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公开(公告)号：EP2877864A2
公开(公告)日：2015-06-03
申请号：EP13774616.0
申请日：2013-07-24
申请人： Impedans Ltd
发明人： SCULLIN, Paul , HOPKINS, Michael
CPC分类号： G01R23/20 , H01J37/32082 , H01J37/32972
摘要： Samples representing signals and noise from a plasma system across a frequency range are collected. A first complex frequency-domain signal component is identified from a sample corresponding to a frequency value F at which a local maximum signal is found. This first component is phase-adjusted by a variable angle θ to a predetermined phase angle φ, and stored. A further complex component is identified corresponding to a frequency F(N) representing an Nth order harmonic of F. This further component is phase-adjusted by an angle N x θ, and stored. The procedure is repeated to build up sets of phase-adjusted first and further components, with θ chosen in each iteration for the first component to give a constant phase angle φ, and within any iteration the value of θ used for the first component is employed in the adjustment of the further component. The aggregated, phase-adjusted components exhibit increased signal-to-noise.
摘要翻译： 收集表示频率范围内等离子体系统的信号和噪声的样本。 从对应于找到局部最大信号的频率值F的样本识别出第一复数频域信号分量。 该第一个组件通过可变角度＆amp; 到预定的相位角度并存储。 对应于表示F的N次谐波的频率F（N）来识别另一个复杂分量。该另外的分量被相位调整了N×＆amp;角度并被存储。 重复该过程以建立一组相位调整的第一和另外的组件，并具有; 在每个迭代中选择第一个组件以给出一个恒定的相位角＆phgr，并且在任何迭代中的值为＆amp; 用于第一组分的调整用于进一步的组分。 聚合的，相位调整的组件表现出增加的信噪比。
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公开(公告)号：EP4020521A1
公开(公告)日：2022-06-29
申请号：EP21216201.0
申请日：2021-12-21
申请人： Impedans Ltd
发明人： SCULLIN, Paul , HOPKINS, Michael , LENNON, JJ , GILMORE, Thomas
IPC分类号： H01J37/32
摘要： The present teachings relate to a sensing device for monitoring electromagnetic radiation emanating from a plasma processing system comprising at least two of (i) a first probe for detecting a time varying RF electric field, (ii) a second probe for detecting a time varying RF magnetic field, and (iii) an optical probe for detecting the modulated light emission; and the sensing device further comprising a signal processing unit configured to receive a signal from each probe and to monitor the electromagnetic radiation with respect to only a single frequency of each signal.
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公开(公告)号：EP4376050A1
公开(公告)日：2024-05-29
申请号：EP22209525.9
申请日：2022-11-25
申请人： Impedans Ltd
发明人： GAHAN, David , SCULLIN, Paul
CPC分类号： H01J37/32422 , H01J37/32935 , H01J37/32917
摘要： An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising a substrate, an ion energy sensor and associated control circuitry disposed in the substrate, and a conductive enclosure disposed in the substrate and surrounding the ion energy sensor and control circuitry such that the substrate at least partially surrounds the conductive enclosure.
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公开(公告)号：EP4293700A2
公开(公告)日：2023-12-20
申请号：EP23201341.7
申请日：2021-08-30
申请人： Impedans Ltd
发明人： SCULLIN, Paul , DOYLE, James , LENNON, JJ , GAHAN, David , POGHOSYAN, Tigran
IPC分类号： H01J37/244
摘要： An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system comprising a substrate for placement in the plasma processing system and exposed to the plasma, an ion energy analyser disposed in the substrate for measuring the ion energy distribution at the substrate surface during plasma processing, the analyser comprising a first conductive grid, G 0 , a second conductive grid, G 1 , a third conductive grid, G 2 , a fourth conductive grid G 3 , and a collection electrode, C, each grid separated by an insulating layer, a battery power supply and a battery manager integrated in the substrate, for supplying and controlling voltage to each of the grids and the collector of the ion energy analyser, and a high voltage generating circuit within the substrate, wherein the high voltage generating circuit takes the output voltage of the battery manager and supplies a voltage sweep to the third conductive grid.
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公开(公告)号：EP3968354A1
公开(公告)日：2022-03-16
申请号：EP21193805.5
申请日：2021-08-30
申请人： Impedans Ltd
发明人： SCULLIN, Paul , DOYLE, James , LENNON, JJ , GAHAN, David , POGHOSYAN, Tigran
摘要： An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system comprising a substrate for placement in the plasma processing system and exposed to the plasma, an ion energy analyser disposed in the substrate for measuring the ion energy distribution at the substrate surface during plasma processing, the analyser comprising a first conductive grid, G 0 , a second conductive grid, G 1 , a third conductive grid, G 2 , a fourth conductive grid G 3 , and a collection electrode, C, each grid separated by an insulation layer, a battery power supply and control circuitry, integrated in the substrate, for supplying and controlling voltage to each of the grids and the collector of the ion energy analyser; wherein at least one insulation layer includes a peripheral portion which is of reduced thickness with respect to the remaining portion of the insulation layer.
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6.发明公开
公开(公告)号：EP4250335A1
公开(公告)日：2023-09-27
申请号：EP22164269.7
申请日：2022-03-25
申请人： Impedans Ltd
发明人： GAHAN, David , SCULLIN, Paul
摘要： A sensor for non-Invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber comprising a shunt connector, and a RF current sensing element, wherein the sensor is configured to be attached across an opening in a ground-return path between the chamber and an RF generator.
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公开(公告)号：EP4177928A1
公开(公告)日：2023-05-10
申请号：EP21207043.7
申请日：2021-11-09
申请人： Impedans Ltd
发明人： GAHAN, David , LENNON, JJ , SCULLIN, Paul , DOYLE, James
IPC分类号： H01J37/32
摘要： An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising a substrate for placement in the plasma processing system and exposure to the plasma, the substrate having an ion energy analyser disposed therein for measuring the ion energy distribution at the substrate surface during plasma processing, the analyser comprising a plurality of conductive grids, and a collection electrode, C, each grid separated by an insulating layer, a high voltage generating circuit within the substrate and configured to take the output voltage of a battery to power the high voltage generating circuit and apply a voltage to a first grid of the plurality of conductive grids, a high voltage switch configured to discharge the first grid to a floating ground of the apparatus and a resistor in parallel with the high voltage switch, wherein the ion energy analyser is configured to sample ion current during a first stage while a first voltage is being charged on the first grid from the floating ground potential to a plateau voltage and to sample ion current during a second stage while a second voltage applied to the first grid is discharging through the resistor from a predetermined voltage generated by the high voltage generating circuit to the plateau voltage.
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公开(公告)号：EP4105963A1
公开(公告)日：2022-12-21
申请号：EP22173193.8
申请日：2022-05-13
申请人： Impedans Ltd
发明人： GAHAN, David , SCULLIN, Paul , LENNON, JJ , DALY, Peter , OLIVIERI, Ian
IPC分类号： H01J37/32
摘要： There is provided a matching unit controller working in combination with a matching unit for a plasma processing machine. The controller has a master controller application and acts as a local master in the matching unit. The controller gathers data from the input and output sensors and feeds the data to an intelligent algorithm. The output from the algorithm is used to set the matching unit capacitor positions. The controller also has a slave controller application to communicate with a master controller of the plasma processing machine.
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公开(公告)号：EP2877864B1
公开(公告)日：2017-01-04
申请号：EP13774616.0
申请日：2013-07-24
申请人： Impedans Ltd
发明人： SCULLIN, Paul , HOPKINS, Michael
CPC分类号： G01R23/20 , H01J37/32082 , H01J37/32972
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公开(公告)号：EP4293700A3
公开(公告)日：2024-04-03
申请号：EP23201341.7
申请日：2021-08-30
申请人： Impedans Ltd
发明人： SCULLIN, Paul , DOYLE, James , LENNON, JJ , GAHAN, David , POGHOSYAN, Tigran
摘要： An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system comprising a substrate for placement in the plasma processing system and exposed to the plasma, an ion energy analyser disposed in the substrate for measuring the ion energy distribution at the substrate surface during plasma processing, the analyser comprising a first conductive grid, G 0 , a second conductive grid, G 1 , a third conductive grid, G 2 , a fourth conductive grid G 3 , and a collection electrode, C, each grid separated by an insulating layer, a battery power supply and a battery manager integrated in the substrate, for supplying and controlling voltage to each of the grids and the collector of the ion energy analyser, and a high voltage generating circuit within the substrate, wherein the high voltage generating circuit takes the output voltage of the battery manager and supplies a voltage sweep to the third conductive grid.
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