公开(公告)号：EP1936673A4

公开(公告)日：2011-01-05

申请号：EP06811509

申请日：2006-10-10

申请人： HITACHI CHEMICAL CO LTD

发明人： SHINODA TAKASHI ,  NOBE SHIGERU ,  SAKURADA TAKAFUMI ,  OOMORI YOSHIKAZU ,  KIMURA TADAHIRO

IPC分类号： H01L21/321 ,  B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304

CPC分类号： C09G1/02 ,  C23F3/04 ,  H01L21/30625 ,  H01L21/31055 ,  H01L21/3212 ,  H01L21/32125 ,  H01L21/7684 ,  H01L21/76865

摘要： The invention provides polishing slurry for CMP for suppressing corrosion of wiring lines of a conductive substance, or for suppressing bimetallic corrosion of a barrier conductor and conductive substance, by suppressing electrons from being transferred at near the boundaries between a barrier conductor and a conductive substance such as copper. The invention provides polishing slurry for CMP for polishing at least a conductor layer and a conductive substance layer in contact with the conductor layer, wherein the absolute value of the potential difference between the conductive substance and the conductor at 50 ± 5°C is 0.25 V or less in the polishing slurry when a positive electrode and a negative electrode of a potentiometer are connected to the conductive substance and the conductor, respectively. The polishing slurry for CMP preferably comprises at least one compound selected from heterocyclic compounds containing any one of hydroxyl group, carbonyl group, carboxyl group, amino group, amide group and sulfinyl group, and containing at least one of nitrogen and sulfur atoms.