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    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    2.
    发明公开
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    一种用于形成薄膜包衣层组合物液浸和方法用于形成光致抗蚀剂图案

    公开(公告)号：EP2315078A1

    公开(公告)日：2011-04-27

    申请号：EP11154169.4

    申请日：2005-01-14

    申请人： JSR Corporation

    发明人： Kimura, Toru ,  Nishimura, Yukio ,  Utaka, Tomohiro ,  Nemoto, Hiroaki ,  Nakamura, Atsushi ,  Chiba, Takashi ,  NAKAGAWA, Hiroki

    IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供一种浸没式上层膜的组合物表现出在曝光波长为248nm（KrF受）和193纳米（ARF）足够的透明性，可以形成在光致抗蚀剂的保护膜的薄膜不与所述光致抗蚀剂电影互混，不向水中溶出 液浸曝光过程中使用，以保持稳定的电影，并且可以以对碱性显影液容易地溶解。 这是通过一个透镜和光致抗蚀剂电影之间设置水照射适用于涂层上的光致抗蚀剂膜当液浸曝光装置的使用的所有的组合物，所述组合物包含的树脂形成水稳定的膜中照射并在后续的显影剂溶解， 和含有具有6个或更少碳原子，并且该树脂的一价醇的溶剂包含具有醇羟基侧链上的至少±位置上的碳原子含有氟代基团的树脂组分。

    Copolymer and top coating composition
    4.
    发明公开
    Copolymer and top coating composition 有权
    共聚物Beschichtungszusammensetzung

    公开(公告)号：EP2468780A1

    公开(公告)日：2012-06-27

    申请号：EP11173913.2

    申请日：2005-09-28

    申请人： JSR Corporation

    发明人： Chiba, Takashi ,  Kimura, Toru ,  Utaka, Tomohiro ,  Nakagawa, Hiroki ,  Sakakibara, Hirokazu ,  Dougauchi, Hiroshi

    IPC分类号： C08F220/10 ,  G03F7/11 ,  H01L21/027

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000,

    wherein at least one of R 1 and R 2 is a fluoroalkyl group having 1 to 4 carbon atoms and R 3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不会洗脱到介质中的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻），并且可以容易地溶解在碱性显影剂中。 该树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R 1和R 2中的至少一个 是碳原子数1〜4的氟代烷基，式（2）中的R 3表示碳原子数1〜20的氟代烷基。

    Process for forming a cured film of a thermosetting resin
    6.
    发明公开
    Process for forming a cured film of a thermosetting resin 审中-公开
    Verfahren zur Herstellung eines vernetzten Filmes von einemhitzehärtbarenHarz

    公开(公告)号：EP0908780A1

    公开(公告)日：1999-04-14

    申请号：EP98119024.2

    申请日：1998-10-08

    申请人： JSR Corporation

    发明人： Suzuki, Masayoshi ,  Utaka, Tomohiro ,  Endo, Masayuki

    IPC分类号： G03F7/00

    CPC分类号： G03F7/00 ,  G03F7/0007 ,  G03F7/094 ,  G03F7/422

    摘要： A process for forming a cured film comprising the steps of: coating an alkali-soluble thermosetting resin composition on a substrate, and baking it; coating a radiation sensitive resin composition on the coated film, and baking it; exposing the radiation sensitive resin composition on the substrate to radiation through a predetermined mask and baking it; carrying out development with an alkaline developer; immersing the substrate carrying the coated films in a stripping solution; and heating the alkali-soluble thermosetting resin remaining on the substrate to obtain a cured film pattern.

    摘要翻译： 一种形成固化膜的方法，包括以下步骤：将碱溶性热固性树脂组合物涂布在基材上，并烘烤; 在涂膜上涂布辐射敏感性树脂组合物，并烘烤; 将辐射敏感树脂组合物暴露在基板上以通过预定掩模进行辐射并烘烤; 用碱性显影剂进行显影; 将承载涂膜的基材浸渍在剥离溶液中; 并加热残留在基材上的碱溶性热固性树脂以获得固化的膜图案。

    Electrode active material, electrode and electrical storage device
    8.
    发明公开
    Electrode active material, electrode and electrical storage device 有权
    Aktives Elektrodenmaterial，Elektrode und elektrische Speichervorrichtung

    公开(公告)号：EP2665073A2

    公开(公告)日：2013-11-20

    申请号：EP13166742.0

    申请日：2013-05-07

    申请人： JSR Corporation ,  JM Energy Corporation

    发明人： Hayashi, Toshihiro ,  Utaka, Tomohiro

    IPC分类号： H01G11/50 ,  H01G11/26 ,  H01G11/32

    CPC分类号： H01G9/048 ,  B82Y99/00 ,  H01G11/24 ,  H01G11/34 ,  H01G11/42 ,  H01G11/50 ,  H01M4/133 ,  H01M4/366 ,  H01M4/583 ,  Y02E60/13 ,  Y10S977/948

    摘要： The invention provides an electrode active material which allows an electrical storage device such as a lithium ion capacitor or a lithium ion secondary battery to exhibit excellent low-temperature characteristics. The electrode active material includes a carbon material having a volume of macropores with 50 to 400 nm pore diameters of 0.05 to 0.40 cc/g. The carbon material may be a composite carbon material that contains a carbon material forming a core, and a coating carbon material covering at least part of the core-forming carbon material.

    摘要翻译： 本发明提供了一种电极活性材料，其允许诸如锂离子电容器或锂离子二次电池的蓄电装置表现出优异的低温特性。 电极活性物质包括具有50〜400nm孔径为0.05〜0.40cc / g的大孔体积的碳材料。 碳材料可以是包含形成芯的碳材料的复合碳材料和覆盖至少部分芯形碳材料的涂覆碳材料。

    Copolymer and top coating composition
    10.
    发明公开
    Copolymer and top coating composition 有权
    共聚物和稀释剂Zusammensetzung

    公开(公告)号：EP2277929A1

    公开(公告)日：2011-01-26

    申请号：EP10187142.4

    申请日：2005-09-28

    申请人： JSR Corporation

    发明人： Chiba, Takashi ,  Kimura, Toru ,  Utaka, Tomohiro ,  Nakagawa, Hiroki ,  Sakakibara, Hirokazu ,  Dougauchi, Hiroshi

    IPC分类号： C08F220/10 ,  G03F7/11 ,  H01L21/027

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000,

    wherein at least one of R 1 and R 2 is a fluoroalkyl group having 1 to 4 carbon atoms and R 3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不会洗脱到介质中的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻），并且可以容易地溶解在碱性显影剂中。 该树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R 1和R 2中的至少一个 是碳原子数1〜4的氟代烷基，式（2）中的R 3表示碳原子数1〜20的氟代烷基。