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    Radiation-sensitive resin composition
    1.
    发明公开
    Radiation-sensitive resin composition 审中-公开
    Lichtempfindliche Zusammensetzung

    公开(公告)号：EP1193558A2

    公开(公告)日：2002-04-03

    申请号：EP01122213.0

    申请日：2001-09-17

    申请人： JSR Corporation

    发明人： Miyaji, Masaaki ,  Nagai, Tomoki ,  Yada, Yuji ,  Numata, Jun ,  Nishimura, Yukio ,  Yamamoto, Masafumi ,  Ishii, Hiroyuki ,  Kajita, Toru ,  Shimokawa, Tsutomu

    IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

    摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),
    wherein R 1 is a hydrogen or methyl, R 2 is a C 4-10 tertiary alkyl, R 3 and R 4 are a hydrogen, C 1-12 alkyl, C 6-15 aromatic, C 1-12 alkoxyl, or R 3 and R 4 may form, in combination and together with the nitrogen atom with which the R 3 and R 4 groups bond, a C 3-15 cyclic structure, provided that R 3 and R 4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

    摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学增幅辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 4是氢，C 1-12烷基，C 6-15芳族，C 1-12 烷氧基或R 3和R 4可以与R 3和R 4基团键合的氮原子一起形成C3-15环状结构，条件是R 3 >和R 4不同时为氢原子。 该组合物有效地响应各种辐射，显示出优异的分辨率和图案配置和最小的等密度偏差，并且可以以高精度和稳定的方式形成精细图案。

    Radiation-sensitive resin composition
    2.
    发明公开
    Radiation-sensitive resin composition 有权
    Lichtempfindliche Harzzusammensetzung

    公开(公告)号：EP1011029A2

    公开(公告)日：2000-06-21

    申请号：EP99122344.7

    申请日：1999-11-09

    申请人： JSR Corporation

    发明人： Kobayashi, Eiichi ,  Nishimura, Yukio ,  Shioya, Takeo

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  Y10S430/115

    摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises a recurring unit (1) shown by the following formula (1) and either or both of a recurring unit (2) shown by the following formula (2) and a recurring unit (3) shown by the following formula (3), and (B) a photoacid generator shown by the following formula (4).

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）树脂，其包含由下式（1）表示的重复单元（1）和由下式（2）表示的重复单元（2）中的任一者或两者， 由下式（3）表示的单元（3），（B）下式（4）所示的光致酸发生剂。

    Radiation-sensitive resin composition
    4.
    发明公开
    Radiation-sensitive resin composition 有权

    公开(公告)号：EP1225480A3

    公开(公告)日：2003-03-26

    申请号：EP02001244.9

    申请日：2002-01-17

    申请人： JSR Corporation

    发明人： Nishimura, Yukio ,  Yamamoto, Masafumi ,  Kataoka, Atsuko ,  Kajita, Toru

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/111 ,  Y10S430/123

    摘要： A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R 5 represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.

    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    6.
    发明公开
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    一种用于形成薄膜包衣层组合物液浸和方法用于形成光致抗蚀剂图案

    公开(公告)号：EP2315078A1

    公开(公告)日：2011-04-27

    申请号：EP11154169.4

    申请日：2005-01-14

    申请人： JSR Corporation

    发明人： Kimura, Toru ,  Nishimura, Yukio ,  Utaka, Tomohiro ,  Nemoto, Hiroaki ,  Nakamura, Atsushi ,  Chiba, Takashi ,  NAKAGAWA, Hiroki

    IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供一种浸没式上层膜的组合物表现出在曝光波长为248nm（KrF受）和193纳米（ARF）足够的透明性，可以形成在光致抗蚀剂的保护膜的薄膜不与所述光致抗蚀剂电影互混，不向水中溶出 液浸曝光过程中使用，以保持稳定的电影，并且可以以对碱性显影液容易地溶解。 这是通过一个透镜和光致抗蚀剂电影之间设置水照射适用于涂层上的光致抗蚀剂膜当液浸曝光装置的使用的所有的组合物，所述组合物包含的树脂形成水稳定的膜中照射并在后续的显影剂溶解， 和含有具有6个或更少碳原子，并且该树脂的一价醇的溶剂包含具有醇羟基侧链上的至少±位置上的碳原子含有氟代基团的树脂组分。

    Radiation-sensitive resin composition
    8.
    发明公开
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：EP1164434A2

    公开(公告)日：2001-12-19

    申请号：EP01114503.4

    申请日：2001-06-15

    申请人： JSR Corporation ,  INTERNATIONAL BUSINESS MACHINES CORPORATION

    发明人： Nishimura, Yukio ,  Yamahara, Noboru ,  Yamamoto, Masafumi ,  Kajita, Toru ,  Shimokawa, Tsutomu ,  Ito, Hiroshi

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0046 ,  G03F7/0233 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1),
    wherein R 1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X 1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R 2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

    摘要翻译： 公开了一种包含含酸不稳定基团的树脂和光酸产生剂的辐射敏感树脂组合物。 该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基或具有以下基团的烷基羰基： 不具有酸不稳定基团的2-7个碳原子，X1代表具有1-4个碳原子的直链或支链氟代烷基，R2代表氢原子，具有1-10个碳原子的直链或支链烷基 或具有1-10个碳原子的直链或支链氟代烷基。 该树脂组合物表现出高辐射透射率，高灵敏度，高分辨率和图案形状，并且在高产率地制造半导体时用作化学放大型抗蚀剂。