Inorganic block copolymers.
    1.
    发明公开
    Inorganic block copolymers. 无效
    无机物块状聚糖

    公开(公告)号:EP1783149A1

    公开(公告)日:2007-05-09

    申请号:EP06255642.8

    申请日:2006-11-02

    摘要: The present invention is generally directed to methods of making ceramics with nanoscale/microscale structure involving self-assembly of precursor materials such as, but not limited to, inorganic-based block co-polymers, inorganic-/organic-based hybrid block co-polymers, and other similar materials, and to the structures made by such methods. Where such precursor materials are themselves novel, the present invention is also generally directed to those materials and their synthesis.

    摘要翻译: 本发明一般涉及制造具有纳米尺度/微观结构的陶瓷的方法,其涉及前体材料的自组装,例如但不限于无机基嵌段共聚物,基于无机/有机的杂化嵌段共聚物 ,和其他类似的材料,以及由这些方法制成的结构。 当这些前体材料本身是新颖的时,本发明也通常涉及这些材料及其合成。

    ARTICLES WITH ENHANCED TEMPERATURE CAPABILITY
    2.
    发明公开
    ARTICLES WITH ENHANCED TEMPERATURE CAPABILITY 审中-公开
    ARTIKEL MIT VERBESSERTERTEMPERATURBESTÄNDIGKEIT

    公开(公告)号:EP3153487A1

    公开(公告)日:2017-04-12

    申请号:EP16192218.2

    申请日:2016-10-04

    摘要: The disclosure provides for an article (10) including a substrate (12), an environmental barrier coating (EBC) (16), a bondcoat (14), and a boron source (20). The substrate (12) includes a silicon-including material. The EBC (16) is disposed over the substrate (12), and the bondcoat (14) is disposed between the substrate (12) and the EBC (16). The bondcoat (14) includes silicon. The boron source (20) is disposed within the article (10) to provide an effective amount of boron to form an oxide (18) including silicon and at least 0.1 weight percent boron during exposure of the bondcoat (14) to an oxidizing environment at a temperature greater than 900 degrees Celsius. The oxide (18) may be a borosilicate glass that is substantially devitrification resistant to prevent spallation of the EBC (16) and thereby enhance the temperature capability of the article (10).

    摘要翻译: 本公开提供了一种包括基底(12),环境阻挡涂层(EBC)(16),粘合涂层(14)和硼源(20)的物品(10)。 基板(12)包括含硅材料。 EBC(16)设置在基板(12)上方,并且粘合涂层(14)设置在基板(12)和EBC(16)之间。 键合涂层(14)包括硅。 硼源(20)设置在制品(10)内以提供有效量的硼以在粘合涂层(14)暴露于氧化环境期间形成包含硅和至少0.1重量%的硼的氧化物(18) 温度大于900摄氏度。 氧化物(18)可以是基本上防透光以防止EBC(16)剥落的硼硅酸盐玻璃,从而提高制品(10)的温度能力。