请号：EP16833562.8

申请日：2016-07-28

申请人： Fujifilm Electronic Materials USA, Inc.

发明人： SAKAMURI, Raj ,  DIMOV, Ognian N. ,  NAIINI, Ahmad A. ,  MALIK, Sanjay ,  DE, Binod B. ,  REINERTH, William A.

IPC分类号： C11D11/00 ,  C09G1/02 ,  C11D7/32 ,  C11D7/50 ,  H01L21/304

CPC分类号： C09G1/02 ,  C09D5/08 ,  C11D3/0073 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3281 ,  C11D7/50 ,  C11D7/5004 ,  C11D11/00 ,  C11D11/0047 ,  G03F7/027 ,  G03F7/2053 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02063 ,  H01L21/31133

摘要： This disclosure relates to a composition (e.g., a cleaning and/or stripping composition) containing (a) 0.5 - 25 percent by weight an alkaline compound; (b) 1 - 25 percent by weight an alcohol amine compound; (c) 0.1 - 20 percent by weight a hydroxylammonium compound; (d) 5 - 95 percent by weight an organic solvent; (e) 0.1 - 5 percent by weight a corrosion inhibitor compound; and (f) 2 -25 percent by weight water.

公开(公告)号：EP3417010A1

公开(公告)日：2018-12-26

申请号：EP17865691.4

申请日：2017-10-18

申请人： FujiFilm Electronic Materials USA, Inc.

发明人： DE, Binod B. ,  MALIK, Sanjay ,  REINERTH, William A. ,  DIMOV, Ognian N. ,  NAIINI, Ahmad A. ,  SAKAMURI, Raj

IPC分类号： C08L79/08 ,  C08G73/14 ,  C08J5/18 ,  H01L23/29

摘要： This disclosure relates to a polyimide polymer that includes the reaction product of: (a) at least one diamine selected from the group consisting of a diamine of Structure (Ia) and a diamine of Structure (Ib), [insert formula here](la) or [insert formula here] (lb), (b) at least one diamine of Structure (II), (c) at least one tetracarboxylic acid dianhydride, and optionally (d) at least one compound containing a first functional group reactive with an amine or an anhydride and at least a second functional group selected from the group consisting of a substituted or unsubstituted alkenyl group and a substituted or unsubstituted alkynyl group. Each variable in the above formulas is defined in the specification.