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公开(公告)号：EP1085379B1
公开(公告)日：2006-01-04
申请号：EP00120000.5
申请日：2000-09-14
申请人： JSR Corporation
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
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公开(公告)号：EP1048983A1
公开(公告)日：2000-11-02
申请号：EP00108941.6
申请日：2000-04-27
申请人： JSR Corporation
发明人： Yamahara, Noboru, c/o JSR Corporation , Murata, Kiyoshi , Iwanaga, Shinichiro , Ishii, Hiroyuki , Iwasawa, Haruo
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays. The resist has a high transparency to radiations and it is excellent in basic physical properties for resist such as durability to dry etching, sensitivity, resolution, and pattern configuration:
摘要翻译： 本发明提供一种辐射敏感性树脂组合物，其包含（A）由下述通式（1）或（2）表示的重复单元的共聚物所表示的树脂，（B）辐射敏感性酸发生剂。 辐射敏感性树脂组合物具有优异的储存稳定性，并且由该组合物制备的抗蚀剂是对由人造紫外线表示的辐射敏感的化学可放大型。 抗蚀剂对于辐射具有高透明度，并且对于抗蚀剂的耐腐蚀性，耐腐蚀性，灵敏度，分辨率和图案配置，其基本物理性质优异：
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公开(公告)号：EP1122605A3
公开(公告)日：2001-09-19
申请号：EP01102326.4
申请日：2001-02-01
申请人： JSR Corporation
发明人： Numata, Jun , Suzuki, Aki , Hara, Hiromichi , Natsume, Norihiro , Murata, Kiyoshi , Yamamoto, Masafumi , Soyano, Akimasa , Kajita, Toru , Shimokawa, Tsutomu
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator(B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
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公开(公告)号：EP1122605A2
公开(公告)日：2001-08-08
申请号：EP01102326.4
申请日：2001-02-01
申请人： JSR Corporation
发明人： Numata, Jun , Suzuki, Aki , Hara, Hiromichi , Natsume, Norihiro , Murata, Kiyoshi , Yamamoto, Masafumi , Soyano, Akimasa , Kajita, Toru , Shimokawa, Tsutomu
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator(B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
摘要翻译： 一种正性放射线敏感树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中氮原子具有至少一个与其键合的氢原子并且至少一个氢原子被 （B）光酸产生剂，（C-1）不溶于或几乎不溶于受酸解离基团保护的碱中的树脂，并且当酸解离性基团解离时可溶于碱或（C -2）公开了碱溶性树脂和碱溶解度控制剂。 还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负型辐射敏感树脂组合物 在酸存在下（E）。 该组合物可用作化学放大型抗蚀剂，其对各种放射线有效响应，表现出优异的灵敏度和分辨率，即使图案是独立的线型，也能以高精度和稳定的方式形成精细图案。
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公开(公告)号：EP1085379A1
公开(公告)日：2001-03-21
申请号：EP00120000.5
申请日：2000-09-14
申请人： JSR Corporation
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator.
The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.摘要翻译： 一种放射线敏感性树脂组合物，其特征在于，含有：（A）含有酸不溶性或几乎不溶于碱而在酸解离性基团解离时变成碱溶性的酸解离性基团的树脂，其含有下述重复单元（I），重复单元 II）和至少一种重复单元（III-1）和（III-2），和（B）光酸产生剂。 该放射线敏感性树脂组合物适合用作对由KrF准分子激光或ArF准分子激光为代表的深紫外线等活性放射线敏感的化学放大型抗蚀剂，不受蚀刻气体的种类的影响，显示出优异的耐干蚀性 具有高辐射透射率，作为抗蚀剂的灵敏度，分辨率和图案形状等优异的基本特性，作为组合物具有优异的储存稳定性，并且对基材具有足够的粘合性。
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