公开(公告)号：EP2754737A1

公开(公告)日：2014-07-16

申请号：EP12829861.9

申请日：2012-03-09

申请人： Japan Science and Technology Agency

发明人： SUSAKI Tomofumi ,  HOSONO Hideo ,  FUJIHASHI Tadahiro ,  TODA Yoshitake

IPC分类号： C30B29/16 ,  B01D53/02 ,  B01D53/04 ,  B01J20/04 ,  B01J20/34 ,  B01J21/10 ,  C23C14/08

CPC分类号： C30B23/066 ,  B01D53/02 ,  B01D2253/1124 ,  B01D2253/25 ,  B01D2257/504 ,  B01J20/041 ,  B01J20/3204 ,  B01J20/3236 ,  C30B23/025 ,  C30B29/16 ,  Y02C10/08

摘要： A method for depositing a magnesium oxide thin film on a substrate by a laser abrasion method using a sintered body or single crystal of magnesium oxide as a target. In this method, a flat processed film made of magnesium oxide having a (111) plane as its front surface is prepared, using a substrate made of strontium titanate having a (111) plane as its principal surface or yttria-stabilized zirconia having a (111) plane as its principal surface, by directly depositing a film on the principal surface of the substrate and epitaxially growing the film.

摘要翻译： 一种使用氧化镁的烧结体或单晶作为靶通过激光磨蚀法在衬底上沉积氧化镁薄膜的方法。 在该方法中，使用由以（111）面为主面的钛酸锶构成的基板或以（111）面为主面的氧化钇稳定化氧化锆作为基材，制作以（111）面为正面的氧化镁的平坦加工膜 111）平面作为其主表面，通过在基板的主表面上直接沉积膜并外延生长该膜。