公开(公告)号：EP1085379B1

公开(公告)日：2006-01-04

申请号：EP00120000.5

申请日：2000-09-14

申请人： JSR Corporation

发明人： Douki, Katsuji ,  Murata, Kiyoshi ,  Ishii, Hiroyuki ,  Kajita, Toru ,  Shimokawa, Tsutomu

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

公开(公告)号：EP1085379A1

公开(公告)日：2001-03-21

申请号：EP00120000.5

申请日：2000-09-14

申请人： JSR Corporation

发明人： Douki, Katsuji ,  Murata, Kiyoshi ,  Ishii, Hiroyuki ,  Kajita, Toru ,  Shimokawa, Tsutomu

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator.
The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

摘要翻译： 一种放射线敏感性树脂组合物，其特征在于，含有：（A）含有酸不溶性或几乎不溶于碱而在酸解离性基团解离时变成碱溶性的酸解离性基团的树脂，其含有下述重复单元（I），重复单元 II）和至少一种重复单元（III-1）和（III-2），和（B）光酸产生剂。 该放射线敏感性树脂组合物适合用作对由KrF准分子激光或ArF准分子激光为代表的深紫外线等活性放射线敏感的化学放大型抗蚀剂，不受蚀刻气体的种类的影响，显示出优异的耐干蚀性 具有高辐射透射率，作为抗蚀剂的灵敏度，分辨率和图案形状等优异的基本特性，作为组合物具有优异的储存稳定性，并且对基材具有足够的粘合性。

公开(公告)号：EP1193558A3

公开(公告)日：2002-08-14

申请号：EP01122213.0

申请日：2001-09-17

申请人： JSR Corporation

发明人： Miyaji, Masaaki ,  Nagai, Tomoki ,  Yada, Yuji ,  Numata, Jun ,  Nishimura, Yukio ,  Yamamoto, Masafumi ,  Ishii, Hiroyuki ,  Kajita, Toru ,  Shimokawa, Tsutomu

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R 1 is a hydrogen or methyl, R 2 is a C 4-10 tertiary alkyl, R 3 and R 4 are a hydrogen, C 1-12 alkyl, C 6-15 aromatic, C 1-12 alkoxyl, or R 3 and R 4 may form, in combination and together with the nitrogen atom with which the R 3 and R 4 groups bond, a C 3-15 cyclic structure, provided that R 3 and R 4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 一种包含特定共聚物和光酸产生剂的化学增强辐射敏感树脂组合物，其中该共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R1 是氢或甲基，R2是C4-10叔烷基，R3和R4是氢，C1-12烷基，C6-15芳族基团，C1-12烷氧基基团，或者R3和R4可以与 与R 3和R 4键合的氮原子，C 3-15环状结构，条件是R 3和R 4不同时为氢原子。 该组合物有效地响应各种辐射，表现出优异的分辨率和图案构造以及最小的等密度偏差，并且可以以高精度和稳定的方式形成精细图案。

公开(公告)号：EP1193558A2

公开(公告)日：2002-04-03

申请号：EP01122213.0

申请日：2001-09-17

申请人： JSR Corporation

发明人： Miyaji, Masaaki ,  Nagai, Tomoki ,  Yada, Yuji ,  Numata, Jun ,  Nishimura, Yukio ,  Yamamoto, Masafumi ,  Ishii, Hiroyuki ,  Kajita, Toru ,  Shimokawa, Tsutomu

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),
wherein R 1 is a hydrogen or methyl, R 2 is a C 4-10 tertiary alkyl, R 3 and R 4 are a hydrogen, C 1-12 alkyl, C 6-15 aromatic, C 1-12 alkoxyl, or R 3 and R 4 may form, in combination and together with the nitrogen atom with which the R 3 and R 4 groups bond, a C 3-15 cyclic structure, provided that R 3 and R 4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学增幅辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 4是氢，C 1-12烷基，C 6-15芳族，C 1-12 烷氧基或R 3和R 4可以与R 3和R 4基团键合的氮原子一起形成C3-15环状结构，条件是R 3 >和R 4不同时为氢原子。 该组合物有效地响应各种辐射，显示出优异的分辨率和图案配置和最小的等密度偏差，并且可以以高精度和稳定的方式形成精细图案。

公开(公告)号：EP1048983A1

公开(公告)日：2000-11-02

申请号：EP00108941.6

申请日：2000-04-27

申请人： JSR Corporation

发明人： Yamahara, Noboru, c/o JSR Corporation ,  Murata, Kiyoshi ,  Iwanaga, Shinichiro ,  Ishii, Hiroyuki ,  Iwasawa, Haruo

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

摘要： The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays. The resist has a high transparency to radiations and it is excellent in basic physical properties for resist such as durability to dry etching, sensitivity, resolution, and pattern configuration:

摘要翻译： 本发明提供一种辐射敏感性树脂组合物，其包含（A）由下述通式（1）或（2）表示的重复单元的共聚物所表示的树脂，（B）辐射敏感性酸发生剂。 辐射敏感性树脂组合物具有优异的储存稳定性，并且由该组合物制备的抗蚀剂是对由人造紫外线表示的辐射敏感的化学可放大型。 抗蚀剂对于辐射具有高透明度，并且对于抗蚀剂的耐腐蚀性，耐腐蚀性，灵敏度，分辨率和图案配置，其基本物理性质优异：