利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

16 条记录 (耗时 0.013 秒)

    Photoacoustic signal detecting device
    1.
    发明公开
    Photoacoustic signal detecting device 失效
    光电信号检测装置

    公开(公告)号：EP0352789A3

    公开(公告)日：1991-05-15

    申请号：EP89113875.2

    申请日：1989-07-27

    申请人： HITACHI, LTD.

    发明人： Nakata, Toshihiko ,  Kembo, Yukio

    IPC分类号： G01N21/17 ,  G01N29/00

    CPC分类号： G01N21/1702 ,  G01N2021/1782

    摘要： A photoacoustic signal detecting device irradiates a modulated light on a sample (170) using focusing means (300, 400), detects a photoacoustic signal created in the sample using light interference detection means (310, 410) and finally displays the information relative to the surface and inside of the sample. The focusing means (300, 400) and light interference detection means (310, 410) are constructed in a confocal optical system, respectively, and a pin-­hole(s) is used to remove unnecessary high order dif­fraction light components around the light spot of the modulated light so that the photoacoustic signal can be detected with a high accuracy. Further, an auto-­focusing function (330, 430) is added to the photoacoustic signal detection so that the photoacoustic signal can be detected with a high accuracy also for a sample with rugged surface.

    Alignment method for reduction projection type aligner
    3.
    发明公开
    Alignment method for reduction projection type aligner 失效
    用于Ausrichtprojektor还原类型的调整过程。

    公开(公告)号：EP0182251A1

    公开(公告)日：1986-05-28

    申请号：EP85114364.4

    申请日：1985-11-12

    申请人： HITACHI, LTD.

    发明人： Nakata, Toshihiko ,  Shiba, Masataka ,  Oshida, Yoshitada ,  Uto, Sachio ,  Yoshizaki, Atsuhiro

    IPC分类号： H01L21/68 ,  G03F9/00 ,  G03B27/53 ,  G02B27/00

    CPC分类号： G03F9/7076

    摘要： An alignment method for reduction projection type aligner is disclosed in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle (1) and the fine detection of reticle position in the wafer alignment for the alignment between a wafer (3) and the reticle (1) are performed automatically by the same reticle alignment pattern (18) and the same optical alignment detection system (38). A plurality of one- or two-dimensional Fresnel zone plates (19, 20) having different shapes of diffraction patterns formed outside of a reticle circuit pattern (16) and arranged at a position outward of the entrance pupil (2') of the reduction projection lens (2) are used as a a reticle alignment pattern (18) to detect the absolute position of the reticle (1). The detection field of view of the optical alignment detection system (38) is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern (18) and the same optical alignment detection system (38) are used for rough detection of reticle position in reticle alignment and fine detection of reti- cie position in wafer alignment. In the optical alignment detection system (38), on the other hand, the image position of the diffraction pattern (39a to 39c) from the reticle alignment pattern (18) and the image position of the wafer alignment pattern (14) are located at the same distance from the recticle surface.

    Exposure apparatus and method of aligning exposure mask with workpiece
    6.
    发明公开
    Exposure apparatus and method of aligning exposure mask with workpiece 失效
    一种曝光装置，和与工件对准的掩模的方法。

    公开(公告)号：EP0148477A2

    公开(公告)日：1985-07-17

    申请号：EP84115889.2

    申请日：1984-12-20

    申请人： HITACHI, LTD.

    发明人： Oshida, Yoshitada ,  Shiba, Masataka ,  Nakata, Toshihiko ,  Koizumi, Mitsuyoshi ,  Nakashima, Naoto

    IPC分类号： G03B41/00

    CPC分类号： G03F9/7049

    摘要： An exposure apparatus comprises a light source (4), a mask plate (1) having an exposure pattern area section (11) and an alignment/reflection area section (30; 60), a projection lens (3), a movable stage (7) for holding a workpiece (2) having a workpiece alignment mark (22,22'), an alignment control (5, 80) and a driver for the movable stage. Before the exposure pattern area section (11) is illuminated by the light source (4) to be projected through the projection lens (3) onto the workpiece (2), the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section (30; 60) is on that surface of the mask plate (1) which does not face the light source (4) and includes a reflection portion for conducting light from another light source (503; 521-524; 51"; 90) to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion for providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.

    Method and apparatus for detecting photoacoustic signal
    7.
    发明公开
    Method and apparatus for detecting photoacoustic signal 失效
    用于检测光电信号的方法和装置

    公开(公告)号：EP0413330A3

    公开(公告)日：1992-10-14

    申请号：EP90115692.7

    申请日：1990-08-16

    申请人： HITACHI, LTD.

    发明人： Nakata, Toshihiko ,  Kembo, Yukio ,  Sawada, Tsuguo ,  Kitamori, Takehiko

    IPC分类号： G01N21/17 ,  G01N21/88 ,  G01N29/00 ,  G02B21/00

    CPC分类号： G01N21/88 ,  G01N21/1702 ,  G01N2021/1765

    摘要： Disclosed is a photoacoustic signal detecting apparatus and method. The photoacoustic signal detecting apparatus comprises a laser (31) emitting a laser beam, modulating means (32) for intensity-modulating the laser beam emitted from the laser to provide an intensity-modu­lated laser beam having a desired frequency, focusing means (39) for focusing the intensity-modulated laser beam on a sample (7) thereby inducing a photoacoustic effect inside the sample, detecting means (140) for detecting the photoacoustic effect in two-dimensional directions of the sample, composing means (160) for composing a two-dimensi­onal photoacoustic image on the basis of the detected photoacoustic effect, information extracting means (160) for extracting surface and internal information of the sample from the two-dimensional photoacoustic image, scanning means (140) for two-dimensionally scanning the laser beam from the sample or the laser, computing means (68) for computing a thermal impulse response of the sample, computing means (68) for computing, on the basis of the thermal impulse response, an inverse filtering fac­tor for compensating degradation of the resolution of the photoacoustic image, and means (68) for applying the com­puted inverse filtering factor to the detected photoacou­stic image.

    Exposure apparatus and method of aligning exposure mask with workpiece
    9.
    发明公开
    Exposure apparatus and method of aligning exposure mask with workpiece 失效
    曝光装置和工作接触掩模的方法

    公开(公告)号：EP0148477A3

    公开(公告)日：1985-09-04

    申请号：EP84115889

    申请日：1984-12-20

    申请人： HITACHI, LTD.

    发明人： Oshida, Yoshitada ,  Shiba, Masataka ,  Nakata, Toshihiko ,  Koizumi, Mitsuyoshi ,  Nakashima, Naoto

    IPC分类号： G03B41/00

    CPC分类号： G03F9/7049

    摘要： An exposure apparatus comprises a light source (4), a mask plate (1) having an exposure pattern area section (11) and an alignment/reflection area section (30; 60), a projection lens (3), a movable stage (7) for holding a workpiece (2) having a workpiece alignment mark (22,22'), an alignment control (5, 80) and a driver for the movable stage. Before the exposure pattern area section (11) is illuminated by the light source (4) to be projected through the projection lens (3) onto the workpiece (2), the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section (30; 60) is on that surface of the mask plate (1) which does not face the light source (4) and includes a reflection portion for conducting light from another light source (503; 521-524; 51"; 90) to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion for providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.