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公开(公告)号：EP0352789A3
公开(公告)日：1991-05-15
申请号：EP89113875.2
申请日：1989-07-27
申请人： HITACHI, LTD.
发明人： Nakata, Toshihiko , Kembo, Yukio
CPC分类号： G01N21/1702 , G01N2021/1782
摘要： A photoacoustic signal detecting device irradiates a modulated light on a sample (170) using focusing means (300, 400), detects a photoacoustic signal created in the sample using light interference detection means (310, 410) and finally displays the information relative to the surface and inside of the sample. The focusing means (300, 400) and light interference detection means (310, 410) are constructed in a confocal optical system, respectively, and a pin-hole(s) is used to remove unnecessary high order diffraction light components around the light spot of the modulated light so that the photoacoustic signal can be detected with a high accuracy. Further, an auto-focusing function (330, 430) is added to the photoacoustic signal detection so that the photoacoustic signal can be detected with a high accuracy also for a sample with rugged surface.
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公开(公告)号：EP0178660A3
公开(公告)日：1988-04-20
申请号：EP85113171
申请日：1985-10-17
申请人： HITACHI, LTD.
IPC分类号： G03F07/20
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber (5) supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer (11), the apparatus comprising detecting means (13) for detecting the gas or components mixed in the gas in the low attenuation chamber, control means (14, 15, 16) for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means (21, 3) for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
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公开(公告)号：EP0413330A3
公开(公告)日：1992-10-14
申请号：EP90115692.7
申请日：1990-08-16
申请人： HITACHI, LTD.
CPC分类号： G01N21/88 , G01N21/1702 , G01N2021/1765
摘要： Disclosed is a photoacoustic signal detecting apparatus and method. The photoacoustic signal detecting apparatus comprises a laser (31) emitting a laser beam, modulating means (32) for intensity-modulating the laser beam emitted from the laser to provide an intensity-modulated laser beam having a desired frequency, focusing means (39) for focusing the intensity-modulated laser beam on a sample (7) thereby inducing a photoacoustic effect inside the sample, detecting means (140) for detecting the photoacoustic effect in two-dimensional directions of the sample, composing means (160) for composing a two-dimensional photoacoustic image on the basis of the detected photoacoustic effect, information extracting means (160) for extracting surface and internal information of the sample from the two-dimensional photoacoustic image, scanning means (140) for two-dimensionally scanning the laser beam from the sample or the laser, computing means (68) for computing a thermal impulse response of the sample, computing means (68) for computing, on the basis of the thermal impulse response, an inverse filtering factor for compensating degradation of the resolution of the photoacoustic image, and means (68) for applying the computed inverse filtering factor to the detected photoacoustic image.
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公开(公告)号：EP0179438A2
公开(公告)日：1986-04-30
申请号：EP85113379.3
申请日：1985-10-22
申请人： HITACHI, LTD.
发明人： Komeyama, Yoshihiro , Kembo, Yukio , Kuni, Asahiro , Funatsu, Ryuuichi Higashi-no-machi , Inagaki, Akira Sun Palace Shimonagaya 503 , Ikeda, Minoru , Okamoto, Keiichi
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
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公开(公告)号：EP0178660A2
公开(公告)日：1986-04-23
申请号：EP85113171.4
申请日：1985-10-17
申请人： HITACHI, LTD.
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber (5) supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer (11), the apparatus comprising detecting means (13) for detecting the gas or components mixed in the gas in the low attenuation chamber, control means (14, 15, 16) for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means (21, 3) for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
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公开(公告)号：EP0413330B1
公开(公告)日：1995-11-02
申请号：EP90115692.7
申请日：1990-08-16
申请人： HITACHI, LTD.
CPC分类号： G01N21/88 , G01N21/1702 , G01N2021/1765
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公开(公告)号：EP0178660B1
公开(公告)日：1990-09-12
申请号：EP85113171.4
申请日：1985-10-17
申请人： HITACHI, LTD.
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
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公开(公告)号：EP0220571B1
公开(公告)日：1990-06-13
申请号：EP86114040.8
申请日：1986-10-10
申请人： HITACHI, LTD.
发明人： Inagaki, Akira , Kembo, Yukio , Funatsu, Ryuichi , Kuni, Asahiro , Okamoto, Keiichi , Komeyama, Yoshihiro
IPC分类号： H01L21/68 , H01L21/308 , G03F9/00 , G03B41/00
CPC分类号： G03F9/70
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公开(公告)号：EP0077878A1
公开(公告)日：1983-05-04
申请号：EP82105096.0
申请日：1982-06-11
申请人： Hitachi, Ltd.
IPC分类号： G03B41/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask (10) pattern (9) onto a wafer (11) with use of X ray, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height masuring device (16) of non-contact measurement type at an X ray exposure position (13), said mask being mounted on a chamber (61) which is filled with a He gas and the like to prevent attenuation of an X ray source (14), heights on the wafer at many points are measured at a wafer-height measuring position defferent from said exposure position, and according to the measured results, the water is finely moved upward or downward (that is, deformed) individually independently by means of a chuck (22) which sucks and holds the wafer at many points thereon, whereby a gap (S') between the mask and wafer is adjusted to a desired level (S).
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10.发明公开Method and apparatus for detecting photoacoustic signal 失效Verfahren undGerätzur Erfassung eines photoakustischen信号。
公开(公告)号：EP0413330A2
公开(公告)日：1991-02-20
申请号：EP90115692.7
申请日：1990-08-16
申请人： HITACHI, LTD.
CPC分类号： G01N21/88 , G01N21/1702 , G01N2021/1765
摘要： Disclosed is a photoacoustic signal detecting apparatus and method. The photoacoustic signal detecting apparatus comprises a laser (31) emitting a laser beam, modulating means (32) for intensity-modulating the laser beam emitted from the laser to provide an intensity-modulated laser beam having a desired frequency, focusing means (39) for focusing the intensity-modulated laser beam on a sample (7) thereby inducing a photoacoustic effect inside the sample, detecting means (140) for detecting the photoacoustic effect in two-dimensional directions of the sample, composing means (160) for composing a two-dimensional photoacoustic image on the basis of the detected photoacoustic effect, information extracting means (160) for extracting surface and internal information of the sample from the two-dimensional photoacoustic image, scanning means (140) for two-dimensionally scanning the laser beam from the sample or the laser, computing means (68) for computing a thermal impulse response of the sample, computing means (68) for computing, on the basis of the thermal impulse response, an inverse filtering factor for compensating degradation of the resolution of the photoacoustic image, and means (68) for applying the computed inverse filtering factor to the detected photoacoustic image.
摘要翻译： 公开了一种光声信号检测装置及方法。 光声信号检测装置包括发射激光束的激光器（31），用于强度调制从激光器发射的激光束的调制装置（32），以提供具有期望频率的强度调制激光束，聚焦装置（39） 用于将强度调制的激光束聚焦在样品（7）上，从而在样品内引起光声效应，用于检测样品的二维方向的光声效应的检测装置（140），用于构成样品 基于检测到的光声效应的二维光声图像，用于从二维光声图像提取样品的表面和内部信息的信息提取装置（160），用于二维扫描激光束的扫描装置（140） 来自样本或激光器的计算装置（68），用于计算样本的热脉冲响应;计算装置（68），用于基于所述样本 误差脉冲响应，用于补偿光声图像的分辨率劣化的逆滤波因子，以及用于将所计算的逆滤波因子应用于检测到的光声图像的装置（68）。
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