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公开(公告)号:EP0106050A1
公开(公告)日:1984-04-25
申请号:EP83107850.6
申请日:1983-08-09
申请人: HITACHI, LTD.
发明人: Yamada, Kazuji , Sato, Hideo , Kato, Kazuo , Sasayama, Takao , Kawakami, Kanji , Kanzawa, Ryosaku
CPC分类号: G01L9/0054 , G01L9/065 , Y10S323/907
摘要: @ A pressure transducer is disclosed comprising a pressure sensor portion having gage resistors (2, 3, 4, 5) in bridge formed on a thin diaphragm (54) of a semiconductor substrate (50), and a power supply connected to the pressure sensor portion for driving the pressure sensor. The power supply includes a first current source (Q 1 , Q 2 , R 3 , R 4 , 19) for supplying a temperature-dependent current equivalent to the sum of a current almost proportional to the absolute temperature and a current independent of temperature, and a second current source (20, R s , R e , Q 3 ) for sinking the current almost proportional to the temperature characteristic of the gage resistors from the current of the first current source. A temperature compensation circuit is additionally provided to drive the bridge circuit by the difference between the temperature-dependent current and the current proportional to the temperature characteristic when in constant- current driving mode, and by a voltage proportional to the current difference when in constant-voltage driving mode.
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公开(公告)号:EP0127176A2
公开(公告)日:1984-12-05
申请号:EP84106127.8
申请日:1984-05-29
申请人: HITACHI, LTD.
发明人: Yamada, Kazuji , Kobori, Shigeyuki , Shimada, Satoshi , Kanzawa, Ryosaku , Kobayashi, Ryoichi , Sato, Hideo
IPC分类号: G01L9/06
CPC分类号: H01L29/84 , G01L9/0054
摘要: In an integrated pressure sensor, a silicon chip (10) for pressure detection and a substrate (22) for supporting the silicon chip are made of the same material, the silicon chip (10) has a thin diaphragm portion (14) and a peripheral fixed portion (12) thicker than the diaphragm portion (14), and the silicon chip (10) is bonded to the substrate (22) through a thin insulating film (20).
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公开(公告)号:EP0010204B1
公开(公告)日:1983-07-13
申请号:EP79103666.8
申请日:1979-09-27
申请人: Hitachi, Ltd.
发明人: Yamada, Kazuji , Suzuki, Seiko , Nishihara, Motohisa , Kawakami, Kanji , Sato, Hideo , Kobori, Shigeyuki , Kanzawa, Ryosaku , Takahashi, Minoru , Minorikawa, Hitoshi
CPC分类号: G01L9/0042 , G01L9/0054
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公开(公告)号:EP0106050B1
公开(公告)日:1987-09-02
申请号:EP83107850.6
申请日:1983-08-09
申请人: HITACHI, LTD.
发明人: Yamada, Kazuji , Sato, Hideo , Kato, Kazuo , Sasayama, Takao , Kawakami, Kanji , Kanzawa, Ryosaku
CPC分类号: G01L9/0054 , G01L9/065 , Y10S323/907
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公开(公告)号:EP0010204B2
公开(公告)日:1986-07-16
申请号:EP79103666.8
申请日:1979-09-27
申请人: Hitachi, Ltd.
发明人: Yamada, Kazuji , Suzuki, Seiko , Nishihara, Motohisa , Kawakami, Kanji , Sato, Hideo , Kobori, Shigeyuki , Kanzawa, Ryosaku , Takahashi, Minoru , Minorikawa, Hitoshi
CPC分类号: G01L9/0042 , G01L9/0054
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公开(公告)号:EP0127176A3
公开(公告)日:1986-02-19
申请号:EP84106127
申请日:1984-05-29
申请人: HITACHI, LTD.
发明人: Yamada, Kazuji , Kobori, Shigeyuki , Shimada, Satoshi , Kanzawa, Ryosaku , Kobayashi, Ryoichi , Sato, Hideo
IPC分类号: G01L09/06
CPC分类号: H01L29/84 , G01L9/0054
摘要: In an integrated pressure sensor, a silicon chip (10) for pressure detection and a substrate (22) for supporting the silicon chip are made of the same material, the silicon chip (10) has a thin diaphragm portion (14) and a peripheral fixed portion (12) thicker than the diaphragm portion (14), and the silicon chip (10) is bonded to the substrate (22) through a thin insulating film (20).
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公开(公告)号:EP0010204A1
公开(公告)日:1980-04-30
申请号:EP79103666.8
申请日:1979-09-27
申请人: Hitachi, Ltd.
发明人: Yamada, Kazuji , Suzuki, Seiko , Nishihara, Motohisa , Kawakami, Kanji , Sato, Hideo , Kobori, Shigeyuki , Kanzawa, Ryosaku , Takahashi, Minoru , Minorikawa, Hitoshi
CPC分类号: G01L9/0042 , G01L9/0054
摘要: A semiconductor pressure transducer assembly comprising a silicon diaphragm assembly (20) and a glass covering member (10). The assembly (20) has a circular diaphragm portion (30) of thin silicon which is formed using etching, and a thick supporting portion (33) therearound. Piezoresistive elements (22, 24) of a piezoresistive bridge circuit and conducting paths (27) for electrically connection thereof are formed on the assembly (20). On a surface of the assembly (20), a passivating layer (31) of silicon dioxide is formed in uniform thickness, and further on a surface of the passivating layer (31) is formed a layer (34) of polysilicon on the supporting portion (33) of the assembly (20) using Ion Implantation method, or reforming a silicon dioxide layer (31) thereon. In the passivating layer (31), a contacting window (32) is formed, through which the polysilicon layer (34) is electrically connected to the silicon diaphragm assembly (20). The covering member (10) of borosilicate glass having a circular well (11) is mounted and Anodic-bonded onto the silicon diaphragm assembly (20) in contact with the'polysilicon layer (34).
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