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    METAL PRODUCT PRODUCING METHOD, METAL PRODUCT, METAL COMPONENT CONNECTING METHOD, AND CONNECTION STRUCTURE
    3.
    发明公开
    METAL PRODUCT PRODUCING METHOD, METAL PRODUCT, METAL COMPONENT CONNECTING METHOD, AND CONNECTION STRUCTURE 有权
    METALLPRODUKTHERSTELLUNGSVERFAHREN，METALLPRODUKT，METALLBAUTEILVERBINDUNGSVERFAHREN UND VERBINDUNGSSTRUKTUR

    公开(公告)号：EP1659196A1

    公开(公告)日：2006-05-24

    申请号：EP04745806.2

    申请日：2004-06-11

    申请人： Ishikawajima-Harima Heavy Industries Co., Ltd. ,  MITSUBISHI DENKI KABUSHIKI KAISHA

    发明人： OCHIAI, Hiroyuki ,  WATANABE, Mitsutoshi ,  URABE, Tatsuto ,  GOTO, Akihiro ,  AKIYOSHI, Masao

    IPC分类号： C23C26/00 ,  B22D29/00 ,  B23H5/00 ,  C21D9/50

    CPC分类号： B23K28/00 ,  B23H1/00 ,  B23H1/06 ,  B23H9/001 ,  B23P6/007 ,  C23C26/00 ,  Y10T403/479

    摘要： A deposition is gradually formed by molding a product main body, removing a defect periphery including a defect generated on a surface to be treated of the product main body by molding so that a recess portion is formed on the surface to be treated of the product main body, employing a molded electrode composed of a molded body molded from a powder of a metal or the molded body processed with a heat treatment, and generating a pulsing electric discharge between the recess portion periphery including the recess portion and the molded electrode in an electrically insulating liquid or gas so that a material of the molded electrode or a reaction substance of the material carries out deposition and such at the recess portion periphery by energy of the electric discharge.

    摘要翻译： 通过模制产品主体逐渐形成沉积物，通过模制去除包括在产品主体的待处理表面上产生的缺陷的缺陷周边，使得在产品主体的被处理表面上形成凹部 使用由金属粉末成型的成型体或通过热处理加工的成型体构成的模制电极，并且在包括凹部的凹部周边和成型电极之间以电气方式产生脉冲放电 绝缘液体或气体，使得模制电极的材料或材料的反应物质通过放电能量在凹部周边进行沉积。

    ELECTRIC DISCHARGE SURFACE TREATING METHOD AND ELECTRIC DISCHARGE SURFACE TREATING APPARATUS
    5.
    发明公开
    ELECTRIC DISCHARGE SURFACE TREATING METHOD AND ELECTRIC DISCHARGE SURFACE TREATING APPARATUS 审中-公开
    电击和表面处理设备符合放电表面处理工艺

    公开(公告)号：EP1953265A1

    公开(公告)日：2008-08-06

    申请号：EP05809133.1

    申请日：2005-11-25

    申请人： MITSUBISHI DENKI KABUSHIKI KAISHA ,  Ishikawajima-Harima Heavy Industries Co., Ltd.

    发明人： GOTO, Akihiro ,  AKIYOSHI, Masao ,  NAKAMURA, Kazushi ,  FURUKAWA, Takashi ,  OCHIAI, Hiroyuki ,  WATANABE, Mitsutoshi

    IPC分类号： C23C26/00

    CPC分类号： C23C26/02 ,  B23H9/008 ,  B23H9/10

    摘要： It is an object of the present invention to obtain a discharge surface-treatment method and a discharge surface-treatment apparatus that are capable of performing treatment for forming a dense and relatively thick film. When a voltage is applied to the inter-electrode gap between a discharge electrode 21 and a workpiece 22 from a first power supply 23 and electric discharge occurs, a voltage for feeding a second discharge current of a current value higher than that of a first discharge current generated by the first power supply 23 is applied to the inter-electrode gap from a second power supply 28 for a short period to be superimposed on the first discharge current. Consequently, a discharge pulse current of a high current value and a short pulse width at least having rising speed equal to or higher than 40 A/µs flows to the inter-electrode gap. As a result, it is possible to melt only a necessary portion of an electrode material in a short time and include, at a high ratio, the electrode material melted in an electrode material moved to a workpiece side by thermal energy of electric discharge or a substance formed by combination of the electrode material. This makes it possible to form a film made of melted metal on a workpiece surface.

    摘要翻译： 它是本发明以获得放电表面处理方法及放电表面处理装置做的目的是能够提供用于形成致密和相对厚的膜进行处理的。 当一个电压被施加到电极间间隙的放电电极21和从第一电源23和放电的发生时，用于供给比第一排出的高的电流值的第二放电电流的电压的工件22之间 由第一电源23所产生的电流被施加到电极间的间隙从第二电源28，用于在所述第一放电电流进行叠加一个短的时间。 因此，至少具有上升速度等于或高于40甲高电流值的放电脉冲电流和一个短脉冲宽度/我们流到电极间的间隙。 其结果，有可能以熔化只的电极材料的一个必要部分在很短的时间，并且包括以高比率，电极材料熔化在通过放电或热能量到电极移动至工件侧的材料 物质由电极材料的组合来形成。 这使得可以形成在工件上表面制成熔融金属的膜。

    SEAL STRUCTURE OF FLUID DEVICE
    9.
    发明公开
    SEAL STRUCTURE OF FLUID DEVICE 有权
    DICHTUNGSSTRUKTURFÜREINEFLÜSSIGKEITSVORRICHTUNG

    公开(公告)号：EP2500606A1

    公开(公告)日：2012-09-19

    申请号：EP10830011.2

    申请日：2010-11-12

    申请人： IHI Corporation

    发明人： TABATA, Hifumi ,  YUNOKI, Nobuhiko ,  WATANABE, Mitsutoshi ,  OCHIAI, Hiroyuki ,  HOSOI, Eiji

    IPC分类号： F16J15/32 ,  F15B15/14

    CPC分类号： F16J15/324 ,  B29D99/0053 ,  B29L2031/26 ,  C23C4/12 ,  C23C4/18 ,  C23C26/00 ,  F15B15/1461 ,  F15B2215/305 ,  F16J15/162 ,  F16J15/328 ,  Y10T29/49281 ,  Y10T29/49297

    摘要： Disclosed is a seal structure of a fluid device (1), the seal structure comprising: a first member (2) defining a hollow internal area (1a) of the fluid device (1); a second member (3) defining the internal area (1a) together with the first member (2) and being movable relative to the first member (2); and a seal member (4) fixed to the first member (2) and configured to seal a gap between the first member (2) and the second member (3). The seal member (4) includes a sliding contact member (4a) being in sliding contact with a surface (3a) of the second member (3) and formed of a resin. The second member (3) includes a resin layer (5) and a resin layer holding structure (6), the resin layer (5) being formed by sliding the second member (3) on the sliding contact member (4a) to transfer the resin forming the sliding contact member (4a) onto a sliding contact portion (3b) of the surface (3a) of the second member (3) at which the second member (3) comes into contact with the sliding contact member (4a), the resin layer holding structure (6) being configured to hold the resin layer (5) in the sliding contact portion (3b). In addition, the resin layer holding structure (6) is a porous film formed by electric discharge surface treatment.

    摘要翻译： 公开了一种流体装置（1）的密封结构，所述密封结构包括：限定所述流体装置（1）的中空内部区域（1a）的第一构件（2） 与第一构件（2）一起限定内部区域（1a）并且可相对于第一构件（2）移动的第二构件（3）; 以及固定到所述第一构件（2）并被构造成密封所述第一构件（2）和所述第二构件（3）之间的间隙的密封构件（4）。 密封构件（4）包括与第二构件（3）的表面（3a）滑动接触并由树脂形成的滑动接触构件（4a）。 第二构件（3）包括树脂层（5）和树脂层保持结构（6），树脂层（5）通过将滑动接触构件（4a）上的第二构件（3）滑动而形成， 在第二构件（3）的与滑动接触构件（4a）接触的第二构件（3）的表面（3a）的滑动接触部分（3b）上形成滑动接触构件（4a）的树脂， 树脂层保持结构（6）被构造成将树脂层（5）保持在滑动接触部分（3b）中。 此外，树脂层保持结构（6）是通过放电表面处理形成的多孔膜。