Nanometric mechanical oscillator
    1.
    发明公开
    Nanometric mechanical oscillator 审中-公开
    纳米机械振荡器

    公开(公告)号:EP1553048A1

    公开(公告)日:2005-07-13

    申请号:EP05005160.6

    申请日:2000-07-11

    摘要: A measurement apparatus using a nanometric mechanical oscillator comprising:

    (a) a base;
    (b) an oscillator mass; and
    (c) an elastic neck portion for connecting the base and the oscillator mass:
       characterized in that the oscillator mass is a tetrahedral shape and the neck portion is a very thin single columnar shape whose diameter is smaller than the size of supported surface of the oscillator mass whereby characteristics of a sample are measured by oscillation of the oscillator mass caused by the sample.

    摘要翻译: 一种使用纳米机械振荡器的测量设备,包括:(a)基座; (b)振荡器质量; (c)用于连接所述基座和所述振荡器质量的弹性颈部;其特征在于,所述振荡器质量是四面体形状,并且所述颈部是非常薄的单柱状形状,其直径小于所述振荡器的所述支撑表面的尺寸 振荡器质量,由此通过由样品引起的振荡器质量的振荡来测量样品的特性。

    Nanometric mechanical oscillator
    2.
    发明公开
    Nanometric mechanical oscillator 有权
    Nanometrischer机械师Oszillator

    公开(公告)号:EP1553047A1

    公开(公告)日:2005-07-13

    申请号:EP05005157.2

    申请日:2000-07-11

    摘要: A method of fabricating a nanometric mechanical oscillator comprising a base, an oscillator mass, and an elastic neck portion for connecting the base and the oscillator mass, comprising steps of:

    (a) successively forming a silicon oxide film and a silicon film on a silicon substrate;
    (b) anisotropically etching the silicon film to form a silicon tetrahedron;
    (c) etching the silicon oxide film in a direction normal to the substrate while using the silicon tetrahedron as a mask to thereby form a silicon oxide column;
    (d) vapor-depositing silicon or metal obliquely relative to the silicon substrate to thereby form a deposition film; and
    (e) removing the silicon oxide column to thereby form an elastic neck portion for supporting a tetrahedral probe, the neck portion being the deposition film assuming a plate-like shape and made of silicon or metal.

    摘要翻译: 一种制造纳米机械振荡器的方法,包括基座,振荡器块和用于连接基座和振荡器块的弹性颈部,包括以下步骤:(a)在硅上依次形成氧化硅膜和硅膜 基质; (b)各向异性地蚀刻硅膜以形成硅四面体; (c)在使用硅四面体作为掩模的同时,在垂直于衬底的方向上蚀刻氧化硅膜,从而形成氧化硅柱; (d)相对于硅衬底倾斜地气相沉积硅或金属,从而形成沉积膜; 和(e)除去氧化硅柱,从而形成用于支撑四面体探针的弹性颈部,颈部是呈硅板或金属制成的板状形状的沉积膜。