Patent search ap:("IBM") AND inv:"SHOBHA HOSADURGA K" Page 1

1.

发明公开
DIELECTRIC CAP HAVING MATERIAL WITH OPTICAL BAND GAP TO SUBSTANTIALLY BLOCK UV RADIATION DURING CURING TREATMENT, AND RELATED METHODS 审中-公开
Title translation: 与光学带隙的材料的介电CLOSURE基本上LOCKED对UV辐射硬化及相关过程期间

公开(公告)号：EP2111637A4

公开(公告)日：2012-08-08

申请号：EP08728172

申请日：2008-01-24

Applicant: IBM

Inventor： BELYANSKY MICHAEL P , BONILLA GRISELDA , LIU XIAO HU , NGUYEN SON VAN , SHAW THOMAS M , SHOBHA HOSADURGA K , YANG DAEWON

IPC: H01L23/12 , H01L21/3105 , H01L21/318 , H01L21/768

CPC classification number: H01L21/02123 , H01L21/02126 , H01L21/02167 , H01L21/0217 , H01L21/02274 , H01L21/02348 , H01L21/318 , H01L21/3185 , H01L21/76826 , H01L21/76828 , H01L21/76834

Patent Agency Ranking