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公开(公告)号：EP0278652B1
公开(公告)日：1995-05-03
申请号：EP88300838.5
申请日：1988-02-01
CPC分类号： B41J2/33525 , B41J2/3353 , B41J2/33535 , B41J2/3355 , B41J2/3357 , B41J2/3359 , C08G73/1007 , C08G73/106 , H01B3/30 , H01B3/306 , H05K1/0346 , H05K3/4676 , Y10T428/31681 , Y10T428/31721
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2.发明公开
公开(公告)号：EP0833360A2
公开(公告)日：1998-04-01
申请号：EP97116867.9
申请日：1997-09-29
CPC分类号： B05C1/0839 , B05C1/003 , B05C1/0826 , B05C1/0856 , B05C1/12 , B05C9/06 , H01J9/142 , H01J2209/015 , Y10S438/944
摘要： A method of manufacturing a shadow mask by making use of a coating apparatus, wherein a gravure roll (23) 20 mm to 60 mm in diameter is disposed below a metallic thin plate (21) and any supporting member is not disposed at an opposite side portion of the metallic thin plate (21) to be contacted with the gravure roll (23). An etching resistant liquid is fed onto the gravure roll (23) being rotated in a direction opposite to that of the metallic thin plate (21) and at a peripheral speed of 4 to 25 times as high as that of a feeding speed of the metallic thin plate (21), and an excessive portion of the etching resistant liquid is wiped away by the doctor blade (28) before the etching resistant liquid is transferred to the metallic thin plate (21) thereby to form an etching resistant layer on the metallic thin plate.
摘要翻译： 一种通过使用涂布设备制造荫罩的方法，其中在金属薄板（21）的下方设置直径为20mm至60mm的凹版辊（23），并且任何支撑部件不设置在相反侧 金属薄板（21）的一部分与凹版辊（23）接触。 耐蚀刻液体以与金属薄板（21）相反的方向旋转并以高于金属进给速度的4至25倍的圆周速度供给到凹版辊（23）上 在抗蚀刻液体转移到金属薄板（21）之前，通过刮刀（28）擦掉多余部分的耐蚀刻液体，从而在金属薄板（21）上形成耐蚀刻层 薄板。
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3.发明公开Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus 失效制备方法和用于制造荫罩的装置，并用这些方法和装置中使用的清洗装置
公开(公告)号：EP0817231A2
公开(公告)日：1998-01-07
申请号：EP97110866.7
申请日：1997-07-01
IPC分类号： H01J9/14
CPC分类号： H01J9/142 , H01J2209/017
摘要： A shadow mask manufacturing method comprising the cleaning step performs rapid cleaning by spraying a cleaning solution, which is inert with respect to the band-like thin metal plate, upon upper and lower surfaces of the band-like thin metal plate and thereby generating cavitation near the surfaces of the band-like thin metal plate by using cavitation jet means, while regulating a position of the band-like thin metal plate and preventing the cleaning solution from leaking in a direction opposite to the conveyance direction of the band-like thin metal plate by using a first leakage-preventing seal unit provided upstream the cavitation jet means.
摘要翻译： 荫罩制造方法，包括清洗步骤通过喷洒的清洗溶液进行快速清洗，所有这一切是惰性的相对于所述带状金属薄板，在所述带状金属薄板的上，下表面，并由此产生接近汽蚀 采用气穴喷射方式，同时调节所述带状金属薄板的位置，并从相反的方向泄漏到带状薄金属的输送方向防止清洁溶液中的所述带状金属薄板的表面 通过使用上游气穴喷射装置提供的第一防漏密封部板。
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4.发明授权Method for manufacturing shadow mask and etching-resistant layer-coating apparatus 失效制造用于涂层的荫罩和装置用抗蚀剂材料的方法
公开(公告)号：EP0833360B1
公开(公告)日：2002-04-03
申请号：EP97116867.9
申请日：1997-09-29
CPC分类号： B05C1/0839 , B05C1/003 , B05C1/0826 , B05C1/0856 , B05C1/12 , B05C9/06 , H01J9/142 , H01J2209/015 , Y10S438/944
摘要： A method of manufacturing a shadow mask by making use of a coating apparatus, wherein a gravure roll (23) 20 mm to 60 mm in diameter is disposed below a metallic thin plate (21) and any supporting member is not disposed at an opposite side portion of the metallic thin plate (21) to be contacted with the gravure roll (23). An etching resistant liquid is fed onto the gravure roll (23) being rotated in a direction opposite to that of the metallic thin plate (21) and at a peripheral speed of 4 to 25 times as high as that of a feeding speed of the metallic thin plate (21), and an excessive portion of the etching resistant liquid is wiped away by the doctor blade (28) before the etching resistant liquid is transferred to the metallic thin plate (21) thereby to form an etching resistant layer on the metallic thin plate.
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5.发明公开Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus 失效制备方法和用于制造荫罩的装置，并用这些方法和装置中使用的清洗装置
公开(公告)号：EP0817231A3
公开(公告)日：1998-12-16
申请号：EP97110866.7
申请日：1997-07-01
IPC分类号： H01J9/14
CPC分类号： H01J9/142 , H01J2209/017
摘要： A shadow mask manufacturing method comprising the cleaning step performs rapid cleaning by spraying a cleaning solution, which is inert with respect to the band-like thin metal plate, upon upper and lower surfaces of the band-like thin metal plate and thereby generating cavitation near the surfaces of the band-like thin metal plate by using cavitation jet means, while regulating a position of the band-like thin metal plate and preventing the cleaning solution from leaking in a direction opposite to the conveyance direction of the band-like thin metal plate by using a first leakage-preventing seal unit provided upstream the cavitation jet means.
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公开(公告)号：EP0817231B1
公开(公告)日：2003-10-08
申请号：EP97110866.7
申请日：1997-07-01
CPC分类号： H01J9/142 , H01J2209/017
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7.发明公开Method for manufacturing shadow mask and etching-resistant layer-coating apparatus 失效制造用于涂层的荫罩和装置用抗蚀剂材料的方法
公开(公告)号：EP0833360A3
公开(公告)日：1998-11-04
申请号：EP97116867.9
申请日：1997-09-29
CPC分类号： B05C1/0839 , B05C1/003 , B05C1/0826 , B05C1/0856 , B05C1/12 , B05C9/06 , H01J9/142 , H01J2209/015 , Y10S438/944
摘要： A method of manufacturing a shadow mask by making use of a coating apparatus, wherein a gravure roll (23) 20 mm to 60 mm in diameter is disposed below a metallic thin plate (21) and any supporting member is not disposed at an opposite side portion of the metallic thin plate (21) to be contacted with the gravure roll (23). An etching resistant liquid is fed onto the gravure roll (23) being rotated in a direction opposite to that of the metallic thin plate (21) and at a peripheral speed of 4 to 25 times as high as that of a feeding speed of the metallic thin plate (21), and an excessive portion of the etching resistant liquid is wiped away by the doctor blade (28) before the etching resistant liquid is transferred to the metallic thin plate (21) thereby to form an etching resistant layer on the metallic thin plate.
摘要翻译： 制造通过利用涂敷装置的，worin凹版辊的荫罩的方法，（23）20mm到直径60mm的下方配置的金属薄板（21）和任何支撑构件不是在上相反侧且在 在金属薄板（21）的部分，以与所述凹印辊（23）接触。 耐蚀刻液供给到凹印辊（23）在相反的方向上所做的金属薄板（21）的旋转，并在4至25倍的圆周速度高达所做的金属的输送速度的 薄板（21），并在耐蚀刻液的多余部分被擦掉由耐蚀刻液被转移到金属薄板（21）之前，刮刀（28），从而形成在在金属耐蚀刻层 薄板。
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公开(公告)号：EP0278652A1
公开(公告)日：1988-08-17
申请号：EP88300838.5
申请日：1988-02-01
CPC分类号： B41J2/33525 , B41J2/3353 , B41J2/33535 , B41J2/3355 , B41J2/3357 , B41J2/3359 , C08G73/1007 , C08G73/106 , H01B3/30 , H01B3/306 , H05K1/0346 , H05K3/4676 , Y10T428/31681 , Y10T428/31721
摘要： A polyamic acid is synthesized by the ring-opening poly-addition reaction using a biphenyl tetracarboxylic acid as a tetracarboxylic acid moiety and an aromatic diamine, particularly p-phenylene diamine, as a diamine moiety. An aromatic polyimide resin layer possessing a highly desirable heat resisting property as a heat resistant insulating coating material and excelling in adhesive strength relative to a substrate is obtained by adjusting the polyamic acid in viscosity with a suitable organic solvent, applying the resultant polyamic acid on a substrate, and firing the applied layer of the polyamic acid. The substrate, for example, is a conductor layer formed as with copper and used as a multi-layer wiring board for hybrid IC's. In a thermal head whicn is obtained by forming an insulating layer on a metallic substrate and superposing a multiplicity of heat-generating resistors and conductors connected severally to the heat-generating resistors on insulating layer, the aforementioned aromatic polyimide resin layer is formed on the metallic substrate. This aromatic polyimide resin layer as an insulating layer in the thermal head withstands harsh working temperature conditions and adheres strongly to the metallic substrate. Thus, it manifests various outstanding effects.
摘要翻译： 聚酰胺酸是通过使用联苯四羧酸作为四羧酸部分和二胺的芳族，特别是对苯二胺开环加聚反应，作为二胺部分合成。 芳族聚酰亚胺树脂层波塞唱高度期望的耐热性作为耐热绝缘涂层材料并在相对于基板的粘合强度优异，通过用合适的有机溶剂调节粘度的聚酰胺酸，在施用所得到的聚酰胺酸而得到的热 基材，并焙烧该聚酰胺酸的应用层。 该衬底，例如，形成为具有铜和用作用于混合集成电路的多层布线板的导体层。 在whicn是通过在金属基材的绝缘层和叠加个别连接到发热电阻器上的绝缘层发热电阻器和导体的多个的形成而得到的热头中，上述芳族聚酰亚胺树脂层形成在所述金属 基板。 该芳香族聚酰亚胺树脂层作为在热头绝缘层经受苛刻的工作条件和温度牢固地附着到金属基材上。 因此，它体现各类优秀的效果。
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